Patents by Inventor Po-Shu PENG

Po-Shu PENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11004779
    Abstract: A substrate includes a first dielectric layer having a first surface and a second surface opposite to the first surface, a first patterned conductive layer adjacent to the first surface of the first dielectric layer and comprising an interconnection structure, and an interconnection element. The interconnection element extends from the first surface of the first dielectric layer to the second surface of the first dielectric layer and is surrounded by the interconnection structure.
    Type: Grant
    Filed: February 9, 2018
    Date of Patent: May 11, 2021
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Po-Shu Peng, Cheng-Lin Ho, Chih-Cheng Lee
  • Patent number: 10748843
    Abstract: A semiconductor substrate includes a multi-layered structure, a component and a first conductive via. The multi-layered structure includes a plurality of dielectric layers and a plurality of patterned conductive layers. A topmost patterned conductive layer of the patterned conductive layers is embedded in a topmost dielectric layer of the dielectric layers. The component is embedded in the multi-layered structure. The first conductive via is electrically connected to the component and one of the patterned conductive layers.
    Type: Grant
    Filed: November 18, 2016
    Date of Patent: August 18, 2020
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Li Chuan Tsai, Po-Shu Peng, Cheng-Lin Ho, Chih Cheng Lee
  • Publication number: 20190252305
    Abstract: A substrate includes a first dielectric layer having a first surface and a second surface opposite to the first surface, a first patterned conductive layer adjacent to the first surface of the first dielectric layer and comprising an interconnection structure, and an interconnection element. The interconnection element extends from the first surface of the first dielectric layer to the second surface of the first dielectric layer and is surrounded by the interconnection structure.
    Type: Application
    Filed: February 9, 2018
    Publication date: August 15, 2019
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Po-Shu PENG, Cheng-Lin HO, Chih-Cheng LEE
  • Patent number: 10334728
    Abstract: A package substrate includes a dielectric layer, a conductive via disposed in the dielectric layer, and a conductive pattern layer exposed from a first surface of the dielectric layer. The conductive pattern layer includes traces and a via land, the via land extends into the conductive via, and a circumferential portion of the via land is encompassed by the conductive via. A method of making a package substrate includes forming a conductive pattern layer including traces and a via land, providing a dielectric layer to cover the conductive pattern layer, and forming a via hole. Forming the via hole is performed by removing a portion of the dielectric layer and exposing a bottom surface of the via land and at least a portion of a side surface of the via land. A conductive material is applied into the via hole to form a conductive via covering the via land.
    Type: Grant
    Filed: February 9, 2016
    Date of Patent: June 25, 2019
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Cheng-Lin Ho, Chih-Cheng Lee, Po-Shu Peng
  • Publication number: 20180145017
    Abstract: A semiconductor substrate includes a multi-layered structure, a component and a first conductive via. The multi-layered structure includes a plurality of dielectric layers and a plurality of patterned conductive layers. A topmost patterned conductive layer of the patterned conductive layers is embedded in a topmost dielectric layer of the dielectric layers. The component is embedded in the multi-layered structure. The first conductive via is electrically connected to the component and one of the patterned conductive layers.
    Type: Application
    Filed: November 18, 2016
    Publication date: May 24, 2018
    Inventors: Li Chuan TSAI, Po-Shu PENG, Cheng-Lin HO, Chih Cheng LEE
  • Publication number: 20170231093
    Abstract: A package substrate includes a dielectric layer, a conductive via disposed in the dielectric layer, and a conductive pattern layer exposed from a first surface of the dielectric layer. The conductive pattern layer includes traces and a via land, the via land extends into the conductive via, and a circumferential portion of the via land is encompassed by the conductive via. A method of making a package substrate includes forming a conductive pattern layer including traces and a via land, providing a dielectric layer to cover the conductive pattern layer, and forming a via hole. Forming the via hole is performed by removing a portion of the dielectric layer and exposing a bottom surface of the via land and at least a portion of a side surface of the via land. A conductive material is applied into the via hole to form a conductive via covering the via land.
    Type: Application
    Filed: February 9, 2016
    Publication date: August 10, 2017
    Inventors: Cheng-Lin HO, Chih-Cheng LEE, Po-Shu PENG