Patents by Inventor Po-Yi Hsu

Po-Yi Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150277622
    Abstract: A method for making a sensing circuit structure is disclosed to provide a transparent substrate, and then to form multiple plating base layers in the transparent substrate in a spaced manner, and then to form a metal conductor layer on each plating base layer using a plating technique. Thus, the thickness of the metal conductor layers can be thinner than that formed by silver paste. The invention relates also to a sensing circuit structure made by this method.
    Type: Application
    Filed: June 9, 2014
    Publication date: October 1, 2015
    Inventors: Po-Yi HSU, Cheng-Wei CHIU
  • Publication number: 20130093359
    Abstract: A lighting device includes a tube, an insulating body, a first circuit substrate and a plurality of first light emitting diodes. At least one portion of the tube is light-permeable. The insulating body is disposed in the tube, and has a first surface and a second surface which is opposite to the first surface. The first circuit substrate is disposed on the first surface. The first light emitting diodes are disposed on and electrically connected with the first circuit substrate.
    Type: Application
    Filed: January 20, 2012
    Publication date: April 18, 2013
    Applicant: Econova Optronics Co., LTD.
    Inventors: Po-Yi Hsu, Chao-Chin Sung
  • Patent number: 7033733
    Abstract: A photosensitive resin composition for color filters comprises (A) an alkali-soluble resin; (B) a photopolymerizable monomer; (C) a photoinitiator; (D) an organic solvent; and (E) a pigment; wherein said alkali-soluble resin (A) is formed by polymerizing at least one monomer (a-1), which dipole moment is below 1.5D and having at least one aromatic functional group and at least one copolymerizable monomer (a-2) other than said monomer (a-1), wherein the content of oligomer having a molecular weight below 1,000 of said alkali-soluble resin (A) is less than 0.6 wt %, based on the photosensitive resin composition except solvent(D), which remains less residue on an unexposed portion(s) of the substrate and the black matrix at the time of development, and provides color pixels having excellent heat resistance and chemical resistance, further provides LCD having lower electric resistance of the ITO electrode.
    Type: Grant
    Filed: December 11, 2003
    Date of Patent: April 25, 2006
    Assignee: Chi Mei Corporation
    Inventor: Po-Yi Hsu
  • Publication number: 20040191671
    Abstract: A photosensitive resin composition for color filters comprises (A) an alkali-soluble resin; (B) a photopolymerizable monomer; (C) a photoinitiator; (D) an organic solvent; and (E) a pigment; wherein said alkali-soluble resin (A) is formed by polymerizing at least one monomer (a-1), which dipole moment is below 1.5D and having at least one aromatic functional group and at least one copolymerizable monomer (a-2) other than said monomer (a-1), wherein the content of oligomer having a molecular weight below 1,000 of said alkali-soluble resin (A) is less than 0.6 wt %, based on the photosensitive resin composition except solvent(D), which remains less residue on an unexposed portion(s) of the substrate and the black matrix at the time of development, and provides color pixels having excellent heat resistance and chemical resistance, further provides LCD having lower electric resistance of the ITO electrode.
    Type: Application
    Filed: December 11, 2003
    Publication date: September 30, 2004
    Inventor: Po-Yi Hsu