Patents by Inventor Po-Lung Yang

Po-Lung Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Surface treatment method by using the NHplasma treatment to modify the sensing thin-film
    Patent number: 8741679
    Abstract: The NH3 plasma treatment by remote plasma is firstly proposed to replace the covalent bonding process during surface modification procedure that for amine bond generation.
    Type: Grant
    Filed: May 8, 2012
    Date of Patent: June 3, 2014
    Assignee: Chang Gung University
    Inventors: Chao-Sung Lai, Jau-Song Yu, Yu-Sun Chang, Po-Lung Yang, Tseng-Fu Lu, Yi-Ting Lin, Wen-Yu Chuang, Ting-Chun Yu, I-Shun Wang, Jyh-Ping Chen, Chou Chien
  • SURFACE TREATMENT METHOD BY USING THE NH3 PLASMA TREATMENT TO MODIFY THE SENSING THIN-FILM
    Publication number: 20120322167
    Abstract: The NH3 plasma treatment by remote plasma is firstly proposed to replace the covalent bonding process during surface modification procedure that for amine bond generation.
    Type: Application
    Filed: May 8, 2012
    Publication date: December 20, 2012
    Applicant: Chang Gung University
    Inventors: Chao-Sung LAI, Jau-Song Yu, Yu-Sun Chang, Po-Lung Yang, Tseng-Fu Lu, Yi-Ting Lin, Wen-Yu Chuang, Ting-Chun Yu, I-Shun Wang, Jyh-Ping Chen, Chou Chien