Abstract: A molecular sieve adsorbent composition is provided that includes an inorganic molecular sieve having a surface and a native adsorption property. Carbon having a mean domain size of between 1 and 10 nm is deposited on the surface or admixed into contact with the surface in an amount to reduce the resistivity and within 10% of the native adsorption property. A method for producing an inorganic molecular sieve adsorbent composition includes the application of carbon having mean domain sizes of between 1 and 10 nanometers to a surface of the inorganic molecular sieve adsorbent composition at a temperature that does not exceed 400° C. and under a controlled gaseous environment to produce a carbon containing inorganic molecular sieve adsorbent composition. The carbon containing inorganic molecular sieve adsorbent composition is removed from the controlled gaseous environment to obtain the inorganic molecular sieve adsorbent composition with the decreased resistivity.