Patents by Inventor Prabhat Kumar

Prabhat Kumar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12645874
    Abstract: Systems and methods for identify errors in a transcript using an LLM. System comprises a digital front end; a backend computer system in communication with the digital front end; and a LLM in communication with the backend computer system. The LLM is configured to receive, via the digital front end: a list of words and phrases; a list of error categories; and a transcript, in a machine-readable format, for transcript correction by the LLM.
    Type: Grant
    Filed: June 26, 2024
    Date of Patent: June 2, 2026
    Assignee: Morgan Stanley Services Group Inc.
    Inventors: Vishnu Deepak, Prabhat Kumar
  • Patent number: 12647813
    Abstract: Certain example embodiments relate to a method for selecting wireless ridelity (Wi-Fi) channel for mitigating and/or reducing interference, wherein the method may detect the presence of nearby access points and determine the number of access points by an access point detector module. The method may determine the minimum value of received signal strength indicator (RSSI) by the access point detector module, and may determine the congestion information from the nearby devices by a peer congestion observer module. Furthermore, the method may calculate at least one weighted parameter and select a preferred channel to create a hotspot for communication by a channel selector module.
    Type: Grant
    Filed: December 20, 2022
    Date of Patent: June 2, 2026
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Abhinav Jain, Amit Jain, Prabhat Kumar, Ankit Guleria
  • Publication number: 20250272780
    Abstract: A system for translation of images between two distinct heterogenous cameras and a method thereof is disclosed. The system includes a source camera, a target camera, two generative adversarial networks, a transformation prediction module and at least a warping module. The transformation prediction module is configured using the system and method to derive a transformation parameter. The transformation prediction module is optimized using a loss function comprising loss between a translated source image vis-à-vis a target image and a translated target image vis-à-vis a source image.
    Type: Application
    Filed: February 18, 2025
    Publication date: August 28, 2025
    Inventors: Amit Arvind Kale, Koustav Mullick, Michael Miksch, Prabhat Kumar
  • Patent number: 12282337
    Abstract: A dual agent reinforcement learning autonomous system (DARLAS) for the autonomous operation of aircraft and/or provide pilot assistance. DARLAS includes an artificial neural network, safe agent, and cost agent. The safe agent is configured to calculate safe reward Q values associated with landing the aircraft at a predetermined destination or calculated emergency destination. The cost agent is configured to calculate cost reward Q values associated with maximum fuel efficiency and aircraft performance. The safe and cost reward Q values are based on state-action vectors associated with an aircraft, which may include state data and action data. The system may include a user output device that provides an indication of an action to a user. The action corresponds to an agent action having the highest safe reward Q value and the highest cost require Q value. DARLAS prioritizes the highest safe reward Q value in the event of conflict.
    Type: Grant
    Filed: April 14, 2022
    Date of Patent: April 22, 2025
    Assignee: The Boeing Company
    Inventor: Prabhat Kumar
  • Publication number: 20250014909
    Abstract: A method for selectively etching at least one feature in a silicon oxide region with respect to a lower oxygen containing region is provided. An etch gas is provided comprising a fluorocarbon gas and at least one of a metalloid halide gas or metal halide gas. The etch gas is formed into a plasma. At least one feature is selectively etched in the silicon oxide region with respect to the lower oxygen containing region, while simultaneously forming a metalloid or metal containing hardmask over the lower oxygen containing region.
    Type: Application
    Filed: November 28, 2022
    Publication date: January 9, 2025
    Inventors: Eric HUDSON, Prabhat KUMAR
  • Publication number: 20240121653
    Abstract: Certain example embodiments relate to a method for selecting wireless ridelity (Wi-Fi) channel for mitigating and/or reducing interference, wherein the method may detect the presence of nearby access points and determine the number of access points by an access point detector module. The method may determine the minimum value of received signal strength indicator (RSSI) by the access point detector module, and may determine the congestion information from the nearby devices by a peer congestion observer module. Furthermore, the method may calculate at least one weighted parameter and select a preferred channel to create a hotspot for communication by a channel selector module.
    Type: Application
    Filed: December 20, 2022
    Publication date: April 11, 2024
    Inventors: Abhinav JAIN, Amit JAIN, Prabhat KUMAR, Ankit GULERIA
  • Publication number: 20230318924
    Abstract: A 5G or 6G communication system for supporting a higher data transmission rate in certain example instances. Certain example embodiments may provide a method for managing PAN devices in a cluster using a first PAN device in the cluster of the PAN devices. The method may include receiving an input comprising an inner cluster attribute from a user. The method may include determining that the first PAN device has the inner cluster attribute. The method may include determining whether an inner cluster corresponding to the inner cluster attribute is available under the cluster, where the inner cluster comprises a subset of the PAN devices with the inner cluster attribute. The method may include joining the inner cluster, in response to determining that the inner cluster is available under the cluster. The method may include creating the inner cluster, in response to determining that the inner cluster is not available under the cluster.
    Type: Application
    Filed: June 5, 2023
    Publication date: October 5, 2023
    Inventors: Prabhat KUMAR, Abhishek SAXENA, Abhinav JAIN, Anand ASATI, Amit JAIN, Nitesh SUTHAR
  • Publication number: 20230268192
    Abstract: A method for selectively etching at least one feature in a first region with respect to a second region of a stack is provided. The first region is selectively etched with respect to the second region to form at least one partial feature in the first region, the at least one partial feature having a depth with respect to a surface of the second region. An in-situ a fluorine-free, non-conformal, carbon-containing mask is deposited over the first region and the second region, wherein the carbon-containing mask is selectively deposited on the second region at a second thickness with respect to the first region at a first thickness, the second thickness being greater than the first thickness. The first region is further etched in-situ to etch the at least one partial feature and wherein the carbon-containing mask acts as an etch mask for the second region.
    Type: Application
    Filed: June 13, 2022
    Publication date: August 24, 2023
    Inventors: Eric HUDSON, Kapu Sirish REDDY, Ragesh PUTHENKOVILAKAM, Shashank DESHMUKH, Prabhat KUMAR, Prabhakara GOPALADASU, Seokmin YUN, Xin ZHANG
  • Publication number: 20230231833
    Abstract: System and computer-implemented method for managing remote access to managed components in a cloud-based virtual computer network uses a virtual jumpbox infrastructure to establish a cryptographic network protocol connection between the virtual jumpbox infrastructure and the cloud-based virtual computer network on behalf of an user interface making a request for remote access to the cloud-based virtual computer network. After the cryptographic network protocol connection has been established, communication data between the user interface and a target managed component in the cloud-based virtual computer network is automatically moderated at the virtual jumpbox infrastructure at a data path that is not within the cryptographic network protocol connection. The automatic moderation includes at least one of inserting new information into the communication data and removing existing information from the communication data.
    Type: Application
    Filed: April 12, 2022
    Publication date: July 20, 2023
    Inventors: Jon Cook, Prabhat Kumar, Saket Singh
  • Publication number: 20230025154
    Abstract: A dual agent reinforcement learning autonomous system (DARLAS) for the autonomous operation of aircraft and/or provide pilot assistance. DARLAS includes an artificial neural network, safe agent, and cost agent. The safe agent is configured to calculate safe reward Q values associated with landing the aircraft at a predetermined destination or calculated emergency destination. The cost agent is configured to calculate cost reward Q values associated with maximum fuel efficiency and aircraft performance. The safe and cost reward Q values are based on state-action vectors associated with an aircraft, which may include state data and action data. The system may include a user output device that provides an indication of an action to a user. The action corresponds to an agent action having the highest safe reward Q value and the highest cost require Q value. DARLAS prioritizes the highest safe reward Q value in the event of conflict.
    Type: Application
    Filed: April 14, 2022
    Publication date: January 26, 2023
    Inventor: Prabhat KUMAR
  • Publication number: 20220292994
    Abstract: An emergency pilot assistance system may include an artificial neural network configured to calculate reward (Q) values based on state-action vectors associated with an aircraft. The state-action vectors may include state data associated with the aircraft and action data associated with the aircraft. The system may further include a user output device configured to provide an indication of an action to a user, wherein the action corresponds to an agent action that has a highest reward Q value as calculated by the artificial neural network.
    Type: Application
    Filed: February 23, 2022
    Publication date: September 15, 2022
    Inventors: Srikanth Gampa, Prabhat Kumar, Shobhit Chaturvedi
  • Publication number: 20220157574
    Abstract: Embodiments of the present disclosure provide a method and an apparatus for processing a substrate. The apparatus has a ring assembly. The ring assembly has an edge ring and a shadow ring. The edge ring has a ring shaped body. The edge ring body has a top surface and a bottom surface. Pin holes extend through the edge ring body from the top surface to the bottom surface. The shadow ring has a ring shaped body. The shadow ring body has an upper surface and a lower surface. Sockets are formed on the lower surface, wherein the sockets in the shadow ring body align with the pin holes in the edge ring body.
    Type: Application
    Filed: November 16, 2021
    Publication date: May 19, 2022
    Inventors: Benjamin SCHWARZ, Michael D. WILLWERTH, Aditi MITHUN, Prabhat KUMAR, Grace MATHEW, Andreas SCHMID
  • Patent number: 11158540
    Abstract: Light-absorbing masks and methods of dicing semiconductor wafers are described. In an example, a method of dicing a semiconductor wafer including a plurality of integrated circuits involves forming a mask above the semiconductor wafer. The mask includes a water-soluble matrix based on a solid component and water, and a light-absorber species throughout the water-soluble matrix. The mask and a portion of the semiconductor wafer are patterned with a laser scribing process to provide a patterned mask with gaps and corresponding trenches in the semiconductor wafer in regions between the integrated circuits. The semiconductor wafer is plasma etched through the gaps in the patterned mask to extend the trenches and to singulate the integrated circuits. The patterned mask protects the integrated circuits during the plasma etching.
    Type: Grant
    Filed: May 26, 2017
    Date of Patent: October 26, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Wenguang Li, James S. Papanu, Wei-Sheng Lei, Prabhat Kumar, Brad Eaton, Ajay Kumar, Alexander N. Lerner
  • Patent number: 10884586
    Abstract: A method of traversing across multiple user interface layers in a hierarchy of an application by an electronic device is provided. The method includes displaying a first user interface layer of the application on a screen of an electronic device. Further, the method includes detecting an input on a first graphical element displayed within the first user interface layer, and displaying, on the screen, the first user interface layer, a second user interface layer of the application, and at least one first indicia indicating a relation between the first user interface layer and the second user interface layer based on the input to traverse to the second user interface layer.
    Type: Grant
    Filed: May 8, 2018
    Date of Patent: January 5, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jatin Garg, Abhishek Verma, Prabhat Kumar, Pranav Jadav, Shubham Jain, Abhishek Gogia
  • Publication number: 20190114587
    Abstract: A routing system is discussed that receives data for multiple orders, including, for each order, a first destination with a corresponding first time window and a second destination and a corresponding second time window. The routing system analyzes data for multiple orders, and generates an optimized route for delivery taking into consideration logistic constraints and cost efficiency.
    Type: Application
    Filed: January 9, 2018
    Publication date: April 18, 2019
    Inventors: Shaik Asifullah, Ayushi Jain, Kashish Mehrotra, Prabhat Kumar, Aditya Dalwani, Balaji Muniswami
  • Publication number: 20180342422
    Abstract: Light-absorbing masks and methods of dicing semiconductor wafers are described. In an example, a method of dicing a semiconductor wafer including a plurality of integrated circuits involves forming a mask above the semiconductor wafer. The mask includes a water-soluble matrix based on a solid component and water, and a light-absorber species throughout the water-soluble matrix. The mask and a portion of the semiconductor wafer are patterned with a laser scribing process to provide a patterned mask with gaps and corresponding trenches in the semiconductor wafer in regions between the integrated circuits. The semiconductor wafer is plasma etched through the gaps in the patterned mask to extend the trenches and to singulate the integrated circuits. The patterned mask protects the integrated circuits during the plasma etching.
    Type: Application
    Filed: May 26, 2017
    Publication date: November 29, 2018
    Inventors: Wenguang Li, James S. Papanu, Wei-Sheng Lei, Prabhat Kumar, Brad Eaton, Ajay Kumar, Alexander N. Lerner
  • Publication number: 20180329590
    Abstract: A method of traversing across multiple user interface layers in a hierarchy of an application by an electronic device is provided. The method includes displaying a first user interface layer of the application on a screen of an electronic device. Further, the method includes detecting an input on a first graphical element displayed within the first user interface layer, and displaying, on the screen, the first user interface layer, a second user interface layer of the application, and at least one first indicia indicating a relation between the first user interface layer and the second user interface layer based on the input to traverse to the second user interface layer.
    Type: Application
    Filed: May 8, 2018
    Publication date: November 15, 2018
    Inventors: Jatin GARG, Abhishek VERMA, Prabhat KUMAR, Pranav JADAV, Shubham JAIN, Abhishek GOGIA
  • Patent number: 9926623
    Abstract: In various embodiments, sputtering targets are formed by introducing molybdenum powder into a sheet bar mold, pressing the powder to form a sheet bar, sintering the sheet bar to form an ingot having a density of at least 90% of a theoretical density, preheating the ingot, rolling the ingot to form a plate, and heat treating the plate.
    Type: Grant
    Filed: March 4, 2016
    Date of Patent: March 27, 2018
    Assignee: H.C. STARCK INC.
    Inventors: Brad Lemon, Joseph Hirt, Timothy Welling, James G. Daily, III, David Meendering, Gary Rozak, Jerome O'Grady, Prabhat Kumar, Steven A. Miller, Rong-chein Richard Wu, David G. Schwartz
  • Patent number: 9793132
    Abstract: Etch masks and methods of dicing semiconductor wafers are described. In an example, an etch mask for a wafer singulation process includes a water-soluble matrix based on a solid component and water. The etch mask also includes a plurality of particles dispersed throughout the water-soluble matrix. The plurality of particles has an average diameter approximately in the range of 5-100 nanometers. A ratio of weight % of the solid component to weight % of the plurality of particles is approximately in the range of 1:0.1-1:4.
    Type: Grant
    Filed: May 13, 2016
    Date of Patent: October 17, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Wenguang Li, James S. Papanu, Ramesh Krishnamurthy, Prabhat Kumar, Brad Eaton, Ajay Kumar, Alexander N. Lerner
  • Patent number: 9783882
    Abstract: In various embodiments, a sputtering target initially formed by ingot metallurgy or powder metallurgy and rejuvenated by, e.g., cold spray, is utilized in sputtering processes to produce metallic thin films.
    Type: Grant
    Filed: September 10, 2014
    Date of Patent: October 10, 2017
    Assignees: H.C. Starck Inc., H.C. Starck GmbH
    Inventors: Steven A. Miller, Prabhat Kumar, Richard Wu, Shuwei Sun, Stefan Zimmermann, Olaf Schmidt-Park