Patents by Inventor Prabhat SHANKAR

Prabhat SHANKAR has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250264872
    Abstract: Historic operating data for one or more parameters of a machine are obtained. The historic operating data is subsampled to generate a plurality of clusters based on domain knowledge for the machine, each cluster representing data points from the historic operating data that are associated with an operating region for the machine, the domain knowledge includes one or more model parameters associated with the machine. A model file is generated that includes the plurality of clusters of the data points and the one or more model parameters. Test data from the machine is received. A number of nearest neighbors is calculated from the plurality of clusters of the model file to the test data using an algorithm. A distance of the test data from the number of nearest neighbors is calculated. An action is executed based on comparing the distance to a threshold value.
    Type: Application
    Filed: February 15, 2024
    Publication date: August 21, 2025
    Applicant: ABB Schweiz AG
    Inventors: Anush Mishra, Swetha Gunniguntala, Prabhat Shankar, Anindya Chatterjee, Rajesh Ramachandran
  • Patent number: 12172323
    Abstract: The present invention relates to a method and a system for detecting anomalies in a robotic system in an industrial plant. The robotic system is associated with a computing system configured to detect an anomaly in the robotic system. The computer system monitors configuration parameters of the robotic system and process parameters associated with the robotic system. Further, the computing system detects an association between at least one configuration parameter and at least one process parameter for obtaining optimal configuration parameters and optimal process parameters. The optimal configuration parameters and optimal process parameters are analyzed for detecting an anomaly. At least one parameter among the configuration parameters and the process parameters is identified causing the anomaly. Thereafter, the detected anomaly is validated, valid setpoint is estimated and the estimated valid setpoint is updated in the analytics model.
    Type: Grant
    Filed: December 5, 2019
    Date of Patent: December 24, 2024
    Assignee: ABB Schweiz AG
    Inventors: Mohak Sukhwani, Divyasheel Sharma, Sudarshan M V, Prabhat Shankar, Aravindhan Gk
  • Patent number: 11528306
    Abstract: A processor may establish a virtual collaboration between two or more users. The processor may determine whether there is an interference with the virtual collaboration. The processor may maintain the virtual collaboration. The processor may generate an interference report associated with the interference. The processor may provide the interference report to at least one of the two or more users.
    Type: Grant
    Filed: July 30, 2021
    Date of Patent: December 13, 2022
    Assignee: International Business Machines Corporation
    Inventors: Sivaraj Subbaiyan, Ramprasad Bhat, Ponnala Praveen Kumar, Prabhat Shankar
  • Publication number: 20220118619
    Abstract: The present invention relates to a method and a system for detecting anomalies in a robotic system in an industrial plant. The robotic system is associated with a computing system configured to detect an anomaly in the robotic system. The computer system monitors configuration parameters of the robotic system and process parameters associated with the robotic system. Further, the computing system detects an association between at least one configuration parameter and at least one process parameter for obtaining optimal configuration parameters and optimal process parameters. The optimal configuration parameters and optimal process parameters are analyzed for detecting an anomaly. At least one parameter among the configuration parameters and the process parameters is identified causing the anomaly. Thereafter, the detected anomaly is validated, valid setpoint is estimated and the estimated valid setpoint is updated in the analytics model.
    Type: Application
    Filed: December 5, 2019
    Publication date: April 21, 2022
    Inventors: Mohak SUKHWANI, Divyasheel SHARMA, Sudarshan M V, Prabhat SHANKAR, Aravindhan GK