Patents by Inventor Prajwal Nagaraj

Prajwal Nagaraj has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • REACTOR SYSTEM INCLUDING A GAS DISTRIBUTION ASSEMBLY FOR USE WITH ACTIVATED SPECIES AND METHOD OF USING SAME
    Publication number: 20210102292
    Abstract: A reactor system including a gas distribution assembly and method of using the reactor system are disclosed. The gas distribution assembly includes a gas distribution device, a gas expansion area, and a showerhead plate downstream of the gas distribution device and the expansion area.
    Type: Application
    Filed: October 1, 2020
    Publication date: April 8, 2021
    Inventors: Xing Lin, Peipei Gao, Prajwal Nagaraj, Mingyang Ma, Wentao Wang, Ion Hong Chao, Alexandros Demos, Paul Ma, Hichem M'Saad
  • HIGH TEMPERATURE COATINGS FOR A PRECLEAN AND ETCH APPARATUS AND RELATED METHODS
    Publication number: 20200131634
    Abstract: A coating and a method to form the coating is proposed for a semiconductor film pre-clean and etch apparatus. The coating may be employed in environments where it is difficult to use a traditional coating or coating method. The coatings provide advantages including: an ability to effectively deliver hydrogen radicals and fluorine radicals to a wafer surface in one apparatus or individually in two apparatuses; a coverage of high aspect ratio features on critical components; an operability in high temperatures exceeding 150° C.; and a protection of a part with high aspect ratio features underneath the coating, thereby preventing metal and particles on a processed wafer.
    Type: Application
    Filed: October 26, 2018
    Publication date: April 30, 2020
    Inventors: Peipei Gao, Xing Lin, Alexandros Demos, Chuang Wei, Wentao Wang, Mingyang Ma, Prajwal Nagaraj