Patents by Inventor Prakash Periasamy

Prakash Periasamy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10900923
    Abstract: Moisture detection and ingression monitoring systems and methods of manufacture are provided. The moisture detection structure includes chip edge sealing structures including at least one electrode forming a capacitor structured to detect moisture ingress within an integrated circuit. The at least one electrode and a second electrode of the capacitor is biased to ground and to a moisture detection circuit or vice versa, respectively.
    Type: Grant
    Filed: October 17, 2019
    Date of Patent: January 26, 2021
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Fen Chen, Jeffrey P. Gambino, Carole D. Graas, Wen Liu, Prakash Periasamy
  • Patent number: 10702483
    Abstract: The present invention provides Janus particles and a novel vesicle. In particular, the novel vesicle comprises a plurality of the Janus particles. The Janus particles have symmetric and asymmetric stretching vibrations of CH2 at about 2920 and 2850 cm?1, each with a shoulder, in Fourier transform infrared spectrum.
    Type: Grant
    Filed: April 9, 2018
    Date of Patent: July 7, 2020
    Assignee: NATIONAL TAIWAN UNIVERSITY
    Inventors: Huan-Tsung Chang, Tzu-Heng Chen, Arun Prakash Periasamy
  • Publication number: 20200049651
    Abstract: Moisture detection and ingression monitoring systems and methods of manufacture are provided. The moisture detection structure includes chip edge sealing structures including at least one electrode forming a capacitor structured to detect moisture ingress within an integrated circuit. The at least one electrode and a second electrode of the capacitor is biased to ground and to a moisture detection circuit or vice versa, respectively.
    Type: Application
    Filed: October 17, 2019
    Publication date: February 13, 2020
    Inventors: Fen CHEN, Jeffrey P. GAMBINO, Carole D. GRAAS, Wen LIU, Prakash PERIASAMY
  • Patent number: 10545111
    Abstract: Moisture detection and ingression monitoring systems and methods of manufacture are provided. The moisture detection structure includes chip edge sealing structures including at least one electrode forming a capacitor structured to detect moisture ingress within an integrated circuit. The at least one electrode and a second electrode of the capacitor is biased to ground and to a moisture detection circuit or vice versa, respectively.
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: January 28, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Fen Chen, Jeffrey P. Gambino, Carole D. Graas, Wen Liu, Prakash Periasamy
  • Patent number: 10545110
    Abstract: Moisture detection and ingression monitoring systems and methods of manufacture are provided. The moisture detection structure includes chip edge sealing structures including at least one electrode forming a capacitor structured to detect moisture ingress within an integrated circuit. The at least one electrode and a second electrode of the capacitor is biased to ground and to a moisture detection circuit or vice versa, respectively.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: January 28, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Fen Chen, Jeffrey P. Gambino, Carole D. Graas, Wen Liu, Prakash Periasamy
  • Patent number: 10510675
    Abstract: Embodiments of the disclosure provide a substrate structure for an integrated circuit (IC) structure, including: a first dielectric layer positioned above a semiconductor substrate; a first plurality of trenches extending at least partially into the first dielectric layer from an upper surface of the first dielectric layer; and a first metal formed within the first plurality of trenches, wherein a spatial arrangement of the first plurality of trenches causes coupling of surface plasmons in the first metal to at least one wavelength of an incident light.
    Type: Grant
    Filed: February 5, 2018
    Date of Patent: December 17, 2019
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Somnath Ghosh, Eswar Ramanathan, Qanit Takmeel, Ming He, Jeric Sarad, Ashwini Chandrashekar, Colin Bombardier, Anbu Selvam KM Mahalingam, Keith P. Donegan, Prakash Periasamy
  • Patent number: 10383829
    Abstract: The present invention provides a process for forming Janus particles. The novel application of the Janus particles is also disclosed in the present invention. In particular, the Janus particles have an average diameter less than 10 nm and a peak between 2850 and 2921 cm?1 in Fourier transform infrared spectrum.
    Type: Grant
    Filed: April 9, 2018
    Date of Patent: August 20, 2019
    Assignee: NATIONAL TAIWAN UNIVERSITY
    Inventors: Huan-Tsung Chang, Tzu-Heng Chen, Arun Prakash Periasamy
  • Publication number: 20190250116
    Abstract: Moisture detection and ingression monitoring systems and methods of manufacture are provided. The moisture detection structure includes chip edge sealing structures including at least one electrode forming a capacitor structured to detect moisture ingress within an integrated circuit. The at least one electrode and a second electrode of the capacitor is biased to ground and to a moisture detection circuit or vice versa, respectively.
    Type: Application
    Filed: April 23, 2019
    Publication date: August 15, 2019
    Inventors: Fen CHEN, Jeffrey P. GAMBINO, Carole D. GRAAS, Wen LIU, Prakash PERIASAMY
  • Publication number: 20190244911
    Abstract: Embodiments of the disclosure provide a substrate structure for an integrated circuit (IC) structure, including: a first dielectric layer positioned above a semiconductor substrate; a first plurality of trenches extending at least partially into the first dielectric layer from an upper surface of the first dielectric layer; and a first metal formed within the first plurality of trenches, wherein a spatial arrangement of the first plurality of trenches causes coupling of surface plasmons in the first metal to at least one wavelength of an incident light.
    Type: Application
    Filed: February 5, 2018
    Publication date: August 8, 2019
    Inventors: Somnath Ghosh, Eswar Ramanathan, Qanit Takmeel, Ming He, Jeric Sarad, Ashwini Chandrashekar, Colin Bombardier, Anbu Selvam KM Mahalingam, Keith P. Donegan, Prakash Periasamy
  • Patent number: 10324056
    Abstract: Moisture detection and ingression monitoring systems and methods of manufacture are provided. The moisture detection structure includes chip edge sealing structures including at least one electrode forming a capacitor structured to detect moisture ingress within an integrated circuit. The at least one electrode and a second electrode of the capacitor is biased to ground and to a moisture detection circuit or vice versa, respectively.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: June 18, 2019
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Fen Chen, Jeffrey P. Gambino, Carole D. Graas, Wen Liu, Prakash Periasamy
  • Patent number: 10309919
    Abstract: Moisture detection and ingression monitoring systems and methods of manufacture are provided. The moisture detection structure includes chip edge sealing structures including at least one electrode forming a capacitor structured to detect moisture ingress within an integrated circuit. The at least one electrode and a second electrode of the capacitor is biased to ground and to a moisture detection circuit or vice versa, respectively.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: June 4, 2019
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Fen Chen, Jeffrey P. Gambino, Carole D. Graas, Wen Liu, Prakash Periasamy
  • Publication number: 20180356359
    Abstract: Moisture detection and ingression monitoring systems and methods of manufacture are provided. The moisture detection structure includes chip edge sealing structures including at least one electrode forming a capacitor structured to detect moisture ingress within an integrated circuit. The at least one electrode and a second electrode of the capacitor is biased to ground and to a moisture detection circuit or vice versa, respectively.
    Type: Application
    Filed: August 21, 2018
    Publication date: December 13, 2018
    Inventors: Fen CHEN, Jeffrey P. GAMBINO, Carole D. GRAAS, Wen LIU, Prakash PERIASAMY
  • Publication number: 20180356358
    Abstract: Moisture detection and ingression monitoring systems and methods of manufacture are provided. The moisture detection structure includes chip edge sealing structures including at least one electrode forming a capacitor structured to detect moisture ingress within an integrated circuit. The at least one electrode and a second electrode of the capacitor is biased to ground and to a moisture detection circuit or vice versa, respectively.
    Type: Application
    Filed: August 21, 2018
    Publication date: December 13, 2018
    Inventors: Fen CHEN, Jeffrey P. GAMBINO, Carole D. GRAAS, Wen LIU, Prakash PERIASAMY
  • Patent number: 10126260
    Abstract: Moisture detection and ingression monitoring systems and methods of manufacture are provided. The moisture detection structure includes chip edge sealing structures including at least one electrode forming a capacitor structured to detect moisture ingress within an integrated circuit. The at least one electrode and a second electrode of the capacitor is biased to ground and to a moisture detection circuit.
    Type: Grant
    Filed: May 7, 2015
    Date of Patent: November 13, 2018
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Fen Chen, Jeffrey P. Gambino, Carole D. Graas, Wen Liu, Prakash Periasamy
  • Patent number: 10078183
    Abstract: The disclosure relates to semiconductor structures and, more particularly, to waveguide structures used in phonotics chip packaging and methods of manufacture. The structure includes: a first die comprising photonics functions including a waveguide structure; a second die bonded to the first die and comprising CMOS logic functions; and an optical fiber optically coupled to the waveguide structure and positioned within a cavity formed in the second die.
    Type: Grant
    Filed: December 11, 2015
    Date of Patent: September 18, 2018
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Shawn A. Adderly, Samantha D. DiStefano, Jeffrey P. Gambino, Prakash Periasamy, Donald R. Letourneau
  • Publication number: 20180221291
    Abstract: The present invention provides a process for forming Janus particles. The novel application of the Janus particles is also disclosed in the present invention. In particular, the Janus particles have an average diameter less than 10 nm and a peak between 2850 and 2921 cm?1 in Fourier transform infrared spectrum.
    Type: Application
    Filed: April 9, 2018
    Publication date: August 9, 2018
    Inventors: Huan-Tsung Chang, Tzu-Heng Chen, Arun Prakash Periasamy
  • Publication number: 20180221292
    Abstract: The present invention provides Janus particles and a novel vesicle. In particular, the novel vesicle comprises a plurality of the Janus particles. The Janus particles have symmetric and asymmetric stretching vibrations of CH2 at about 2920 and 2850 cm?1, each with a shoulder, in Fourier transform infrared spectrum.
    Type: Application
    Filed: April 9, 2018
    Publication date: August 9, 2018
    Inventors: Huan-Tsung Chang, Tzu-Heng Chen, Arun Prakash Periasamy
  • Patent number: 9962337
    Abstract: The present invention provides a process for forming a substance with a superstructure and a process for forming Janus particles. The novel application of the substance with the superstructure and the Janus particles are also disclosed in the present invention. The substance with the superstructure comprises vesicle and hydrogel. The vesicle and hydrogel are prepared in a solution with different ionic strength range.
    Type: Grant
    Filed: February 23, 2017
    Date of Patent: May 8, 2018
    Assignee: NATIONAL TAIWAN UNIVERSITY
    Inventors: Huan-Tsung Chang, Tzu-Heng Chen, Arun Prakash Periasamy
  • Patent number: 9851397
    Abstract: A system for electromigration testing is disclosed. The system includes a conductive member, a cap layer of insulative material over at least a portion of a top surface of the conductive member, a cathode conductively connected to a first end of the conductive member; an anode conductively connected to a second end of the conductive member, and a current source conductively connected to the cathode and the anode. A plurality of sensory pins are disposed along a length of the conductive member between the first end and the second end of the conductive member. The sensory pins are conductively connected to a bottom surface of the conductive member. At least one measurement device is conductively connected to at least one sensory pin of the plurality of sensory pins. The at least one measurement device determines a resistance of at least one portion of the conductive member.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: December 26, 2017
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Fen Chen, Cathryn J. Christiansen, Deborah M. Massey, Prakash Periasamy, Michael A. Shinosky
  • Publication number: 20170354612
    Abstract: The present invention provides a process for forming a substance with a superstructure and a process for forming Janus particles. The novel application of the substance with the superstructure and the Janus particles are also disclosed in the present invention. The substance with the superstructure comprises vesicle and hydrogel. The vesicle and hydrogel are prepared in a solution with different ionic strength range.
    Type: Application
    Filed: February 23, 2017
    Publication date: December 14, 2017
    Inventors: Huan-Tsung Chang, Tzu-Heng Chen, Arun Prakash Periasamy