Patents by Inventor Pranab Sabitru Naik

Pranab Sabitru Naik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8053724
    Abstract: An instrumentation setup is provided to process electronic signals in a positron imager functioning in two different modes of operations for scanning both bulk and thin film materials. According to one part of an implementation, an instrumentation setup comprises an XY-rastering stepper motor apparatus coupled with LVDTs (Linear Variable Differential Transformers), and nuclear signal processing and high speed data acquisition sections. Imaging of bulk material samples may be enabled by scanning a positron point source across a surface of samples. In another part of the irnplenientation, the instrumentation setup may comprise an electromagnetic deflection control arrangement in conjunction with a guided monoenergetic positron beam together with nuclear signal processing and data acquisition arrangements. This part of the implementation may scan and produce images for thin film samples. The instrumentation setup is capable of producing high quality real-time S-parameter images.
    Type: Grant
    Filed: June 15, 2010
    Date of Patent: November 8, 2011
    Assignee: The University of Hong Kong
    Inventors: Pranab Sabitru Naik, Christopher David Beling, Stevenson H. Y. Fung
  • Publication number: 20100322505
    Abstract: Disclosed is a fully automated system capable of producing high quality real-time S-parameter images. It is a useful and versatile tool in Material Science and Solid State Technology for determining the location of subsurface defect types and concentrations on bulk-materials as well as thin-films. The system is also useful in locating top surface metallizations and structures in solid state devices. This imaging system operates by scanning the sample surface with either a small positron source (22Na) or a focused positron beam. The system also possesses another two major parts, namely electronic instrumentation and stand-alone imaging software. In the system, the processing time and use of system resources are constantly monitored and optimized for producing high resolution S-parameter image of the sample in real time with a general purpose personal computer.
    Type: Application
    Filed: June 15, 2010
    Publication date: December 23, 2010
    Inventors: Pranab Sabitru Naik, Christopher David Beling, Stevenson H.Y. Fung
  • Patent number: 7781732
    Abstract: Disclosed is a fully automated system capable of producing high quality real-time S-parameter images. It is a useful and versatile tool in Material Science and Solid State Technology for determining the location of subsurface defect types and concentrations on bulk-materials as well as thin-films. The system is also useful in locating top surface metallizations and structures in solid state devices. This imaging system operates by scanning the sample surface with either a small positron source (22Na) or a focused positron beam. The system also possesses another two major parts, namely electronic instrumentation and stand-alone imaging software. In the system, the processing time and use of system resources are constantly monitored and optimized for producing high resolution S-parameter image of the sample in real time with a general purpose personal computer.
    Type: Grant
    Filed: May 4, 2007
    Date of Patent: August 24, 2010
    Assignee: The University of Hong Kong
    Inventors: Pranab Sabitru Naik, Christopher David Beling, Stevenson H. Y. Fung
  • Patent number: 7420166
    Abstract: Disclosed is a fully automated system capable of producing high quality real-time S-parameter images. It is a useful and versatile tool in Material Science and Solid State Technology for determining the location of subsurface defect types and concentrations in bulk-materials as well as thin-films. The system is also useful in locating top surface metallizations and structures in solid state devices. This imaging system operates by scanning the sample surface with either a small positron source (22Na) or a focused positron beam. The system also possesses another two major parts, namely electronic instrumentation and stand-alone imaging software. In the system, the processing time and use of system resources are constantly monitored and optimized for producing high resolution S-parameter image of the sample in real time with a general purpose personal computer.
    Type: Grant
    Filed: July 14, 2004
    Date of Patent: September 2, 2008
    Assignee: The University of Hong Kong
    Inventors: Pranab Sabitru Naik, Christopher David Beling, Stevenson H. Y. Fung