Patents by Inventor Prasad R. Akkapeddi

Prasad R. Akkapeddi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6905657
    Abstract: In a liquid handling system including a liquid handling substrate having a plurality of channels for conducting a liquid sample in said substrate, where the channels terminate in a plurality of exit ports in an outer surface of the substrate for transfer of a quantity of the liquid sample. The handling system also includes a liquid storage and dispensing substrate having a plurality of separable cartridges corresponding to the channels, with each cartridge terminating at a microelectro mechanical system (MEMS) comprising a laminate of glass, silicon and a piezoelectric substance. The handling system further includes a liquid detecting system comprising a light emitting diode and a photo-detector, where each channel includes a reservoir in communication with a corresponding cartridge creating an interface therebetween.
    Type: Grant
    Filed: April 5, 2001
    Date of Patent: June 14, 2005
    Assignee: BioProcessors Corp.
    Inventors: Allyn Hubbard, Samesh Kale, Scott Rollins, Jeremy P. Springhorn, Stephen P. Squinto, Prasad R. Akkapeddi
  • Publication number: 20020025582
    Abstract: In a liquid handling system including a liquid handling substrate having a plurality of channels for conducting a liquid sample in said substrate, where the channels terminate in a plurality of exit ports in an outer surface of the substrate for transfer of a quantity of the liquid sample. The handling system also includes a liquid storage and dispensing substrate having a plurality of separable cartridges corresponding to the channels, with each cartridge terminating at a microelectro mechanical system (MEMS) comprising a laminate of glass, silicon and a piezoelectric substance. The handling system further includes a liquid detecting system comprising a light emitting diode and a photo-detector, where each channel includes a reservoir in communication with a corresponding cartridge creating an interface therebetween.
    Type: Application
    Filed: April 5, 2001
    Publication date: February 28, 2002
    Inventors: Allyn Hubbard, Samesh Kale, Scott Rollins, Jeremy P. Springhorn, Stephen P. Squinto, Prasad R. Akkapeddi
  • Patent number: 6005256
    Abstract: Disclosed are a method and apparatus for determining whether one or more organic substances, namely, proteins (42) and associated cancer cells (40'), are present in a sample (4a). The method comprises a step of deploying a plurality of fluorescent materials (40) in the tissue sample, individual ones of the plurality of fluorescent materials (40) being selected for coupling to a specific type of substance (42) of interest. The fluorescent materials (40) generally emit characteristic wavelengths in response to being illuminated with excitation light (14a'-14c') having predetermined excitation wavelengths. A next step includes illuminating the sample (4a) with the excitation light (14a'-14c'). The excitation light (14a'-14c') causes any of the fluorescent materials (40) that are disposed within the illuminated portion of the sample (4a), and which are responsive to the excitation wavelengths, to emit their characteristic wavelengths.
    Type: Grant
    Filed: February 12, 1998
    Date of Patent: December 21, 1999
    Assignee: Raytheon Company
    Inventors: Charles L. McGlynn, Prasad R. Akkapeddi
  • Patent number: 4949056
    Abstract: An improved adaptive optics system is disclosed for correcting atmospheric phase aberrations. A satellite (10) laser beacon is operated at the Stokes shifted Raman wavelength. After passing through the atmosphere (A), the signal is phase conjugated (16) and amplified in the Raman amplifier (12). The result is a high energy laser beam with phase conjugated aberrations which may be returned to the satellite (10).
    Type: Grant
    Filed: July 29, 1985
    Date of Patent: August 14, 1990
    Assignee: The Perkin-Elmer Corporation
    Inventor: Prasad R. Akkapeddi
  • Patent number: 4897325
    Abstract: An apparatus and method for the generation of patterns on large optics. A coating layer is deposited on the surface of a large substrate, whereupon a photoresist layer is deposited on the coating layer in relatively small localized areas. A flexible mask is fabricated embodying the pattern to be generated. This flexible mask is then aligned with any desired point on the substrate and brought into contact with the photoresist layer. The photoresist layer is then exposed and each localized area is developed and the underlying coating layer is etched. After the excess photoresist material is washed away the pattern, etched into the coating layer, remains.
    Type: Grant
    Filed: November 23, 1988
    Date of Patent: January 30, 1990
    Assignee: The Perkin-Elmer Corporation
    Inventors: Prasad R. Akkapeddi, Robert E. Hufnagel
  • Patent number: 4810621
    Abstract: An apparatus and method for the generation of patterns on large optics. A coating layer is deposited on the surface of a large substrate, whereupon a photoresist layer is deposited on the coating layer in relatively small localized areas. A flexible mask is fabricated embodying the pattern to be generated. This flexible mask is then aligned with any desired point on the substrate and brought into contact with the photoresist layer. The photoresist layer is then exposed and each localized area is developed and the underlying coating layer is etched. After the excess photoresist material is washed away the pattern, etched into the coating layer, remains.
    Type: Grant
    Filed: March 27, 1987
    Date of Patent: March 7, 1989
    Assignee: The Perkin-Elmer Corporation
    Inventors: Prasad R. Akkapeddi, Robert E. Hufnagel
  • Patent number: 4668083
    Abstract: An apparatus and method for the generation of patterns on large optics. A coating layer is deposited on the surface of a large substrate, whereupon a photoresist layer is deposited on the coating layer in relatively small localized areas. A flexible mask is fabricated embodying the pattern to be generated. This flexible mask is then aligned with any desired point on the substrate and brought into contact with the photoresist layer. The photoresist layer is then exposed and each localized area is developed and the underlying coating layer is etched. After the excess photoresist material is washed away the pattern, etched into the coating layer, remains.
    Type: Grant
    Filed: November 18, 1985
    Date of Patent: May 26, 1987
    Assignee: The Perkin-Elmer Corporation
    Inventors: Prasad R. Akkapeddi, Robert E. Hufnagel