Patents by Inventor Prasanth Narayanan

Prasanth Narayanan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240141492
    Abstract: Susceptor assemblies having a susceptor base with a plurality of pockets formed in a surface thereof are described. Each of the pockets has a pocket edge angle in the range of 30 to 75° and a pocket edge radius in the range of 0.40±0.05 mm to 1.20 mm±0.05 mm. The pockets have a raised central region and an outer region that is deeper than the raised central region, relative to the surface of the surface of the susceptor base.
    Type: Application
    Filed: March 23, 2023
    Publication date: May 2, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Prasanth Narayanan, Vijayabhaskara Venkatagiriyappa, Keiichi Tanaka, Ning Li, Robert B. Moore, Robert C. Linke, Mandyam Sriram, Mario D. Silvetti, Michael Racine, Tae Kwang Lee
  • Publication number: 20230307216
    Abstract: Processing chambers comprising a chamber body, a remote plasma source (RPS) outside the chamber body, a first connection line between the remote plasma source and the interior volume of the chamber body through the top wall and a second connection line between the remote plasma source and the interior volume through the sidewall of the chamber body. Methods of cleaning a processing chamber comprising flowing an etchant gas through the RPS into the chamber body, followed by a flow recovery gas through the RPS into the chamber body through both the first connection line and second connection line.
    Type: Application
    Filed: October 18, 2022
    Publication date: September 28, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Prasanth Narayanan, Shrihari Sampathkumar, Keiichi Tanaka, Mario D. Sanchez, Muhammad M. Rasheed, Mandyam Sriram
  • Patent number: 11133205
    Abstract: Apparatus and methods to process one or more substrate are described. A processing chamber comprises a support assembly, a chamber lid, and a controller. The chamber lid has a front surface facing the support assembly, a first sensor on the front surface and a second sensor on the front surface, the first sensor positioned at a first distance from the central rotational axis, and the second sensor positioned at a second distance from the central rotational axis greater than the first distance. The controller is configured to determine if a substrate is within or outside of the substrate support region of the support assembly.
    Type: Grant
    Filed: May 18, 2020
    Date of Patent: September 28, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Sanggyum Kim, Prasanth Narayanan, Subramanian Tamilmani, Mandyam Sriram
  • Publication number: 20200373178
    Abstract: Apparatus and methods to process one or more substrate are described. A processing chamber comprises a support assembly, a chamber lid, and a controller. The chamber lid has a front surface facing the support assembly, a first sensor on the front surface and a second sensor on the front surface, the first sensor positioned at a first distance from the central rotational axis, and the second sensor positioned at a second distance from the central rotational axis greater than the first distance. The controller is configured to determine if a substrate is within or outside of the substrate support region of the support assembly.
    Type: Application
    Filed: May 18, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Sanggyum Kim, Prasanth Narayanan, Subramanian Tamilmani, Mandyam Sriram