Patents by Inventor Prashant Agarwal
Prashant Agarwal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12252486Abstract: The present invention provides a crystalline form and stable salts of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1-piperazinyl)pyrido[2,3-d]pyrimidin-2(1H)-one, including several hydrochloride salt forms, phosphate salt form, mesylate salt form, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.Type: GrantFiled: May 20, 2020Date of Patent: March 18, 2025Assignee: Amgen Inc.Inventors: Mary Chaves, Ron C. Kelly, Prashant Agarwal, Stephan D. Parent, Darren Leonard Reid, Roman Shimanovich
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Publication number: 20240395514Abstract: Embodiments of multi-chamber processing tools are provided herein. In some embodiments, a multi-chamber processing tool includes: a factory interface configured to receive a substrate; a pre-heat chamber directly coupled to the factory interface; a load lock chamber coupled to the factory interface and having a first slit valve disposed therebetween, wherein the load lock chamber is coupled to a pump configured to create a vacuum environment when the first slit valve is in a closed position; a degas chamber coupled to the factory interface and having a second slit valve, wherein the degas chamber is coupled to a second pump configured to create a vacuum environment when the second slit valve is in a closed position, and wherein the degas chamber includes a heat source; one or more process chambers; and a transfer chamber coupled to the load lock chamber, the degas chamber, and the one or more process chambers.Type: ApplicationFiled: May 26, 2023Publication date: November 28, 2024Inventors: Prashant AGARWAL, Junqi WEI, Ananthkrishna JUPUDI, Clinton GOH, Tuck Foong KOH, Kai Liang LIEW
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Patent number: 12110585Abstract: Embodiments of exhaust liner systems are provided herein. In some embodiments, an exhaust liner system for use in a process chamber includes a lower exhaust liner having an annular body with a central opening; an upper flange, a central flange, and a lower flange extending outward from the annular body, wherein the lower flange and the central flange partially define a first plenum, and wherein the central flange and the upper flange partially define a second plenum; a plurality of exhaust holes from the central opening to the first plenum; and at least one cutout in the central flange to provide a flow path from the first plenum to the second plenum, wherein the lower exhaust liner defines a gas flow path from the central opening to the first plenum via the plurality of exhaust holes and from the first plenum to the second plenum via the least one cutout.Type: GrantFiled: February 4, 2021Date of Patent: October 8, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Naman Apurva, Lara A. Hawrylchak, Mahesh Ramakrishna, Sriharish Srinivasan, Prashant Agarwal
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Publication number: 20240327384Abstract: Disclosed herein is a salt, a crystalline anhydrous form, a hydrate, a solvate, or a co-crystal of a free base compound 2-(6-azaspiro[2.5]octan-6-yl)-N-[2-(4,4-difluoropiperidin-1-yl)-6-methylpyrimidin-4-yl]-4-[(2-hydroxyethanesulfonyl)amino]benzamide (Compound A); method of preparation, pharmaceutical compositions, and method of treating a disease mediated by a motor protein kinesin family member 18A (KIF18A) inhibition, wherein said disease is a neoplastic disease, including a cancer or a tumor.Type: ApplicationFiled: July 21, 2022Publication date: October 3, 2024Applicant: Amgen Inc.Inventors: Tian WU, Prashant AGARWAL, Andreas R. ROTHELI, Hyunsoo PARK, Michael J. FROHN
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Publication number: 20240067647Abstract: The present disclosure provides crystalline and amorphous forms of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1-piperazinyl)pyrido[2,3-d]pyrimidin-2(1H)-one, including several anhydrous, hydrate and solvate forms, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.Type: ApplicationFiled: October 23, 2023Publication date: February 29, 2024Applicant: AMGEN INC.Inventors: Mary CHAVES, Patricia LOPEZ, Prashant AGARWAL, Albert AMEGADZIE, Stephanie AZALI, Roman SHIMANOVICH, Ron C. KELLY, Darren Leonard REID
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Patent number: 11870202Abstract: Methods and apparatus for processing a substrate. For example, a processing chamber can include a power source, an amplifier connected to the power source, comprising at least one of a gallium nitride (GaN) transistor or a gallium arsenide (GaAs) transistor, and configured to amplify a power level of an input signal received from the power source to heat a substrate in a process volume, and a cooling plate configured to receive a coolant to cool the amplifier during operation.Type: GrantFiled: September 2, 2020Date of Patent: January 9, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Rajesh Kumar Putti, Vinodh Ramachandran, Ananthkrishna Jupudi, Lean Wui Koh, Prashant Agarwal
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Patent number: 11827635Abstract: The present disclosure provides crystalline and amorphous forms of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1-piperazinyl)pyrido[2,3-d]pyrimidin-2(1H)-one, including several anhydrous, hydrate and solvate forms, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.Type: GrantFiled: December 16, 2021Date of Patent: November 28, 2023Assignee: Amgen Inc.Inventors: Mary Chaves, Patricia Lopez, Prashant Agarwal, Albert Amegadzie, Stephanie Azali, Roman Shimanovich, Ron C. Kelly, Darren Leonard Reid
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Publication number: 20230343615Abstract: A system for degassing substrates provides reduced infrared sources in a degas chamber. In some embodiments, the system includes a degas chamber with a microwave source and an infrared temperature sensor positioned in a bottom of the degas chamber, at least one hoop with an annular shape that is configured to support or lift a substrate and is formed from at least one first material that is opaque to microwaves and has an emissivity of 0.1 or less, and at least one actuator with a movable vertical shaft. Each of the at least one actuator is attached under one of the hoops at an outer perimeter of the hoop. The portion of the movable vertical shaft that is exposed to microwaves from the microwave source in the degas chamber is formed from at least one second material that is opaque to microwaves and has an emissivity of 0.1 or less.Type: ApplicationFiled: April 22, 2022Publication date: October 26, 2023Inventors: Prashant AGARWAL, Tuck Foong KOH, Ananthkrishna JUPUDI
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Patent number: 11630001Abstract: An apparatus for determining temperatures of substrates in microwave and/or vacuum environments. A substrate holder with a plurality of support pins includes a temperature sensor assembly with at least a portion of a surface with a phosphorous coating is configured to be inserted in at least one pin support position from an inner area of the substrate holder and in at least one pin support position from an outer area of the substrate holder. The temperature sensor assembly includes a temperature sensor pin with a spring that is microwave transparent. The temperature sensor pin is made of a material with a thermal conductivity greater than approximately 200 W/mK and a low thermal mass which is microwave transparent. An optical transmission assembly is embedded into at least a portion of the substrate holder to receive light emissions from a surface of the temperature sensor pin.Type: GrantFiled: October 19, 2020Date of Patent: April 18, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Ananthkrishna Jupudi, Sai Kumar Kodumuri, Vinodh Ramachandran, Prashant Agarwal, Hadi Bin Amir Muhammad
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Publication number: 20230086151Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate comprises performing a first vacuum processing procedure on a substrate, obtaining temperature measurements of the substrate from a vacuum thermocouple, obtaining temperature measurements of the substrate from a non-contact infrared sensor, calibrating the non-contact infrared sensor based on the temperature measurements from the vacuum thermocouple and the temperature measurements from the non-contact infrared sensor, and performing a second vacuum processing procedure on the substrate using the calibrated non-contact infrared sensor.Type: ApplicationFiled: September 23, 2021Publication date: March 23, 2023Inventors: Tuck Foong KOH, Ananthkrishna JUPUDI, Prashant AGARWAL
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Publication number: 20220406643Abstract: Embodiments of substrate supports for use in microwave degas chambers are provided herein. In some embodiments, a substrate support for use in a microwave degas chamber includes a support plate having one or more support features for supporting a substrate; a susceptor comprising a plate disposed on the support plate, wherein the susceptor includes one or more openings, wherein the one or more support features extend through corresponding ones of the one or more openings; and a metal foil disposed beneath a side of the susceptor facing the support plate.Type: ApplicationFiled: June 18, 2021Publication date: December 22, 2022Inventors: Tuck Foong KOH, Prashant AGARWAL, Ananthkrishna JUPUDI
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Publication number: 20220235045Abstract: The present invention provides a crystalline form and stable salts of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1- piperazinyl)pyrido[2,3-d]pyrimidin-2(1H)-one, including several hydrochloride salt forms, phosphate salt form, mesylate salt form, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.Type: ApplicationFiled: May 20, 2020Publication date: July 28, 2022Inventors: Mary CHAVES, Ron C. KELLY, Prashant AGARWAL, Stephan D. PARENT, Darren Leonard REID, Roman SHIMANOVICH
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Patent number: 11362404Abstract: Apparatus for transmitting microwaves into a process chamber using a microwave pressure window assembly. The microwave pressure window assembly may include a first plate with a first aperture surrounded by a first recess for a first pressure seal, a second plate with a second aperture surrounded by a second recess for a second pressure seal, a dielectric plate configured to transmit microwaves and interposed between the first plate and the second plate and between the first pressure seal and the second pressure seal. The apertures include a first vertical step area on a first vertical side of the apertures and a second vertical step area on a second vertical side of the apertures opposite of the first vertical side. The first vertical step areas and the second vertical step areas may have a thickness of approximately 50% of a thickness of the plates that includes a dielectric plate recess.Type: GrantFiled: October 30, 2020Date of Patent: June 14, 2022Assignee: APPLIED MATERIALS, INC.Inventors: Rajesh Kumar Putti, Prashant Agarwal, Ananthkrishna Jupudi
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Publication number: 20220140456Abstract: Apparatus for transmitting microwaves into a process chamber using a microwave pressure window assembly. The microwave pressure window assembly may include a first plate with a first aperture surrounded by a first recess for a first pressure seal, a second plate with a second aperture surrounded by a second recess for a second pressure seal, a dielectric plate configured to transmit microwaves and interposed between the first plate and the second plate and between the first pressure seal and the second pressure seal. The apertures include a first vertical step area on a first vertical side of the apertures and a second vertical step area on a second vertical side of the apertures opposite of the first vertical side. The first vertical step areas and the second vertical step areas may have a thickness of approximately 50% of a thickness of the plates that includes a dielectric plate recess.Type: ApplicationFiled: October 30, 2020Publication date: May 5, 2022Inventors: Rajesh Kumar PUTTI, Prashant AGARWAL, Ananthkrishna JUPUDI
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Publication number: 20220106313Abstract: The present disclosure provides crystalline and amorphous forms of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1-piperazinyl)pyrido[2,3-d]pyrimidin-2(1H)-one, including several anhydrous, hydrate and solvate forms, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.Type: ApplicationFiled: December 16, 2021Publication date: April 7, 2022Applicant: AMGEN INC.Inventors: Mary CHAVES, Patricia LOPEZ, Prashant AGARWAL, Albert AMEGADZIE, Stephanie AZALI, Roman SHIMANOVICH, Ron C. KELLY, Darren Leonard REID
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Patent number: 11236091Abstract: The present disclosure provides crystalline and amorphous forms of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1-piperazinyl)pyrido[2,3-d]pyrimidin-2(1H)-one, including several anhydrous, hydrate and solvate forms, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.Type: GrantFiled: May 20, 2020Date of Patent: February 1, 2022Assignee: Amgen Inc.Inventors: Mary Chaves, Patricia Lopez, Prashant Agarwal, Albert Amegadzie, Stephanie Azali, Roman Shimanovich, Ron C. Kelly, Darren Leonard Reid
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Publication number: 20210249239Abstract: Embodiments of exhaust liner systems are provided herein. In some embodiments, an exhaust liner system for use in a process chamber includes a lower exhaust liner having an annular body with a central opening; an upper flange, a central flange, and a lower flange extending outward from the annular body, wherein the lower flange and the central flange partially define a first plenum, and wherein the central flange and the upper flange partially define a second plenum; a plurality of exhaust holes from the central opening to the first plenum; and at least one cutout in the central flange to provide a flow path from the first plenum to the second plenum, wherein the lower exhaust liner defines a gas flow path from the central opening to the first plenum via the plurality of exhaust holes and from the first plenum to the second plenum via the least one cutout.Type: ApplicationFiled: February 4, 2021Publication date: August 12, 2021Inventors: Naman APURVA, Lara A. HAWRYLCHAK, Mahesh RAMAKRISHNA, Sriharish SRINIVASAN, Prashant AGARWAL
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Publication number: 20210172806Abstract: An apparatus for determining temperatures of substrates in microwave and/or vacuum environments. A substrate holder with a plurality of support pins includes a temperature sensor assembly with at least a portion of a surface with a phosphorous coating is configured to be inserted in at least one pin support position from an inner area of the substrate holder and in at least one pin support position from an outer area of the substrate holder. The temperature sensor assembly includes a temperature sensor pin with a spring that is microwave transparent. The temperature sensor pin is made of a material with a thermal conductivity greater than approximately 200 W/mK and a low thermal mass which is microwave transparent. An optical transmission assembly is embedded into at least a portion of the substrate holder to receive light emissions from a surface of the temperature sensor pin.Type: ApplicationFiled: October 19, 2020Publication date: June 10, 2021Inventors: Ananthkrishna JUPUDI, Sai Kumar KODUMURI, Vinodh RAMACHANDRAN, Prashant AGARWAL, Hadi Bin Amir MUHAMMAD
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Patent number: 10950475Abstract: Methods and apparatus for processing a substrate are provided. The apparatus, for example, can include a process chamber comprising a chamber body defining a processing volume and having a view port coupled to the chamber body; a substrate support disposed within the processing volume and having a support surface to support a substrate; and an infrared temperature sensor (IRTS) disposed outside the chamber body adjacent the view port to measure a temperature of the substrate when being processed in the processing volume, the IRTS movable relative to the view port for scanning the substrate through the view port.Type: GrantFiled: August 20, 2019Date of Patent: March 16, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Vinodh Ramachandran, Ananthkrishna Jupudi, Cheng-Hsiung Tsai, Yueh Sheng Ow, Preetham P. Rao, Ribhu Gautam, Prashant Agarwal
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Patent number: D967081Type: GrantFiled: October 30, 2020Date of Patent: October 18, 2022Assignee: APPLIED MATERIALS, INC.Inventors: Rajesh Kumar Putti, Prashant Agarwal, Ananthkrishna Jupudi