Patents by Inventor Prashant Agarwal

Prashant Agarwal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12518989
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate comprises performing a first vacuum processing procedure on a substrate, obtaining temperature measurements of the substrate from a vacuum thermocouple, obtaining temperature measurements of the substrate from a non-contact infrared sensor, calibrating the non-contact infrared sensor based on the temperature measurements from the vacuum thermocouple and the temperature measurements from the non-contact infrared sensor, and performing a second vacuum processing procedure on the substrate using the calibrated non-contact infrared sensor.
    Type: Grant
    Filed: September 23, 2021
    Date of Patent: January 6, 2026
    Assignee: Applied Materials Inc.
    Inventors: Tuck Foong Koh, Ananthkrishna Jupudi, Prashant Agarwal
  • Publication number: 20250385079
    Abstract: Methods and apparatus for substrate processing are provided that use a process kit for use in a process chamber, comprising: a top plate having a top side and a bottom side; a plurality of holes disposed on the bottom side; a channel extending from an outer portion of the top plate and coupled to the plurality of holes; at least one heater embedded in the top plate; and at least one temperature sensor embedded in the top plate, wherein a gas flow path extends from the channel, through the plurality of holes, and into an interior volume of the process chamber.
    Type: Application
    Filed: June 17, 2024
    Publication date: December 18, 2025
    Inventors: Prashant AGARWAL, Kang Zhang, Ananthkrishna Jupudi, Sarath Babu, Muhammad Hafeez Lee Bin Yusof Lee
  • Patent number: 12455862
    Abstract: A client of a database service may request a migration of a remote source database to a target database provided by the database service, where the source database and target database are published by a database vendor. Responsive to the request, a migration tool published by the database vendor may be selected from among multiple migration tools. The migration tool may derive a schema from the source database and create the target database according to the derive schema. The migration tool may then extract data of the source database using native application programming interfaces (APIs) provided by the vendor. The extracted data may then be imported into the target database using one or more additional native APIs. The migration tool may then initiate replication of transactions performed at the source database to the target database.
    Type: Grant
    Filed: March 31, 2023
    Date of Patent: October 28, 2025
    Assignee: Amazon Technologies, Inc.
    Inventors: Prashant Agarwal, Roman Yelysieiev, Vladislavs Tomasevs, Justin Qoun Tang, Qi Cui, Mehdi Naseri, Krit Gupta, Harpreet Kaur Chawla, Igor Bekelman, Mykyta Sokolov, Denys Seliukov
  • Patent number: 12421234
    Abstract: The present disclosure provides crystalline and amorphous forms of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1-piperazinyl)pyrido[2,3-d]pyrimidin-2(1H)-one, including several anhydrous, hydrate and solvate forms, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.
    Type: Grant
    Filed: June 26, 2025
    Date of Patent: September 23, 2025
    Assignee: Amgen Inc.
    Inventors: Mary Chaves, Patricia Lopez, Prashant Agarwal, Albert Amegadzie, Stephanie Azali, Roman Shimanovich, Ron C. Kelly, Darren Leonard Reid
  • Patent number: 12415806
    Abstract: The present disclosure provides crystalline and amorphous forms of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1-piperazinyl)pyrido[2,3-d]pyrimidin-2 (1H)-one, including several anhydrous, hydrate and solvate forms, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.
    Type: Grant
    Filed: June 26, 2025
    Date of Patent: September 16, 2025
    Assignee: Amgen Inc.
    Inventors: Mary Chaves, Patricia Lopez, Prashant Agarwal, Albert Amegadzie, Stephanie Azali, Roman Shimanovich, Ron C. Kelly, Darren Leonard Reid
  • Patent number: 12398133
    Abstract: The present disclosure provides crystalline and amorphous forms of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1-piperazinyl)pyrido[2,3-d]pyrimidin-2(1H)-one, including several anhydrous, hydrate and solvate forms, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.
    Type: Grant
    Filed: October 23, 2023
    Date of Patent: August 26, 2025
    Assignee: Amgen Inc.
    Inventors: Mary Chaves, Patricia Lopez, Prashant Agarwal, Albert Amegadzie, Stephanie Azali, Roman Shimanovich, Ron C. Kelly, Darren Leonard Reid
  • Patent number: 12252486
    Abstract: The present invention provides a crystalline form and stable salts of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1-piperazinyl)pyrido[2,3-d]pyrimidin-2(1H)-one, including several hydrochloride salt forms, phosphate salt form, mesylate salt form, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.
    Type: Grant
    Filed: May 20, 2020
    Date of Patent: March 18, 2025
    Assignee: Amgen Inc.
    Inventors: Mary Chaves, Ron C. Kelly, Prashant Agarwal, Stephan D. Parent, Darren Leonard Reid, Roman Shimanovich
  • Publication number: 20240395514
    Abstract: Embodiments of multi-chamber processing tools are provided herein. In some embodiments, a multi-chamber processing tool includes: a factory interface configured to receive a substrate; a pre-heat chamber directly coupled to the factory interface; a load lock chamber coupled to the factory interface and having a first slit valve disposed therebetween, wherein the load lock chamber is coupled to a pump configured to create a vacuum environment when the first slit valve is in a closed position; a degas chamber coupled to the factory interface and having a second slit valve, wherein the degas chamber is coupled to a second pump configured to create a vacuum environment when the second slit valve is in a closed position, and wherein the degas chamber includes a heat source; one or more process chambers; and a transfer chamber coupled to the load lock chamber, the degas chamber, and the one or more process chambers.
    Type: Application
    Filed: May 26, 2023
    Publication date: November 28, 2024
    Inventors: Prashant AGARWAL, Junqi WEI, Ananthkrishna JUPUDI, Clinton GOH, Tuck Foong KOH, Kai Liang LIEW
  • Patent number: 12110585
    Abstract: Embodiments of exhaust liner systems are provided herein. In some embodiments, an exhaust liner system for use in a process chamber includes a lower exhaust liner having an annular body with a central opening; an upper flange, a central flange, and a lower flange extending outward from the annular body, wherein the lower flange and the central flange partially define a first plenum, and wherein the central flange and the upper flange partially define a second plenum; a plurality of exhaust holes from the central opening to the first plenum; and at least one cutout in the central flange to provide a flow path from the first plenum to the second plenum, wherein the lower exhaust liner defines a gas flow path from the central opening to the first plenum via the plurality of exhaust holes and from the first plenum to the second plenum via the least one cutout.
    Type: Grant
    Filed: February 4, 2021
    Date of Patent: October 8, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Naman Apurva, Lara A. Hawrylchak, Mahesh Ramakrishna, Sriharish Srinivasan, Prashant Agarwal
  • Publication number: 20240327384
    Abstract: Disclosed herein is a salt, a crystalline anhydrous form, a hydrate, a solvate, or a co-crystal of a free base compound 2-(6-azaspiro[2.5]octan-6-yl)-N-[2-(4,4-difluoropiperidin-1-yl)-6-methylpyrimidin-4-yl]-4-[(2-hydroxyethanesulfonyl)amino]benzamide (Compound A); method of preparation, pharmaceutical compositions, and method of treating a disease mediated by a motor protein kinesin family member 18A (KIF18A) inhibition, wherein said disease is a neoplastic disease, including a cancer or a tumor.
    Type: Application
    Filed: July 21, 2022
    Publication date: October 3, 2024
    Applicant: Amgen Inc.
    Inventors: Tian WU, Prashant AGARWAL, Andreas R. ROTHELI, Hyunsoo PARK, Michael J. FROHN
  • Publication number: 20240067647
    Abstract: The present disclosure provides crystalline and amorphous forms of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1-piperazinyl)pyrido[2,3-d]pyrimidin-2(1H)-one, including several anhydrous, hydrate and solvate forms, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.
    Type: Application
    Filed: October 23, 2023
    Publication date: February 29, 2024
    Applicant: AMGEN INC.
    Inventors: Mary CHAVES, Patricia LOPEZ, Prashant AGARWAL, Albert AMEGADZIE, Stephanie AZALI, Roman SHIMANOVICH, Ron C. KELLY, Darren Leonard REID
  • Patent number: 11870202
    Abstract: Methods and apparatus for processing a substrate. For example, a processing chamber can include a power source, an amplifier connected to the power source, comprising at least one of a gallium nitride (GaN) transistor or a gallium arsenide (GaAs) transistor, and configured to amplify a power level of an input signal received from the power source to heat a substrate in a process volume, and a cooling plate configured to receive a coolant to cool the amplifier during operation.
    Type: Grant
    Filed: September 2, 2020
    Date of Patent: January 9, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Rajesh Kumar Putti, Vinodh Ramachandran, Ananthkrishna Jupudi, Lean Wui Koh, Prashant Agarwal
  • Patent number: 11827635
    Abstract: The present disclosure provides crystalline and amorphous forms of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1-piperazinyl)pyrido[2,3-d]pyrimidin-2(1H)-one, including several anhydrous, hydrate and solvate forms, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.
    Type: Grant
    Filed: December 16, 2021
    Date of Patent: November 28, 2023
    Assignee: Amgen Inc.
    Inventors: Mary Chaves, Patricia Lopez, Prashant Agarwal, Albert Amegadzie, Stephanie Azali, Roman Shimanovich, Ron C. Kelly, Darren Leonard Reid
  • Publication number: 20230343615
    Abstract: A system for degassing substrates provides reduced infrared sources in a degas chamber. In some embodiments, the system includes a degas chamber with a microwave source and an infrared temperature sensor positioned in a bottom of the degas chamber, at least one hoop with an annular shape that is configured to support or lift a substrate and is formed from at least one first material that is opaque to microwaves and has an emissivity of 0.1 or less, and at least one actuator with a movable vertical shaft. Each of the at least one actuator is attached under one of the hoops at an outer perimeter of the hoop. The portion of the movable vertical shaft that is exposed to microwaves from the microwave source in the degas chamber is formed from at least one second material that is opaque to microwaves and has an emissivity of 0.1 or less.
    Type: Application
    Filed: April 22, 2022
    Publication date: October 26, 2023
    Inventors: Prashant AGARWAL, Tuck Foong KOH, Ananthkrishna JUPUDI
  • Patent number: 11630001
    Abstract: An apparatus for determining temperatures of substrates in microwave and/or vacuum environments. A substrate holder with a plurality of support pins includes a temperature sensor assembly with at least a portion of a surface with a phosphorous coating is configured to be inserted in at least one pin support position from an inner area of the substrate holder and in at least one pin support position from an outer area of the substrate holder. The temperature sensor assembly includes a temperature sensor pin with a spring that is microwave transparent. The temperature sensor pin is made of a material with a thermal conductivity greater than approximately 200 W/mK and a low thermal mass which is microwave transparent. An optical transmission assembly is embedded into at least a portion of the substrate holder to receive light emissions from a surface of the temperature sensor pin.
    Type: Grant
    Filed: October 19, 2020
    Date of Patent: April 18, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ananthkrishna Jupudi, Sai Kumar Kodumuri, Vinodh Ramachandran, Prashant Agarwal, Hadi Bin Amir Muhammad
  • Publication number: 20230086151
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate comprises performing a first vacuum processing procedure on a substrate, obtaining temperature measurements of the substrate from a vacuum thermocouple, obtaining temperature measurements of the substrate from a non-contact infrared sensor, calibrating the non-contact infrared sensor based on the temperature measurements from the vacuum thermocouple and the temperature measurements from the non-contact infrared sensor, and performing a second vacuum processing procedure on the substrate using the calibrated non-contact infrared sensor.
    Type: Application
    Filed: September 23, 2021
    Publication date: March 23, 2023
    Inventors: Tuck Foong KOH, Ananthkrishna JUPUDI, Prashant AGARWAL
  • Publication number: 20220406643
    Abstract: Embodiments of substrate supports for use in microwave degas chambers are provided herein. In some embodiments, a substrate support for use in a microwave degas chamber includes a support plate having one or more support features for supporting a substrate; a susceptor comprising a plate disposed on the support plate, wherein the susceptor includes one or more openings, wherein the one or more support features extend through corresponding ones of the one or more openings; and a metal foil disposed beneath a side of the susceptor facing the support plate.
    Type: Application
    Filed: June 18, 2021
    Publication date: December 22, 2022
    Inventors: Tuck Foong KOH, Prashant AGARWAL, Ananthkrishna JUPUDI
  • Publication number: 20220235045
    Abstract: The present invention provides a crystalline form and stable salts of 6-fluoro-7-(2-fluoro-6-hydroxyphenyl)-1-(4-methyl-2-(2-propanyl)-3-pyridinyl)-4-((2S)-2-methyl-4-(2-propenoyl)-1- piperazinyl)pyrido[2,3-d]pyrimidin-2(1H)-one, including several hydrochloride salt forms, phosphate salt form, mesylate salt form, and solid state forms thereof, pharmaceutical compositions, and methods of treating a disease mediated by KRAS G12C inhibition.
    Type: Application
    Filed: May 20, 2020
    Publication date: July 28, 2022
    Inventors: Mary CHAVES, Ron C. KELLY, Prashant AGARWAL, Stephan D. PARENT, Darren Leonard REID, Roman SHIMANOVICH
  • Patent number: 11362404
    Abstract: Apparatus for transmitting microwaves into a process chamber using a microwave pressure window assembly. The microwave pressure window assembly may include a first plate with a first aperture surrounded by a first recess for a first pressure seal, a second plate with a second aperture surrounded by a second recess for a second pressure seal, a dielectric plate configured to transmit microwaves and interposed between the first plate and the second plate and between the first pressure seal and the second pressure seal. The apertures include a first vertical step area on a first vertical side of the apertures and a second vertical step area on a second vertical side of the apertures opposite of the first vertical side. The first vertical step areas and the second vertical step areas may have a thickness of approximately 50% of a thickness of the plates that includes a dielectric plate recess.
    Type: Grant
    Filed: October 30, 2020
    Date of Patent: June 14, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Rajesh Kumar Putti, Prashant Agarwal, Ananthkrishna Jupudi
  • Patent number: D967081
    Type: Grant
    Filed: October 30, 2020
    Date of Patent: October 18, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Rajesh Kumar Putti, Prashant Agarwal, Ananthkrishna Jupudi