Patents by Inventor PRASHANTH VASUDEVA

PRASHANTH VASUDEVA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Effective and novel design for lower particle count and better wafer quality by diffusing the flow inside the chamber
    Patent number: 10808310
    Abstract: Embodiments described herein generally relate to a processing chamber having one or more gas inlet ports located at a bottom of the processing chamber. Gas flowing into the processing chamber via the one or more gas inlet ports is directed along a lower side wall of the processing chamber by a plate located over each of the one or more gas inlet ports or by an angled opening of each of the one or more gas inlet ports. The one or more gas inlet ports and the plates may be located at one end of the processing chamber, and the gas flow is directed towards an exhaust port located at the opposite end of the processing chamber by the plates or the angled openings. Thus, more gas can be flowed into the processing chamber without dislodging particles from a lid of the processing chamber.
    Type: Grant
    Filed: February 28, 2020
    Date of Patent: October 20, 2020
    Assignee: APPLIED MATEIRALS, INC.
    Inventors: Vishwas Kumar Pandey, Kartik Shah, Edric Tong, Prashanth Vasudeva
  • EFFECTIVE AND NOVEL DESIGN FOR LOWER PARTICLE COUNT AND BETTER WAFER QUALITY BY DIFFUSING THE FLOW INSIDE THE CHAMBER
    Publication number: 20200199730
    Abstract: Embodiments described herein generally relate to a processing chamber having one or more gas inlet ports located at a bottom of the processing chamber. Gas flowing into the processing chamber via the one or more gas inlet ports is directed along a lower side wall of the processing chamber by a plate located over each of the one or more gas inlet ports or by an angled opening of each of the one or more gas inlet ports. The one or more gas inlet ports and the plates may be located at one end of the processing chamber, and the gas flow is directed towards an exhaust port located at the opposite end of the processing chamber by the plates or the angled openings. Thus, more gas can be flowed into the processing chamber without dislodging particles from a lid of the processing chamber.
    Type: Application
    Filed: February 28, 2020
    Publication date: June 25, 2020
    Inventors: Vishwas Kumar PANDEY, Kartik SHAH, Edric TONG, Prashanth VASUDEVA
  • Effective and novel design for lower particle count and better wafer quality by diffusing the flow inside the chamber
    Patent number: 10619235
    Abstract: Embodiments described herein generally relate to a processing chamber having one or more gas inlet ports located at a bottom of the processing chamber. Gas flowing into the processing chamber via the one or more gas inlet ports is directed along a lower side wall of the processing chamber by a plate located over each of the one or more gas inlet ports or by an angled opening of each of the one or more gas inlet ports. The one or more gas inlet ports and the plates may be located at one end of the processing chamber, and the gas flow is directed towards an exhaust port located at the opposite end of the processing chamber by the plates or the angled openings. Thus, more gas can be flowed into the processing chamber without dislodging particles from a lid of the processing chamber.
    Type: Grant
    Filed: January 26, 2017
    Date of Patent: April 14, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Vishwas Kumar Pandey, Kartik Shah, Edric Tong, Prashanth Vasudeva
  • EFFECTIVE AND NOVEL DESIGN FOR LOWER PARTICLE COUNT AND BETTER WAFER QUALITY BY DIFFUSING THE FLOW INSIDE THE CHAMBER
    Publication number: 20170349994
    Abstract: Embodiments described herein generally relate to a processing chamber having one or more gas inlet ports located at a bottom of the processing chamber. Gas flowing into the processing chamber via the one or more gas inlet ports is directed along a lower side wall of the processing chamber by a plate located over each of the one or more gas inlet ports or by an angled opening of each of the one or more gas inlet ports. The one or more gas inlet ports and the plates may be located at one end of the processing chamber, and the gas flow is directed towards an exhaust port located at the opposite end of the processing chamber by the plates or the angled openings. Thus, more gas can be flowed into the processing chamber without dislodging particles from a lid of the processing chamber.
    Type: Application
    Filed: January 26, 2017
    Publication date: December 7, 2017
    Inventors: Vishwas Kumar PANDEY, Kartik SHAH, Edric TONG, Prashanth VASUDEVA
  • Compact device for enhancing the mixing of gaseous species
    Patent number: 9327252
    Abstract: Apparatus and system for mixing gas comprising a first valve coupled to a first conduit controlling flow of a first gas, a second valve coupled to a second conduit controlling flow of a second gas, a controller controlling the valves, a base block with a first gas input coupled to the first conduit, a second gas input coupled to the second conduit and an output opening, a mixing chamber formed within the base block, wherein the mixing chamber is coupled to the first gas input and the second gas input to receive input gases, an inner block disposed within the mixing chamber, the inner block including a body with an inner volume and one or more perimeter holes formed through the body coupling the mixing chamber to the inner volume of the inner block; and a gas outlet configured to flow gas through the output opening of the base block.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: May 3, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: John W. Lane, Berrin Daran, Ramachandra Murthy Gunturi, Mariusch Gregor, Bhaswan Manjunath, Prashanth Vasudeva
  • COMPACT DEVICE FOR ENHANCING THE MIXING OF GASEOUS SPECIES
    Publication number: 20140269156
    Abstract: Apparatus and system for mixing gas comprising a first valve coupled to a first conduit controlling flow of a first gas, a second valve coupled to a second conduit controlling flow of a second gas, a controller controlling the valves, a base block with a first gas input coupled to the first conduit, a second gas input coupled to the second conduit and an output opening, a mixing chamber formed within the base block, wherein the mixing chamber is coupled to the first gas input and the second gas input to receive input gases, an inner block disposed within the mixing chamber, the inner block including a body with an inner volume and one or more perimeter holes formed through the body coupling the mixing chamber to the inner volume of the inner block; and a gas outlet configured to flow gas through the output opening of the base block.
    Type: Application
    Filed: March 15, 2013
    Publication date: September 18, 2014
    Inventors: JOHN W. LANE, BERRIN DARAN, RAMACHANDRA MURTHY GUNTURI, MARIUSCH GREGOR, BHASWAN MANJUNATH, PRASHANTH VASUDEVA