Patents by Inventor Prithwish Chatterjee

Prithwish Chatterjee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12494443
    Abstract: Embodiments include an electronic package that includes a dielectric layer and a capacitor on the dielectric layer. In an embodiment, the capacitor comprises a first electrode disposed over the dielectric layer and a capacitor dielectric layer over the first electrode. In an embodiment, the capacitor dielectric layer is an amorphous dielectric layer. In an embodiment, the electronic package may also comprise a second electrode over the capacitor dielectric layer.
    Type: Grant
    Filed: September 25, 2023
    Date of Patent: December 9, 2025
    Assignee: Intel Corporation
    Inventors: Aleksandar Aleksov, Thomas Sounart, Kristof Darmawikarta, Henning Braunisch, Prithwish Chatterjee, Andrew J. Brown
  • Publication number: 20250218910
    Abstract: In embodiments herein, a surface finish (SF) is formed on conductive contacts of a package substrate for connection to an embedded interconnect bridge circuitry die. In some embodiments, the SF may be electroless nickel-electroless palladium-immersion gold (ENEPIG). In other embodiments, the SF may be immersion gold-electroless palladium-immersion gold (IGEPIG). In other embodiments, the SF may include a layer of electrolytic palladium-gold on a layer of indium or on a layer of cobalt-iron.
    Type: Application
    Filed: December 29, 2023
    Publication date: July 3, 2025
    Applicant: Intel Corporation
    Inventors: Shruti Sharma, Prithwish Chatterjee, Numair Ahmed, Yuxin Fang, Siddharth Alur Narasimha Krishna, Wei-Lun Jen, Mollie A. Stewart, Suresh T. Narute, Srinivas Venkata Ramanuja Pietambaram
  • Publication number: 20250218924
    Abstract: In embodiments herein, a surface finish (SF) is formed on conductive contacts of a package substrate for connection to an embedded interconnect bridge circuitry die. In some embodiments, the SF may be electroless nickel-electroless palladium-immersion gold (ENEPIG). In other embodiments, the SF may be immersion gold-electroless palladium-immersion gold (IGEPIG). In other embodiments, the SF may include a layer of electrolytic palladium-gold on a layer of indium or on a layer of cobalt-iron.
    Type: Application
    Filed: December 29, 2023
    Publication date: July 3, 2025
    Inventors: Prithwish Chatterjee, Shruti Sharma, Numair Ahmed, Yuxin Fang, Wei-Lun Jen, Siddharth Alur Narasimha Krishna, Mollie A. Stewart, Srinivas Venkata Ramanuja Pietambaram, Suresh T. Narute
  • Publication number: 20250218925
    Abstract: In embodiments herein, a surface finish (SF) is formed on conductive contacts of a package substrate for connection to an embedded interconnect bridge circuitry die. In some embodiments, the SF may be electroless nickel-electroless palladium-immersion gold (ENEPIG). In other embodiments, the SF may be immersion gold-electroless palladium-immersion gold (IGEPIG). In other embodiments, the SF may include a layer of electrolytic palladium-gold on a layer of indium or on a layer of cobalt-iron.
    Type: Application
    Filed: December 29, 2023
    Publication date: July 3, 2025
    Applicant: Intel Corporation
    Inventors: Shruti Sharma, Prithwish Chatterjee, Numair Ahmed, Yuxin Fang, Siddharth Alur Narasimha Krishna, Wei-Lun Jen, Mollie A. Stewart, Suresh T. Narute, Srinivas Venkata Ramanuja Pietambaram
  • Publication number: 20250219002
    Abstract: In embodiments herein, a surface finish (SF) is formed on conductive contacts of a package substrate for connection to an embedded interconnect bridge circuitry die. In some embodiments, the SF may be electroless nickel-electroless palladium-immersion gold (ENEPIG). In other embodiments, the SF may be immersion gold-electroless palladium-immersion gold (IGEPIG). In other embodiments, the SF may include a layer of electrolytic palladium-gold on a layer of indium or on a layer of cobalt-iron.
    Type: Application
    Filed: December 29, 2023
    Publication date: July 3, 2025
    Applicant: Intel Corporation
    Inventors: Shruti Sharma, Prithwish Chatterjee, Numair Ahmed, Yuxin Fang, Siddharth Alur Narasimha Krishna, Wei-Lun Jen, Mollie A. Stewart, Ali Lehaf, Steve S. Cho, Sang Ha Yoo, David A. Woodley, Srinivas Venkata Ramanuja Pietambaram
  • Publication number: 20250218911
    Abstract: In embodiments herein, a surface finish (SF) is formed on conductive contacts of a package substrate for connection to an embedded interconnect bridge circuitry die. In some embodiments, the SF may be electroless nickel-electroless palladium-immersion gold (ENEPIG). In other embodiments, the SF may be immersion gold-electroless palladium-immersion gold (IGEPIG). In other embodiments, the SF may include a layer of electrolytic palladium-gold on a layer of indium or on a layer of cobalt-iron.
    Type: Application
    Filed: December 29, 2023
    Publication date: July 3, 2025
    Applicant: Intel Corporation
    Inventors: Shruti Sharma, Prithwish Chatterjee, Numair Ahmed, Yuxin Fang, Siddharth Alur Narasimha Krishna, Wei-Lun Jen, Mollie A. Stewart, Ali Lehaf, Steve S. Cho, Sang Ha Yoo, David A. Woodley, Srinivas Venkata Ramanuja Pietambaram, Farzaneh Saeedifard
  • Patent number: 12336197
    Abstract: An integrated circuit (IC) package substrate, comprising a magnetic material embedded within a dielectric material. A first surface of the dielectric material is below the magnetic material, and a second surface of the dielectric material, opposite the first surface, is over the magnetic material. A metallization level comprising a first metal feature is embedded within the magnetic material. A second metal feature is at an interface of the magnetic material and the dielectric material. The second metal feature has a first sidewall in contact with the dielectric material and a second sidewall in contact with the magnetic material.
    Type: Grant
    Filed: February 28, 2020
    Date of Patent: June 17, 2025
    Assignee: Intel Corporation
    Inventors: Brandon C. Marin, Tarek Ibrahim, Prithwish Chatterjee, Haifa Hariri, Yikang Deng, Sheng C. Li, Srinivas Pietambaram
  • Patent number: 12272484
    Abstract: An inductor can be formed in a coreless electronic substrate from magnetic materials and/or fabrication processes that do not result in the magnetic materials leaching into plating and/or etching solutions/chemistries, and results in a unique inductor structure. This may be achieved by forming the inductors from magnetic ferrites. The formation of the electronic substrates may also include process sequences that prevent exposure of the magnetic ferrites to the plating and/or etching solutions/chemistries.
    Type: Grant
    Filed: March 4, 2021
    Date of Patent: April 8, 2025
    Assignee: Intel Corporation
    Inventors: Srinivas Pietambaram, Pooya Tadayon, Kristof Darmawikarta, Tarek Ibrahim, Prithwish Chatterjee
  • Patent number: 11881463
    Abstract: A coreless semiconductor package comprises a plurality of horizontal layers of dielectric material. A magnetic inductor is situated at least partly in a first group of the plurality of layers. A plated laser stop is formed to protect the magnetic inductor against subsequent acidic processes. An EMIB is situated above the magnetic inductor within a second group of the plurality of layers. Vias and interconnections are configured within the horizontal layers to connect a die of the EMIB to other circuitry. A first level interconnect is formed on the top side of the package to connect to the interconnections. BGA pockets and BGA pads are formed on the bottom side of the package. In a second embodiment a polymer film is used as additional protection against subsequent acidic processes. The magnetic inductor comprises a plurality of copper traces encapsulated in magnetic material.
    Type: Grant
    Filed: November 11, 2021
    Date of Patent: January 23, 2024
    Assignee: Intel Corporation
    Inventors: Andrew J. Brown, Rahul Jain, Prithwish Chatterjee, Lauren A. Link, Sai Vadlamani
  • Publication number: 20240014149
    Abstract: Embodiments include an electronic package that includes a dielectric layer and a capacitor on the dielectric layer. In an embodiment, the capacitor comprises a first electrode disposed over the dielectric layer and a capacitor dielectric layer over the first electrode. In an embodiment, the capacitor dielectric layer is an amorphous dielectric layer. In an embodiment, the electronic package may also comprise a second electrode over the capacitor dielectric layer.
    Type: Application
    Filed: September 25, 2023
    Publication date: January 11, 2024
    Inventors: Aleksandar ALEKSOV, Thomas SOUNART, Kristof DARMAWIKARTA, Henning BRAUNISCH, Prithwish CHATTERJEE, Andrew J. BROWN
  • Patent number: 11862552
    Abstract: Methods/structures of forming embedded inductor structures are described. Embodiments include forming a first interconnect structure on a dielectric material of a substrate, selectively forming a magnetic material on a surface of the first interconnect structure, forming an opening in the magnetic material, and forming a second interconnect structure in the opening. Build up layers are then formed on the magnetic material.
    Type: Grant
    Filed: January 3, 2022
    Date of Patent: January 2, 2024
    Assignee: Intel Corporation
    Inventors: Sai Vadlamani, Prithwish Chatterjee, Robert A. May, Rahul S. Jain, Lauren A. Link, Andrew J. Brown, Kyu Oh Lee, Sheng C. Li
  • Patent number: 11804455
    Abstract: Embodiments include an electronic package that includes a dielectric layer and a capacitor on the dielectric layer. In an embodiment, the capacitor comprises a first electrode disposed over the dielectric layer and a capacitor dielectric layer over the first electrode. In an embodiment, the capacitor dielectric layer is an amorphous dielectric layer. In an embodiment, the electronic package may also comprise a second electrode over the capacitor dielectric layer.
    Type: Grant
    Filed: October 4, 2022
    Date of Patent: October 31, 2023
    Assignee: Intel Corporation
    Inventors: Aleksandar Aleksov, Thomas Sounart, Kristof Darmawikarta, Henning Braunisch, Prithwish Chatterjee, Andrew J. Brown
  • Patent number: 11651902
    Abstract: Embodiments herein relate to systems, apparatuses, processing, and techniques related to patterning one or more sides of a thin film capacitor (TFC) sheet, where the TFC sheet has a first side and a second side opposite the first side. The first side and the second side of the TFC sheet are metal and are separated by a dielectric layer, and the patterned TFC sheet is to provide at least one of a capacitor or a routing feature on a first side of a substrate that has the first side and a second side opposite the first side.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: May 16, 2023
    Assignee: Intel Corporation
    Inventors: Rahul Jain, Andrew J. Brown, Prithwish Chatterjee, Sai Vadlamani, Lauren Link
  • Patent number: 11610706
    Abstract: A substrate for an integrated circuit package, the substrate comprising a dielectric, at least one conductor plane within the dielectric, and a planar magnetic structure comprising an organic magnetic laminate embedded within the dielectric, wherein the planar magnetic structure is integrated within the at least one conductor plane.
    Type: Grant
    Filed: January 12, 2018
    Date of Patent: March 21, 2023
    Assignee: Intel Corporation
    Inventors: Sai Vadlamani, Prithwish Chatterjee, Rahul Jain, Kyu Oh Lee, Sheng C. Li, Andrew J. Brown, Lauren A. Link
  • Patent number: 11574874
    Abstract: An apparatus system is provided which comprises: a photoimageable dielectric layer; a first interconnect structure formed through the photoimageable dielectric, the first interconnect structure formed at least in part using a lithography process; and a second interconnect structure formed through the photoimageable dielectric, the second interconnect structure formed at least in part using a laser drilling process.
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: February 7, 2023
    Assignee: Intel Corporation
    Inventors: Robert A. May, Sri Ranga Sai Boyapati, Kristof Darmawikarta, Hiroki Tanaka, Srinivas V. Pietambaram, Frank Truong, Praneeth Akkinepally, Andrew J. Brown, Lauren A. Link, Prithwish Chatterjee
  • Patent number: 11552008
    Abstract: Disclosed herein are asymmetric cored integrated circuit (IC) package supports, and related devices and methods. For example, in some embodiments, an IC package support may include a core region having a first face and an opposing second face, a first buildup region at the first face of the core region, and a second buildup region at the second face of the core region. A thickness of the first buildup region may be different than a thickness of the second buildup region. In some embodiments, an inductor may be included in the core region.
    Type: Grant
    Filed: November 28, 2018
    Date of Patent: January 10, 2023
    Assignee: Intel Corporation
    Inventors: Lauren Ashley Link, Andrew James Brown, Prithwish Chatterjee, Sai Vadlamani, Ying Wang, Chong Zhang
  • Patent number: 11495552
    Abstract: Embodiments include an electronic package that includes a dielectric layer and a capacitor on the dielectric layer. In an embodiment, the capacitor comprises a first electrode disposed over the dielectric layer and a capacitor dielectric layer over the first electrode. In an embodiment, the capacitor dielectric layer is an amorphous dielectric layer. In an embodiment, the electronic package may also comprise a second electrode over the capacitor dielectric layer.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: November 8, 2022
    Assignee: Intel Corporation
    Inventors: Aleksandar Aleksov, Thomas Sounart, Kristof Darmawikarta, Henning Braunisch, Prithwish Chatterjee, Andrew J. Brown
  • Patent number: 11443885
    Abstract: Embodiments include inductors and methods of forming inductors. In an embodiment, an inductor may include a substrate core and a conductive through-hole through the substrate core. Embodiments may also include a magnetic sheath around the conductive through hole. In an embodiment, the magnetic sheath is separated from the plated through hole by a barrier layer. In an embodiment, the barrier layer is formed over an inner surface of the magnetic sheath and over first and second surfaces of the magnetic sheath.
    Type: Grant
    Filed: March 12, 2018
    Date of Patent: September 13, 2022
    Assignee: Intel Corporation
    Inventors: Kristof Darmawikarta, Srinivas Pietambaram, Sandeep Gaan, Sri Ranga Sai Boyapati, Prithwish Chatterjee, Sameer Paital, Rahul Jain, Junnan Zhao
  • Publication number: 20220285079
    Abstract: An inductor can be formed in a coreless electronic substrate from magnetic materials and/or fabrication processes that do not result in the magnetic materials leaching into plating and/or etching solutions/chemistries, and results in a unique inductor structure. This may be achieved by forming the inductors from magnetic ferrites. The formation of the electronic substrates may also include process sequences that prevent exposure of the magnetic ferrites to the plating and/or etching solutions/chemistries.
    Type: Application
    Filed: March 4, 2021
    Publication date: September 8, 2022
    Applicant: Intel Corporation
    Inventors: Srinivas Pietambaram, Pooya Tadayon, Kristof Darmawikarta, Tarek Ibrahim, Prithwish Chatterjee
  • Patent number: 11432405
    Abstract: A package substrate is disclosed. The package substrate includes a substrate core, a cavity below the substrate core that extends from a surface of a first resist layer to a bottom surface of the package substrate, and a first terminal and a second terminal in the first resist layer. The package substrate also includes one or more passive components that are coupled inside the cavity to the first terminal and the second terminal.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: August 30, 2022
    Assignee: Intel Corporation
    Inventors: Rahul Jain, Prithwish Chatterjee, Kyu-oh Lee