Abstract: An ophthalmic imaging system has a specialized graphical user interface GUI to convey information for manually adjusting control inputs to bring an eye into alignment with the device. The GUI provides additional information such as laterality, visual alignment overlay aids, and live video feeds. The system further applies automatic gain control to fundus images, synchronizes itself with other ophthalmic systems on a computer network, and provides an optimized image load and display system.

Abstract: An ophthalmic imaging system provides an automatic focus mechanism based on the difference of consecutive scan lines. The system also provides of user selection of a focus point within a fundus image. A neural network automatically identifies the optic nerve head in an FA or ICGA image, which may be used to determine fixation angle. The system also provides additional scan tables for multiple imaging modalities to accommodate photophobia patients and multi-spectrum imaging options.

Abstract: An ophthalmic imaging system has a specialized graphical user interface GUI to convey information for manually adjusting control inputs to bring an eye into alignment with the device. The GUI provides additional information such as laterality, visual alignment overlay aids, and live video feeds. The system further applies automatic gain control to fundus images, synchronizes itself with other ophthalmic systems on a computer network, and provides an optimized image load and display system.

Abstract: Methods are provided for depositing amorphous carbon materials. In one aspect, the invention provides a method for processing a substrate including positioning the substrate in a processing chamber, introducing a processing gas into the processing chamber, wherein the processing gas comprises a carrier gas, hydrogen, and one or more precursor compounds, generating a plasma of the processing gas by applying power from a dual-frequency RF source, and depositing an amorphous carbon layer on the substrate.

Abstract: Methods are provided for depositing amorphous carbon materials. In one aspect, the invention provides a method for processing a substrate including positioning the substrate in a processing chamber, introducing a processing gas into the processing chamber, wherein the processing gas comprises a carrier gas, hydrogen, and one or more precursor compounds, generating a plasma of the processing gas by applying power from a dual-frequency RF source, and depositing an amorphous carbon layer on the substrate.

Abstract: The present invention provides a process kit for a semiconductor processing chamber. The processing chamber is a vacuum processing chamber that includes a chamber body defining an interior processing region. The processing region receives a substrate for processing, and also supports equipment pieces of the process kit. The process kit includes a pumping liner configured to be placed within the processing region of the processing chamber, and a C-channel liner configured to be placed along an outer diameter of the pumping liner. The pumping liner and the C-channel liner have novel interlocking features designed to inhibit parasitic pumping of processing or cleaning gases from the processing region. The invention further provides a semiconductor processing chamber having an improved process kit, such as the kit described. In one arrangement, the chamber is a tandem processing chamber.