Patents by Inventor Protopopov VLADIMIR

Protopopov VLADIMIR has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for monitoring process chamber
    Patent number: 10971343
    Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
    Type: Grant
    Filed: January 30, 2019
    Date of Patent: April 6, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Protopopov Vladimir, Ki Ho Hwang, Doug Yong Sung, Se Jin Oh, Kul Inn, Sung Ho Jang, Yun Kwang Jeon
  • APPARATUS FOR MONITORING PROCESS CHAMBER
    Publication number: 20190164731
    Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
    Type: Application
    Filed: January 30, 2019
    Publication date: May 30, 2019
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Protopopov VLADIMIR, Ki Ho HWANG, Doug Yong SUNG, Se Jin OH, Kul INN, Sung Ho JANG, Yun Kwang JEON
  • Pulsed plasma analyzer and method for analyzing the same
    Patent number: 10249485
    Abstract: A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.
    Type: Grant
    Filed: October 6, 2017
    Date of Patent: April 2, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Vladimir Volynets, Protopopov Vladimir, Young Do Kim, Yuri Barsukov, Sang Heon Lee, Sung Ho Jang
  • Apparatus for monitoring process chamber
    Patent number: 10229818
    Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
    Type: Grant
    Filed: September 9, 2016
    Date of Patent: March 12, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Protopopov Vladimir, Ki Ho Hwang, Doug Yong Sung, Se Jin Oh, Kul Inn, Sung Ho Jang, Yun Kwang Jeon
  • PULSED PLASMA ANALYZER AND METHOD FOR ANALYZING THE SAME
    Publication number: 20180130651
    Abstract: A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.
    Type: Application
    Filed: October 6, 2017
    Publication date: May 10, 2018
    Inventors: VLADIMIR VOLYNETS, Protopopov Vladimir, Young Do Kim, Yuri Barsukov, Sang Heon Lee, Sung Ho Jang
  • APPARATUS FOR MONITORING PROCESS CHAMBER
    Publication number: 20170213710
    Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
    Type: Application
    Filed: September 9, 2016
    Publication date: July 27, 2017
    Applicant: Samsung Electronics Co. , Ltd.
    Inventors: Protopopov VLADIMIR, Ki Ho HWANG, Doug Yong SUNG, Se Jin OH, Kul INN, Sung Ho JANG, Yun Kwang JEON