Patents by Inventor Przemyslaw W. Wachulak

Przemyslaw W. Wachulak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Nanometer-scale lithography using extreme ultraviolet/soft x-ray laser interferometry
    Patent number: 7705332
    Abstract: Direct patterning of nanometer scale features by interferometric lithography using a 46.9 nm laser is described. Multiple exposures using a Lloyd's mirror interferometer permitted printing of arrays having 60 nm FWHM features.
    Type: Grant
    Filed: August 17, 2007
    Date of Patent: April 27, 2010
    Assignee: Colorado State University Research Foundation
    Inventors: Mario C. Marconi, Przemyslaw W. Wachulak, Carmen S. Menoni, Jorge J. Rocca
  • NANOMETER-SCALE LITHOGRAPHY USING EXTREME ULTRAVIOLET/SOFT X-RAY LASER INTERFEROMETRY
    Publication number: 20080175348
    Abstract: Direct patterning of nanometer scale features by interferometric lithography using a 46.9 nm laser is described. Multiple exposures using a Lloyd's mirror interferometer permitted printing of arrays having 60 nm FWHM features.
    Type: Application
    Filed: August 17, 2007
    Publication date: July 24, 2008
    Applicant: COLORADO STATE UNIVERSITY RESEARCH FOUNDATION
    Inventors: Mario C. Marconi, Przemyslaw W. Wachulak, Carmen S. Menoni, Jorge J. Rocca