Abstract: Microfeature assemblies including interconnect structures and methods for forming such interconnect structures are disclosed herein. One particular embodiment of a microfeature assembly includes a microelectronic die having integrated circuitry, a plurality of terminals electrically coupled to the integrated circuitry, and conductive bumps on the individual terminals. The conductive bumps include first engagement features. The assembly also includes a microfeature workpiece having a substrate and a plurality of pads on the substrate. The pads include non-planar second engagement features engaged with the first engagement features on corresponding conductive bumps.