Patents by Inventor Puru Lin

Puru Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10211295
    Abstract: The present invention provides a substrate for a semiconductor device and a semiconductor device using the same. The substrate for a semiconductor device comprises a ceramic supporting base plate formed by a polycrystalline aluminum nitride (AlN) sintered body; at least one silicon oxide layer formed on the base plate by a sol-gel method wherein the at least one silicon oxide layer has an average roughness less than the base plate to block polycrystalline orientation of the base plate and has a total thickness in a range of 10˜5000 nm, the silicon oxide layer is only formed from the sol-gel method and is not single crystalline; a first buffer layer comprising aluminum nitride (AlN) on the at least one silicon oxide layer with a thickness of 0.1˜10 ?m; and a gallium nitride layer formed on the first buffer layer and having a single-crystal crystalline structure.
    Type: Grant
    Filed: June 6, 2017
    Date of Patent: February 19, 2019
    Assignee: National Chi Nan University
    Inventors: Jiann-Heng Chen, Puru Lin, Sun-Zen Chen
  • Publication number: 20170373155
    Abstract: The present invention provides a substrate for a semiconductor device and a semiconductor device using the same. The substrate for a semiconductor device comprises a ceramic supporting base plate formed by a polycrystalline aluminum nitride (AlN) sintered body; at least one silicon oxide layer formed on the base plate by a sol-gel method wherein the at least one silicon oxide layer has an average roughness less than the base plate to block polycrystalline orientation of the base plate and has a total thickness in a range of 10˜5000 nm, the silicon oxide layer is only formed from the sol-gel method and are not single crystalline; a first buffer layer comprising aluminum nitride (AlN) on the at least one silicon oxide layer with a thickness of 0.1˜10 ?m; and a gallium nitride layer formed on the first buffer layer and having a single-crystal crystalline structure.
    Type: Application
    Filed: June 6, 2017
    Publication date: December 28, 2017
    Applicant: National Chi Nan University
    Inventors: JIANN-HENG CHEN, PURU LIN, SUN-ZEN CHEN
  • Publication number: 20120175664
    Abstract: The present invention provides a lighting device and method for forming the same. The lighting device comprises a base having a first surface, a conductive wiring layer formed on the first surface, and a light emitting diode module comprising a substrate and at least one light emitting diode disposed on the substrate wherein the substrate of the light emitting diode module is disposed on the conductive wiring layer by a surface mount method. In one embodiment, the base is preferably made of ceramics.
    Type: Application
    Filed: September 9, 2011
    Publication date: July 12, 2012
    Applicant: FITILITE (S) PTE., LTD., TAIWAN BRANCH
    Inventor: Puru LIN
  • Publication number: 20120127659
    Abstract: The present invention relates to a heat spreading element with an AlN film including: a substrate which may be composed of a single bulk material, a multi-layered sample, or a composite material; and an AlN film deposited on the surface of the substrate, wherein the thickness of the AlN film is in a range of 1 nm to 10 ?m, and the AlN film is used to conduct the heat from a heat-generating device to the substrate, and method for manufacturing the same.
    Type: Application
    Filed: August 2, 2011
    Publication date: May 24, 2012
    Inventors: SunZen CHEN, Puru Lin, Henry J. H. Chen