Patents by Inventor Purwadi Raharjo

Purwadi Raharjo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10384299
    Abstract: The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that relate to maintaining a footprint of the electron beam incident to a workpiece within a defined energy level. Such a configuration allows the electron beam to heat only specific portions of the workpiece to a superheated state in which intermetallic compounds are dissolved. In one embodiment a mask is disclosed that prevents low energy portions of an electron beam from contacting the workpiece. In another embodiment the electron beam can be focused in a way that maintains the electron beam at an energy level such that substantially all of the electron beam is above a threshold energy level.
    Type: Grant
    Filed: June 26, 2013
    Date of Patent: August 20, 2019
    Assignee: Apple Inc.
    Inventors: Simon R. Lancaster-Larocque, Collin Chan, Kensuke Uemura, Purwadi Raharjo
  • Publication number: 20150001192
    Abstract: The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that relate to maintaining a footprint of the electron beam incident to a workpiece within a defined energy level. Such a configuration allows the electron beam to heat only specific portions of the workpiece to a superheated state in which intermetallic compounds are dissolved. In one embodiment a mask is disclosed that prevents low energy portions of an electron beam from contacting the workpiece. In another embodiment the electron beam can be focused in a way that maintains the electron beam at an energy level such that substantially all of the electron beam is above a threshold energy level.
    Type: Application
    Filed: June 26, 2013
    Publication date: January 1, 2015
    Inventors: Simon R. Lancaster-Larocque, Collin Chan, Kensuke Uemura, Purwadi Raharjo
  • Publication number: 20130248374
    Abstract: A highly polished surface on an aluminum substrate is formed using any number of machining processes. During the machining process, intermetallic compounds are typically generated at a top surface area of the aluminum substrate caused by spot heat generated between the tool edge and the cut tip of the aluminum substrate during the cutting process. The intermetallic compounds can leave surface imperfections after conventional mechanical polishing operations that render the surface of the aluminum substrate difficult to obtain a desired high glossiness due to exfoliation of the intermetallic compounds from the top surface. In order to remove the effect of the intermetallic compounds, an acid etching solution is applied to the surface resulting in removal of intermetallic compounds across a surface portion of the aluminum substrate.
    Type: Application
    Filed: September 26, 2012
    Publication date: September 26, 2013
    Applicant: Apple Inc.
    Inventors: Simon R. Lancaster- Larocque, Purwadi Raharjo, Kensuke Uemura
  • Publication number: 20130248486
    Abstract: A highly polished surface on an aluminum substrate is formed using any number of machining processes. During the machining process, intermetallic compounds are typically generated at a top surface area of the aluminum substrate caused by spot heat generated between the tool edge and the cut tip of the aluminum substrate during the cutting process. The intermetallic compounds can leave surface imperfections after conventional mechanical polishing operations that render the surface of the aluminum substrate difficult to obtain a desired high glossiness due to exfoliation of the intermetallic compounds from the top surface. In order to remove the effect of the intermetallic compounds, an electron beam is applied to the surface resulting in Joule heating to melt down a top surface zone. In this way, any tooling traces and intermetallic compounds are eliminated.
    Type: Application
    Filed: September 26, 2012
    Publication date: September 26, 2013
    Applicant: Apple Inc.
    Inventors: SIMON R. LANCASTER-LAROCQUE, Purwadi RAHARJO, Kensuke UEMURA