Patents by Inventor PyongHwa JANG

PyongHwa JANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etching compositions and method of etching by using the same
    Patent number: 10640706
    Abstract: The present invention relates to an etching composition, an etching method, and a method of preparing a semiconductor device using the same, and more particularly, to an etching composition comprising a compound capable of selectively removing a nitride film with a high selectivity while minimizing an etch rate of the oxide film, and a method of preparing a semiconductor device comprising an etching process using the etching composition.
    Type: Grant
    Filed: July 3, 2018
    Date of Patent: May 5, 2020
    Assignee: OCI COMPANY LTD.
    Inventors: HoSeong Yoo, JunEun Lee, PyongHwa Jang, Yongil Kim, Jin Park
  • ETCHING COMPOSITIONS AND METHOD OF ETCHING BY USING THE SAME
    Publication number: 20190010398
    Abstract: The present invention relates to an etching composition, an etching method, and a method of preparing a semiconductor device using the same, and more particularly, to an etching composition comprising a compound capable of selectively removing a nitride film with a high selectivity while minimizing an etch rate of the oxide film, and a method of preparing a semiconductor device comprising an etching process using the etching composition.
    Type: Application
    Filed: July 3, 2018
    Publication date: January 10, 2019
    Inventors: HoSeong YOO, JunEun LEE, PyongHwa JANG, YongIl KIM, Jin PARK