Patents by Inventor Qi Hua Fan

Qi Hua Fan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200335311
    Abstract: A rotary plasma reactor system is provided. In another aspect, a plasma reactor is rotatable about a generally horizontal axis within a vacuum chamber. A further aspect employs a plasma reactor, a vacuum chamber, and an elongated electrode internally extending within a central area of the reactor. Yet another aspect employs a plasma reactor for use in activating, etching and/or coating tumbling workpiece material.
    Type: Application
    Filed: January 15, 2020
    Publication date: October 22, 2020
    Applicant: Board of Trustees of Michigan State University
    Inventors: QI HUA FAN, Martin E. TOOMAJIAN
  • Publication number: 20200303168
    Abstract: A single beam plasma or ion source apparatus is provided. Another aspect employs an ion source including multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape. A further aspect of an ion source includes magnets and/or magnetic shunts which create a magnetic flux with a central dip or outward undulation located in an open space within a plasma source. In another aspect, an ion source includes a removeable cap attached to an anode body which surrounds the magnets. Yet a further aspect provides a single beam plasma source which generates ions simultaneously with target sputtering and at the same internal pressure.
    Type: Application
    Filed: June 19, 2019
    Publication date: September 24, 2020
    Applicants: Board of Trustees of Michigan State University, Fraunhofer USA
    Inventors: Qi Hua FAN, Thomas SCHUELKE, Lars HAUBOLD, Michael PETZOLD
  • Publication number: 20200035456
    Abstract: A material processing apparatus includes a vacuum chamber, an electrically grounded shield and/or workpiece, multiple radio frequency-powered electrodes within the vacuum chamber, magnets, and a gas inlet operable to flow a precursor gas to a plasma area located between the electrodes. In another aspect, magnets and spaced apart radio frequency-powered electrodes are operable to create a magnetic field and a radio frequency field within a plasma, which causes a plasma enhanced chemical vapor deposition of coating material onto a workpiece or substrate within a vacuum chamber.
    Type: Application
    Filed: July 24, 2019
    Publication date: January 30, 2020
    Applicants: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY, Fraunhofer USA
    Inventors: Qi Hua FAN, Thomas Schuelke, Michael Becker, Bocong Zheng
  • Publication number: 20190366298
    Abstract: A method, system and equipment (31) for activating biochar (29) includes flowing a reactive gas into a chamber (33; 305), using an electrical field to create a plasma (75) in the chamber, using a magnetic field (105) to increase density of the plasma and activating biochar with the plasma in the chamber. Use of inductive magnetic coil(s) (131) with an essentially closed loop magnetic field, and/or a permanent magnet(s) (101; 317) are also provided in a further aspect of the present method and apparatus. Another aspect causes magnetic densification of one or multiple plasmas in a chamber (305) to treat a previously produced layer of thin film (303).
    Type: Application
    Filed: January 17, 2018
    Publication date: December 5, 2019
    Applicant: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY
    Inventors: Qi Hua FAN, Thomas SCHUELKE
  • Patent number: 9754733
    Abstract: A method for using plasma to activate biochar is disclosed where reactive gas(es) are excited by external power; biochar set on a sample holder is electrically biased or set at a floating potential so that charged particles of a certain type are attracted to the biochar, leading to intensive chemical reactions.
    Type: Grant
    Filed: April 30, 2015
    Date of Patent: September 5, 2017
    Assignee: South Dakota State University
    Inventors: Qi Hua Fan, Mukul Kumar Dubey, Zhengrong Gu
  • Publication number: 20160322174
    Abstract: A method for using plasma to activate biochar is disclosed where reactive gas(es) are excited by external power; biochar set on a sample holder is electrically biased or set at a floating potential so that charged particles of a certain type are attracted to the biochar, leading to intensive chemical reactions.
    Type: Application
    Filed: April 30, 2015
    Publication date: November 3, 2016
    Inventors: Qi Hua Fan, Mukul Kumar Dubey, Zhengrong Gu
  • Publication number: 20150307360
    Abstract: The present invention describes a non-aqueous organic solution for Electrophoretic Deposition (EPD) of nanoparticles onto thin films, including method of using said non-aqueous organic solution and EPD to produce films containing such nanoparticles for use in LED devices, Li ion batteries, as solar absorbers, and as thin film transistors.
    Type: Application
    Filed: November 1, 2014
    Publication date: October 29, 2015
    Applicant: SOUTH DAKOTA STATE UNIVERSITY
    Inventors: Braden Bills, Qi Hua Fan
  • Publication number: 20140313574
    Abstract: Disclosed are methods for forming nanoparticle films using electrophoretic deposition. The methods comprise exposing a substrate to a solution, the solution comprising substantially dispersed nanoparticles, an organic solvent, and a polymer characterized by a backbone comprising Si—O groups. The methods further comprise applying an electric field to the solution, whereby a nanoparticle film is deposited on the substrate. Suitable polymers include polysiloxanes, polysilsesquioxanes and polysilicates. Coated glass windows and methods of forming the coated glass windows using the solutions are also disclosed.
    Type: Application
    Filed: January 14, 2014
    Publication date: October 23, 2014
    Applicant: SOUTH DAKOTA STATE UNIVERSITY
    Inventors: Braden Bills, Nathan Morris, Qi Hua Fan, Mukul Dubey, David Galipeau
  • Publication number: 20110277823
    Abstract: A system for reducing damage to solar cells during a process for depositing a conductive material on a solar cell is disclosed where an electrical bias or floating potential is applied to the solar cell; and/or an electrical bias is applied to an external electrode(s) so that charged particles of a certain type are redirected away from the solar cells, avoiding the creation of a sufficiently high reverse bias on the solar cell to breakdown the cell.
    Type: Application
    Filed: May 19, 2009
    Publication date: November 17, 2011
    Applicants: MWOE SOLAR, INC., UNIVERSITY OF TOLEDO
    Inventors: Qi Hua Fan, Michael Deng, Xianbo Liao, Xunming Deng
  • Patent number: 6740212
    Abstract: The present invention discloses a novel rectangular sputtering magnetron cathode that significantly improves target utilization and sputtering efficiency. Different from conventional magnatron design that considers only magnetic field distribution and is, therefore, qualitive or empirical, the present magnetron cathode is developed through computer-aided simulation of plasma discharge. The magnetic and electric fields are optimized in a combined manner by quantitatively simulating electron trajectories, electron/Ar collisions, space charge distribution, and target erosion profile. Sputtering tests with Cu target show a target utilization of 55%˜65%, much higher than conventional target utilization which is about 40%. Meanwhile, high sputtering efficiency is achieved by maintaining a relatively strong magnetic field over the surface of the target, which can be thicker than 12 mm, as a result of effective confinement of high-energy electrons.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: May 25, 2004
    Inventors: Qi Hua Fan, Li Qin Zhou
  • Publication number: 20040074771
    Abstract: The present invention discloses a novel rectangular sputtering magnetron cathode that significantly improves target utilization and sputtering efficiency. Different from conventional magnetron design that considers only magnetic field distribution and is, therefore, qualitative or empirical, the present magnetron cathode is developed through computer-aided simulation of plasma discharge. The magnetic and electric fields are optimized in a combined manner by quantitatively simulating electron trajectories, electron/Ar collisions, space charge distribution, and target erosion profile. Sputtering tests with Cu target show a target utilization of 55%˜65%, much higher than conventional target utilization which is about 40%. Meanwhile, high sputtering efficiency is achieved by maintaining a relatively strong magnetic field over the surface of the target, which can be thicker than 12 mm, as a result of effective confinement of high-energy electrons.
    Type: Application
    Filed: October 18, 2002
    Publication date: April 22, 2004
    Inventors: Qi Hua Fan, Li Qin Zhou