Patents by Inventor Qiang Wen
Qiang Wen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12235972Abstract: The disclosure provides a security analysis method and system based on protocol state, which relates to the technical field of protocol security protection. The method includes the following: a node traversal table is built, the node traversal table is scanned and analyzed according to the protocol trigger sequence rule, a first security evaluation factor of a protocol stack is determined, and a second security evaluation factor of each protocol is determined based on protocol normal application rule, and the trustworthiness degree of the second security factor is determined based on the first security factor, and the second security factor is revised based on the trustworthiness degree, and the security state of the protocol is determined according to the revised second security factor, thus the analysis of the protocol state is realized, and the security of the protocol can be accurately determined.Type: GrantFiled: July 9, 2024Date of Patent: February 25, 2025Assignee: HUANENG INFORMATION TECHNOLOGY CO., LTD.Inventors: Ziqiang Wen, Hongjian Qi, Shuo Han, Chenghua Qu, Yufei Wang, Lei Xu, Zhongying Pan, Sheng Ye, Shouhui Xin, Wei Li, Yujie Liu, Qiang Zhang, Chengfeng Song, Hongwei Zhang, Yanfei Xu, Xushuai Qin, Xunan Deng
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Patent number: 12237227Abstract: A device includes a fin on a substrate; a first transistor, including: a drain region and a first source region in the fin; and a first gate structure on the fin between the first source region and the drain region; a second transistor, including: the drain region and a second source region in the fin; and a second gate structure on the fin between the second source region and the drain region; a first resistor, including: the first source region and a first resistor region in the fin; and a third gate structure on the fin between the first source region and the first resistor region; and a second resistor, including: the second source region and a second resistor region in the fin; and a fourth gate structure on the fin between the second source region and the second resistor region.Type: GrantFiled: March 11, 2022Date of Patent: February 25, 2025Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Kai-Qiang Wen, Shih-Fen Huang, Shih-Chun Fu, Chi-Yuan Shih, Feng Yuan
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Publication number: 20250051255Abstract: The present invention provides a method for synthesizing tyloxapol of formula (I), including the following steps: first reacting p-tert-octylphenol of formula (III) with formaldehyde under alkaline conditions to obtain 2,5-dimethylol p-tert-octylphenol of formula (IV); then reacting 2,5-dimethylol p-tert-octylphenol with p-tert-octylphenol of formula (III) under acidic conditions to obtain the phenolic resin of formula (II); and finally, reacting the phenolic resin of formula (II) with ethylene oxide to obtain tyloxapol of formula (I).Type: ApplicationFiled: December 20, 2022Publication date: February 13, 2025Inventors: Jidong LIU, Qiang YANG, Yu LEI, Bo WEN
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Publication number: 20250056872Abstract: The present disclosure provides a semiconductor device. The semiconductor device includes a substrate, an active region on the substrate, and a gate structure, a source conductor, and a drain conductor disposed on the active region. The semiconductor device further comprises a first type doped region of the active region below the gate structure and a second type doped region of the active region adjacent to the first type doped region, and the first type doped region is different from the second type doped region. The second type doped region is configured to function as a resistor.Type: ApplicationFiled: August 11, 2023Publication date: February 13, 2025Inventors: WAN-LIN TSAI, KAI-QIANG WEN, I-SHENG CHEN, YI-JING LI, SHIH-CHUN FU, CLEMENT HSINGJEN WANN
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Publication number: 20250045417Abstract: The disclosure provides a security analysis method and system based on protocol state, which relates to the technical field of protocol security protection. The method includes the following: a node traversal table is built, the node traversal table is scanned and analyzed according to the protocol trigger sequence rule, a first security evaluation factor of a protocol stack is determined, and a second security evaluation factor of each protocol is determined based on protocol normal application rule, and the trustworthiness degree of the second security factor is determined based on the first security factor, and the second security factor is revised based on the trustworthiness degree, and the security state of the protocol is determined according to the revised second security factor, thus the analysis of the protocol state is realized, and the security of the protocol can be accurately determined.Type: ApplicationFiled: July 9, 2024Publication date: February 6, 2025Applicant: HUANENG INFORMATION TECHNOLOGY CO., LTD.Inventors: Ziqiang WEN, Hongjian QI, Shuo HAN, Chenghua QU, Yufei WANG, Lei XU, Zhongying PAN, Sheng YE, Shouhui XIN, Wei LI, Yujie LIU, Qiang ZHANG, Chengfeng SONG, Hongwei ZHANG, Yanfei XU, Xushuai QIN, Xunan DENG
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Publication number: 20240379659Abstract: A method includes: forming a fin protruding from a substrate; implanting an n-type dopant in the fin to form an n-type channel region; implanting a p-type dopant in the fin to form a p-type channel region adjacent the n-type channel region; forming a first gate structure over the n-type channel region and a second gate structure over the p-type channel region; forming a first epitaxial region in the fin adjacent a first side of the first gate structure; forming a second epitaxial region in the fin adjacent a second side of the first gate structure and adjacent a first side of the second gate structure; and forming a third epitaxial region in the fin adjacent a second side of the second gate structure.Type: ApplicationFiled: July 23, 2024Publication date: November 14, 2024Inventors: Kai-Qiang Wen, Shih-Fen Huang, Shih-Chun Fu, Chi-Yuan Shih, Feng Yuan
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Publication number: 20240371954Abstract: The present disclosure provides a semiconductor device and a method of manufacturing the same. The semiconductor device includes a substrate, an active region on the substrate, and a first transistor having a gate structure, a source conductor, and a drain conductor disposed on the active region, wherein the drain conductor and the source conductor are disposed on opposite sides of the gate structure, and the source conductor is shorter than the drain conductor.Type: ApplicationFiled: May 7, 2023Publication date: November 7, 2024Inventors: WAN-LIN TSAI, CLEMENT HSINGJEN WANN, YI-JING LI, I-SHENG CHEN, SHIH-CHUN FU, KAI-QIANG WEN
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Publication number: 20240039313Abstract: The present invention discloses a modular charging device and a cooling structure thereof. The modular charging device comprises a housing, at least one battery package socket located on the housing, and a PCB located in the housing, the at least one battery package socket being located at one or two sides of the PCB, at least one battery package being electrically connectable into the at least one battery package socket in a plug-in manner, and the battery package socket comprising a battery package insertion slot extending inwards from the housing to the PCB. A cooling structure for a modular charging device comprises an air inlet disposed at one end of a housing, an air outlet at another end, and a pathway between a first PCB and a second PCB, the fan causing an airflow to flow through the pathway.Type: ApplicationFiled: July 17, 2023Publication date: February 1, 2024Inventors: LIANG ZHAN LAI, Qiang Wen Ye
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Publication number: 20230420452Abstract: Embodiments include a FinFET transistor including an embedded resistor disposed in the fin between the source epitaxial region and the source contact. A control contact may be used to bias the embedded resistor, thereby changing the resistivity of the resistor. Edge gates of the FinFET transistor may be replaced with insulating structures. Multiple ones of the FinFET/embedded resistor combination may be utilized together in a common drain/common source contact design.Type: ApplicationFiled: June 24, 2022Publication date: December 28, 2023Inventors: Kai-Qiang Wen, Shih-Fen Huang, Shih-Chun Fu, Chi-Yuan Shih, Feng Yuan, Wan-Lin Tsai, Chung-Liang Cheng
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Publication number: 20230317714Abstract: A method includes: forming a fin protruding from a substrate; implanting an n-type dopant in the fin to form an n-type channel region; implanting a p-type dopant in the fin to form a p-type channel region adjacent the n-type channel region; forming a first gate structure over the n-type channel region and a second gate structure over the p-type channel region; forming a first epitaxial region in the fin adjacent a first side of the first gate structure; forming a second epitaxial region in the fin adjacent a second side of the first gate structure and adjacent a first side of the second gate structure; and forming a third epitaxial region in the fin adjacent a second side of the second gate structure.Type: ApplicationFiled: March 29, 2022Publication date: October 5, 2023Inventors: Kai-Qiang Wen, Shih-Fen Huang, Shih-Chun Fu, Chi-Yuan Shih, Feng Yuan
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Publication number: 20230290688Abstract: A device includes a fin on a substrate; a first transistor, including: a drain region and a first source region in the fin; and a first gate structure on the fin between the first source region and the drain region; a second transistor, including: the drain region and a second source region in the fin; and a second gate structure on the fin between the second source region and the drain region; a first resistor, including: the first source region and a first resistor region in the fin; and a third gate structure on the fin between the first source region and the first resistor region; and a second resistor, including: the second source region and a second resistor region in the fin; and a fourth gate structure on the fin between the second source region and the second resistor region.Type: ApplicationFiled: March 11, 2022Publication date: September 14, 2023Inventors: Kai-Qiang Wen, Shih-Fen Huang, Shih-Chun Fu, Chi-Yuan Shih, Feng Yuan
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Publication number: 20230277508Abstract: A use of a compound as a CYP2E1 inhibitor includes: using a compound shown in formula (I) or a salt thereof as an inhibitor to inhibit CYP2E1, where the compound or the salt thereof targets and binds to CYP2E1. The inhibitor can be used for the prevention and treatment of a tumor including liver cancer, glioma, ovarian cancer, lung cancer, bladder cancer, and gallbladder cancer. The inhibitor can also be used for the prevention and treatment of an inflammation-mediated disease (IMD) such as liver damage, fatty liver, hepatitis, liver fibrosis, pulmonary fibrosis, rheumatic and rheumatoid arthritis, sepsis, Alzheimer's disease (AD), ischemic stroke, Parkinson's disease (PD), hyperlipidemia, atherosclerosis (AS), coronary heart disease (CHD), and diabetes.Type: ApplicationFiled: October 29, 2021Publication date: September 7, 2023Applicant: SHANGHAI LING XI BIOTECHNOLOGY DEVELOPMENT CO., LTD.Inventors: Hailing QIAO, Haiwei XU, Yan FANG, Na GAO, Qiang WEN, Shufeng LI
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Patent number: 11296285Abstract: The present disclosure discloses a flexible substrate and a method for manufacturing the same, and a flexible display substrate and a method for manufacturing the same. The method for manufacturing the flexible substrate includes: sequentially forming a first flexible substrate layer and a first inorganic layer on a rigid base substrate; forming a second flexible substrate layer on a side of the first inorganic layer distal from the first flexible substrate layer, an orthographic projection of the second flexible substrate layer on the first flexible substrate layer being located within the first flexible substrate layer; and stripping off the rigid base substrate to obtain the flexible substrate. The method solves the problem of poor process of the flexible substrate.Type: GrantFiled: December 10, 2019Date of Patent: April 5, 2022Assignees: Chengdu BOE Optoelectronics Technology Co., Ltd., BOE Technology Group Co., Ltd.Inventors: Baoqiang Xu, Xiangnan Wang, Qiang Wen, Jianjun Tan, Haitao Yi
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Patent number: 10870136Abstract: The present disclosure provides a cleaning device, cleaning apparatus and cleaning method. The cleaning device including a cleaning portion and at least one liquid amount control portion, the cleaning portion includes a cleaning surface which is capable of absorbing a cleaning liquid for cleaning an object to be cleaned; and the at least one liquid amount control portion is configured to be able to contact the cleaning surface and apply a contact pressure to the cleaning surface, so as to control a amount of the cleaning liquid contained in the cleaning surface of the cleaning portion as a generally determined value when in contact with the object to be cleaned.Type: GrantFiled: April 10, 2018Date of Patent: December 22, 2020Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.Inventors: Xiangnan Wang, Xuequan Jin, Qiang Wen, Jianjun Tan
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Publication number: 20200266369Abstract: The present disclosure discloses a flexible substrate and a method for manufacturing the same, and a flexible display substrate and a method for manufacturing the same. The method for manufacturing the flexible substrate includes: sequentially forming a first flexible substrate layer and a first inorganic layer on a rigid base substrate; forming a second flexible substrate layer on a side of the first inorganic layer distal from the first flexible substrate layer, an orthographic projection of the second flexible substrate layer on the first flexible substrate layer being located within the first flexible substrate layer; and stripping off the rigid base substrate to obtain the flexible substrate. The method solves the problem of poor process of the flexible substrate.Type: ApplicationFiled: December 10, 2019Publication date: August 20, 2020Inventors: Baoqiang Xu, Xiangnan Wang, Qiang Wen, Jianjun Tan, Haitao Yi
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Publication number: 20190317245Abstract: The present invention discloses a transfer film having a photonic crystal structure and a manufacturing method thereof. The transfer film having photonic crystal structure is obtained by forming a photonic crystal layer on an assembly substrate, and transferring the photonic crystal layer on the assembly substrate onto the printing substrate. The present invention also provides a method for manufacturing the above transfer film.Type: ApplicationFiled: June 24, 2019Publication date: October 17, 2019Inventors: Changqing YE, Shirong ZHENG, Qiang WEN, Renmei DOU, Houguang XU, Yanlin SONG
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Publication number: 20190030573Abstract: The present disclosure provides a cleaning device, cleaning apparatus and cleaning method. The cleaning device including a cleaning portion and at least one liquid amount control portion, the cleaning portion includes a cleaning surface which is capable of absorbing a cleaning liquid for cleaning an object to be cleaned; and the at least one liquid amount control portion is configured to be able to contact the cleaning surface and apply a contact pressure to the cleaning surface, so as to control a amount of the cleaning liquid contained in the cleaning surface of the cleaning portion as a generally determined value when in contact with the object to be cleaned.Type: ApplicationFiled: April 10, 2018Publication date: January 31, 2019Inventors: Xiangnan WANG, Xuequan JIN, Qiang WEN, Jianjun TAN
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Publication number: 20180194928Abstract: Provided is an optically functional material. The optically functional material includes a nano-microsphere layer formed by periodically arranged nano-microspheres, which is a closely packed structure, providing the optically functional material with luster. Wherein, the nano-microsphere layer includes colorless, white, gray, black or chromatic nano-microspheres. The optically functional material of the present invention has a suitable Poisson ratio and Mohs hardness within a specific range of values, and can achieve relative independence between the luster and hue, thus obtaining the special effect of randomly mixed and combined luster and hue as required. Further provided is a method of preparing an optically functional material.Type: ApplicationFiled: August 11, 2017Publication date: July 12, 2018Inventors: Changqing YE, Qiang WEN, Deyun LIU, Yanlin SONG
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Patent number: 9707540Abstract: The present invention provides metal-organic materials, more specifically organometallic polymers, comprising polypyridyl organic ligands such as tetrakis(4-(pyridin-4-ylethynyl)phenyl)methane, tetrakis(4-(2-(pyridin-4-yl)vinyl)phenyl)methane, 1,3,5,7-tetrakis(4-(pyridin-4-ylethynyl)phenyl)adamantane or 1,3,5,7-tetrakis(4-(2-(pyridine-4-yl)vinyl)phenyl) adamantine, and metal ions structurally coordinated with said ligands, and having three-dimensional crystalline micro or sub-micro structure; as well as a method for the preparation thereof. These metal-organic materials are useful as adsorbents in processes for gas adsorption or separation.Type: GrantFiled: March 24, 2016Date of Patent: July 18, 2017Assignee: YEDA RESEARCH AND DEVELOPMENT CO. LTD.Inventors: Milko E. Van Der Boom, Michal Lahav, Shira Hamami, Maria-Chiara Di-Gregorio, Qiang Wen, Sreejith Shankar Pooppanal
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Publication number: 20160271582Abstract: The present invention provides metal-organic materials, more specifically organometallic polymers, comprising polypyridyl organic ligands such as tetrakis(4-(pyridin-4-ylethynyl)phenyl)methane, tetrakis(4-(2-(pyridin-4-yl)vinyl)phenyl)methane, 1,3,5,7-tetrakis(4-(pyridin-4-ylethynyl)phenyl)adamantane or 1,3,5,7-tetrakis(4-(2-(pyridine-4-yl)vinyl)phenyl) adamantine, and metal ions structurally coordinated with said ligands, and having three-dimensional crystalline micro or sub-micro structure; as well as a method for the preparation thereof. These metal-organic materials are useful as adsorbents in processes for gas adsorption or separation.Type: ApplicationFiled: March 24, 2016Publication date: September 22, 2016Applicant: YEDA RESEARCH AND DEVELOPMENT CO. LTD.Inventors: Milko E. VAN DER BOOM, Michal LAHAV, Shira HAMAMI, Maria-Chiara DI-GREGORIO, Qiang WEN, Sreejith SHANKAR POOPPANAL