Abstract: An embodiment of the present application discloses an OLED display device manufacturing method and an OLED display device. The method includes a first pixel definition partitioning bar forming step, a second pixel definition partitioning bar forming step, and a color ink printing step. The first pixel definition partitioning bar forming step includes forming first pixel definition partitioning bars on substrate along a first direction. the second pixel definition partitioning bar forming step includes forming second pixel definition partitioning bars on the substrate along a second direction. An overflow drainage region is defined in each of the second pixel definition partitioning bars. The present application uses the overflow drainage region to perform an overflow drainage color inks printed on the substrate in the color ink printing step to prevent an issue of the overflowing color inks has color mixing and affect a quality of the OLED display device.

Abstract: A display panel includes a light-emitting area and a cathode overlapping area, and further includes a first metal layer including a first wire located in the cathode overlapping area, a second metal layer disposed above the first metal layer and including a second wire located in the cathode overlapping area, a third metal layer disposed above the second metal layer and including an extension wire located in the cathode overlapping area, and a light-emitting device disposed above the second metal layer and located in the light-emitting area. The light-emitting device includes an anode layer, an organic functional layer, and a cathode layer in sequence. The cathode layer extends from the light-emitting area to the cathode overlapping area and is connected to the extension wire.

Abstract: A display panel and a mobile terminal are provided. The display panel includes a substrate and a light-emitting device. The substrate has a viewing angle adjustment structure near a light exit side of the light-emitting device. The viewing angle adjustment structure includes a first refractive index layer having a plurality of grooves and a second refractive index layer having a plurality of protrusions. Each protrusion corresponds to each groove. A refractive index of the second refractive index layer is less than a refractive index of the first refractive index layer.

Abstract: A display panel includes a light-emitting area and a cathode overlapping area, and further includes a first metal layer including a first wire located in the cathode overlapping area, a second metal layer disposed above the first metal layer and including a second wire located in the cathode overlapping area, a third metal layer disposed above the second metal layer and including an extension wire located in the cathode overlapping area, and a light-emitting device disposed above the second metal layer and located in the light-emitting area. The light-emitting device includes an anode layer, an organic functional layer, and a cathode layer in sequence. The cathode layer extends from the light-emitting area to the cathode overlapping area and is connected to the extension wire.

Abstract: Embodiments of the present application provide an array substrate and a manufacturing method thereof, and a display panel. The array substrate includes a substrate, a source electrode, a drain electrode, a semiconductor layer, and a channel defining layer. The semiconductor layer is disposed between the source electrode and the drain electrode, and the semiconductor layer partially overlaps with the source electrode and the drain electrode. The channel defining layer is disposed around the semiconductor layer, and is correspondingly disposed on the source electrode and the drain electrode. When the semiconductor layer is prepared, the semiconductor layer is directly printed in a printing opening defined in the channel defining layer. Overflow of the semiconductor layer is prevented by the channel defining layer.

Abstract: A thin film transistor array substrate includes a base substrate, a light shielding layer, a semiconductor layer, a gate insulating layer, a gate layer, and a source-drain metal layer in contact with the semiconductor layer and in contact with the light shielding layer sequentially disposed on the base substrate, a first insulating layer covering the source-drain metal layer disposed on the base substrate, and a metal protection layer disposed on the first insulating layer. The semiconductor layer, the gate layer, and the source-drain metal layer form a thin film transistor. An end of the metal protection layer is in contact with the source-drain metal layer, and another end of the metal protection layer is in contact with the light shielding layer.

Abstract: An embodiment of the present application discloses an OLED display device manufacturing method and an OLED display device. The method includes a first pixel definition partitioning bar forming step, a second pixel definition partitioning bar forming step, and a color ink printing step. The first pixel definition partitioning bar forming step includes forming first pixel definition partitioning bars on substrate along a first direction. the second pixel definition partitioning bar forming step includes forming second pixel definition partitioning bars on the substrate along a second direction. An overflow drainage region is defined in each of the second pixel definition partitioning bars. The present application uses the overflow drainage region to perform an overflow drainage color inks printed on the substrate in the color ink printing step to prevent an issue of the overflowing color inks has color mixing and affect a quality of the OLED display device.

Abstract: The present invention relates to an array substrate, a fabricating method thereof, and a display device. On the one hand, the present invention provides a third metal layer including a second scanning signal line on the pixel electrode through a halftone mask process, thereby reducing the number of masks, thus saving production costs; on the other hand, the present invention avoids a buffer layer to be provided when the second scanning signal line is disposed under the gate, thereby further saving production costs.

Abstract: An OLED display panel and a method for fabricating the same are provided. The OLED display panel includes a substrate; a black matrix attached to a side surface of the substrate; a first color resist sheet attached to a surface of the black matrix away from the substrate; a second color resist sheet attached to a surface of the first color resist sheet away from the substrate; a third color resist sheet attached to a surface of the second color resist sheet away from the substrate; and a first color resist layer, a second color resist layer, and a third color resist layer respectively attached to the side surface of the substrate and between two of the black matrices adjacent to each other. A total lamination thickness of the black matrix and the first, second, and third color resist sheets is greater than a thickness of any color resist layer.