Abstract: According to the embodiments provided herein, a photovoltaic device can include an absorber layer. The absorber layer can be doped p-type with a Group V dopant and can have a carrier concentration of the Group V dopant greater than 4×1015 cm?3. The absorber layer can include oxygen in a central region of the absorber layer. The absorber layer can include an alkali metal in the central region of the absorber layer. Methods for carrier activation can include exposing an absorber layer to an annealing compound in a reducing environment. The annealing compound can include cadmium chloride and an alkali metal chloride.

Abstract: A photovoltaic device (100) can include an absorber layer (160). The absorber layer (160) can be doped p-type with a Group V dopant and can have a carrier concentration of the Group V dopant greater than 4×1015 cm?3. The absorber layer (160) can include oxygen in a central region of the absorber layer (160). The absorber layer (160) can include an alkali metal in the central region of the absorber layer (160). Methods for carrier activation can include exposing an absorber layer (160) to an annealing compound in a reducing environment (220). The annealing compound (224) can include cadmium chloride and an alkali metal chloride.

Abstract: A photovoltaic device (100) can include an absorber layer (160). The absorber layer (160) can be doped p-type with a Group V dopant and can have a carrier concentration of the Group V dopant greater than 4×1015cm-3. The absorber layer (160) can include oxygen in a central region of the absorber layer (160). The absorber layer (160) can include an alkali metal in the central region of the absorber layer (160). Methods for carrier activation can include exposing an absorber layer (160) to an annealing compound in a reducing environment (220). The annealing compound (224) can include cadmium chloride and an alkali metal chloride.

Abstract: A photovoltaic device includes a support layer; a first layer comprising cadmium, tellurium and copper and being of n-type; a second layer comprising cadmium, tellurium and copper and being of p-type; and a transparent conductive oxide layer. A method for making a photovoltaic device includes providing a stack comprising a cadmium and tellurium comprising layer and a copper comprising layer on the cadmium and tellurium comprising layer; and thermally annealing the stack to form a first layer and a second layer each comprising cadmium, tellurium and copper, the first layer being of n-type, the second layer being of p-type.

Abstract: A method for protecting a surface of an article from sulfate corrosion resulting from exposure to a sulfate containing material at an elevated temperature includes coating the surface with a nickel based material to form an anti-corrosion coating. The nickel based material includes NiO, a spinel of formulation AB2O4, or a combination thereof, wherein A includes nickel, and B includes iron or a combination of manganese and a B site dopant.

Abstract: A photovoltaic device is presented. The photovoltaic device includes a transparent conductive layer; a window layer disposed on the transparent conductive layer; and an absorber layer disposed on the window layer. The window layer includes a low-diffusivity layer disposed adjacent to the transparent conductive layer and a high-diffusivity layer interposed between the low-diffusivity layer and the absorber layer. Method of making a photovoltaic device is also presented.

Abstract: A photovoltaic device is presented. The photovoltaic device includes a first semiconductor layer, a second semiconductor layer, and an interlayer disposed between the first semiconductor layer and the second semiconductor layer, wherein the inter layer includes gadolinium. Methods of making photovoltaic devices are also presented.

Abstract: A photovoltaic device includes a support layer; a first layer comprising cadmium, tellurium and copper and being of n-type; a second layer comprising cadmium, tellurium and copper and being of p-type; and a transparent conductive oxide layer. A method for making a photovoltaic device includes providing a stack comprising a cadmium and tellurium comprising layer and a copper comprising layer on the cadmium and tellurium comprising layer; and thermally annealing the stack to form a first layer and a second layer each comprising cadmium, tellurium and copper, the first layer being of n-type, the second layer being of p-type.

Abstract: A photovoltaic device is presented. The photovoltaic device includes a buffer layer disposed on a transparent conductive oxide layer; a window layer disposed on the buffer layer; and an interlayer interposed between the transparent conductive oxide layer and the window layer. The interlayer includes: (i) a compound including magnesium and a metal species, wherein the metal species includes tin, indium, titanium, or combinations thereof; or (ii) a metal alloy including magnesium; or (iii) a compound comprising magnesium and fluorine; or (iv) combinations thereof. Method of making a photovoltaic device is also presented.

Abstract: A photovoltaic device is presented. The photovoltaic device includes a transparent conductive layer; a window layer disposed on the transparent conductive layer; and an absorber layer disposed on the window layer. The window layer includes a low-diffusivity layer disposed adjacent to the transparent conductive layer and a high-diffusivity layer interposed between the low-diffusivity layer and the absorber layer. Method of making a photovoltaic device is also presented.