Abstract: A method of forming a pattern of doped region includes the following steps. At first, a device layout pattern including a gate layout pattern and a doped region layout pattern is provided to a computer system. Subsequently, the device layout pattern is split into a plurality of sub regions, and the sub regions have different pattern densities of the gate layout pattern. Then, at least an optical proximity correction (OPC) calculation is respectively performed on the doped region layout pattern in each of the sub regions to respectively form a corrected sub doped region layout pattern in each of the sub regions. Afterwards, the corrected sub doped region layout patterns are combined to form a corrected doped region layout pattern, and the corrected doped region layout pattern is outputted onto a mask through the computer system.

Abstract: A test assist device includes: a network function module having a network port that is connectible to a network device; a control module connected to the network function module and having a processing unit and a transmission port electrically connectible to an input unit for receiving from the input unit at least one of basic test data and test result messages of an object, the processing unit transmitting the received at least one of the basic test data and the test result messages via the network function module to the network device; and an output module connected to the control module and having a basic status prompt unit and a test result prompt unit, the basic status prompt unit having a plurality of LEDs for displaying corresponding information corresponding to the basic test data, the test result prompt unit displaying corresponding information corresponding to the test result messages.