Patents by Inventor Qibo Liu

Qibo Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7553904
    Abstract: A method of using olefin containing nanostructured chemicals and silanol containing nanostructured chemicals as high temperature resins is described. Vinyl containing nanostructured chemicals are particularity effective in thermosets as they control the motions of polymer chains, and segments, at the molecular level. Silanol containing nanostructured chemicals are particularity effective in thermosets containing polar groups as the silanol can enhance the reactivity of these groups. Because of their tailorable compatibility with fluorinated polymers, nanostructured chemicals can be readily and selectively incorporated into polymers by direct blending and polymerization processes. The incorporation of a nanostructured chemical into a polymer favorably impacts a multitude of polymer physical properties. Properties most favorably improved are heat distortion and flammability characteristics, permeability, optical properties, texture, feel and durability.
    Type: Grant
    Filed: September 12, 2005
    Date of Patent: June 30, 2009
    Assignee: Hybrid Plastics, Inc.
    Inventors: Joseph D. Lichtenhan, Qibo Liu, Yan-Jyh Lee, Xuan Fu, Sukhendu Hait, Joseph J. Schwab, Rusty L. Blanski, Patrick N. Ruth
  • Publication number: 20080020213
    Abstract: A method of using olefin containing nanostructured chemicals and silanol containing nanostructured chemicals as high temperature resins is described. Vinyl containing nanostructured chemicals are particularity effective in thermosets as they control the motions of polymer chains, and segments, at the molecular level. Silanol containing nanostructured chemicals are particularity effective in thermosets containing polar groups as the silanol can enhance the reactivity of these groups. Because of their tailorable compatibility with fluorinated polymers, nanostructured chemicals can be readily and selectively incorporated into polymers by direct blending and polymerization processes. The incorporation of a nanostructured chemical into a polymer favorably impacts a multitude of polymer physical properties. Properties most favorably improved are heat distortion and flammability characteristics, permeability, optical properties, texture, feel and durability.
    Type: Application
    Filed: September 12, 2005
    Publication date: January 24, 2008
    Inventors: Joseph Lichtenhan, Qibo Liu, Yan-Jyh Lee, Xuan Fu, Sukhendu Hait, Joseph Schwab, Rusty Blanski, Patrick Ruth
  • Patent number: 6972312
    Abstract: Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]?, alkoxide [RO]??, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]28 where ?=1-1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)n?#, homoleptic, [(RXSiO1.5)n]?#, functionalized homoleptic, [(RSiO1.5)m(R?SiO1.5)n]?#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}?#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]?# homoleptic and [(RSiO1.5)m(R?SiO1.5)n]?# heteroleptic and [(RSiO1.5)m(RXSiO1.
    Type: Grant
    Filed: August 4, 2000
    Date of Patent: December 6, 2005
    Assignee: Hybrid Plastics LLC
    Inventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zong An, William Reinerth, Michael J. Carr, Frank J. Feher, Raquel Terroba, Qibo Liu
  • Patent number: 6927270
    Abstract: Efficient processes have been developed for the cost effective functionalization of polyhedral oligomeric silsesquioxane-silanols (POSS-Silanols) and for the manufacture of polyfunctional polyhedral oligomeric silsesquioxanes. The processes utilize the action of bases or acids on silane coupling agents. The preferred process utilizes base to promote the silylation of POSS-Silanols of the formula [(RSiO1.5)n(R(HO)SiO1.0)m]?# with silane coupling agents to form POSS species with functionalized incompletely condensed nanostructures [(RSiO1.5)n(R(YSiR2O)SiO1.0)m]?# or functionalized completely condensed nanostructures [(RSiO1.5)n(YSiO1.5)1]?#. The process can alternately be conducted with acids. A second process utilizes base to alkylate POSS-Silanols with functionalized alkyl halides. A third related process utilizes base to react with silane coupling agents to form polyfunctional, fully condensed POSS species of formula [(YSiO1.5)n]?#. This process can also alternately be conducted under acidic conditions.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: August 9, 2005
    Assignee: Hybrid Plastics LLP
    Inventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zhong An, Qibo Liu, Timothy S. Haddad
  • Publication number: 20030055193
    Abstract: Efficient processes have been developed for the cost effective functionalization of polyhedral oligomeric silsesquioxane-silanols (POSS-Silanols) and for the manufacture of polyfunctional polyhedral oligomeric silsesquioxanes. The processes utilize the action of bases or acids on silane coupling agents. The preferred process utilizes base to promote the silylation of POSS-Silanols of the formula [(RSiO1 5)n(R(HO)SiO1 0)m]&Sgr;# with silane coupling agents to form POSS species with functionalized incompletely condensed nanostructures [(RSiO1 5)n(R(YSiR2O)SiO1 0)m]&Sgr;# or functionalized completely condensed nanostructures [(RSiO1 5)n(YSiO1 5)1]&Sgr;#. The process can alternately be conducted with acids. A second process utilizes base to alkylate POSS-Silanols with functionalized alkyl halides. A third related process utilizes base to react with silane coupling agents to form polyfunctional, fully condensed POSS species of formula [(YSiO1.5)n]&Sgr;#.
    Type: Application
    Filed: June 27, 2002
    Publication date: March 20, 2003
    Inventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zhong An, Qibo Liu, Timothy S. Haddad