Patents by Inventor Qilang Yan

Qilang Yan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for determining an optical model that models the effect of optical proximity correction
    Patent number: 7788630
    Abstract: One embodiment provides a system that can enable a designer to determine the effects of subsequent processes at design time. During operation, the system may receive a test layout and an optical model that models an optical system, but which does not model the effects of subsequent processes, such as optical proximity correction (OPC). The system may generate a first dataset using the test layout and the optical model. Next, the system may apply OPC to the test layout, and generate a second dataset using the corrected test layout and the optical model. The system may then use the first dataset and the second dataset to adjust the optical model to obtain a second optical model that models the effects of subsequent processes.
    Type: Grant
    Filed: March 21, 2007
    Date of Patent: August 31, 2010
    Assignee: Synopsys, Inc.
    Inventors: Jianliang Li, Qilang Yan, Lawrence S. Melvin, III
  • Method and apparatus for determining an optical model that models the effects of optical proximity correction
    Publication number: 20080235651
    Abstract: One embodiment provides a system that can enable a designer to determine the effects of subsequent processes at design time. During operation, the system may receive a test layout and an optical model that models an optical system, but which does not model the effects of subsequent processes, such as optical proximity correction (OPC). The system may generate a first dataset using the test layout and the optical model. Next, the system may apply OPC to the test layout, and generate a second dataset using the corrected test layout and the optical model. The system may then use the first dataset and the second dataset to adjust the optical model to obtain a second optical model that models the effects of subsequent processes.
    Type: Application
    Filed: March 21, 2007
    Publication date: September 25, 2008
    Inventors: Jianliang Li, Qilang Yan, Lawrence S. Melvin