Patents by Inventor Qingde Long

Qingde Long has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10317586
    Abstract: Embodiments of the present invention relates to a thin film transistor and a method for manufacturing the same, a display substrate and a display device. The thin film transistor comprises an active layer, a source electrode, a drain electrode and an ohmic contact layer, wherein the ohmic contact layer is disposed between the active layer and the source electrode and/or between the active layer and the drain electrode to improve an ohmic contact property of the active layer with the source electrode and/or the drain electrode. The present invention solves the problem of poor ohmic contact effect between the active layer and the source and drain electrodes in the existing thin film transistor, thereby improving the ohmic contact property of the active layer with the source and drain electrodes and meanwhile improving display effect of images of a display.
    Type: Grant
    Filed: January 20, 2016
    Date of Patent: June 11, 2019
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Tao Tang, Tao Luo, Qingde Long, Zhiyong Zhang, Xuejie Bai, Wen Xiao, Zerong Yang
  • Publication number: 20180267352
    Abstract: The present disclosure discloses a method for manufacturing a display substrate, a display substrate, a display panel and a display apparatus. The method for comprises: forming a black matrix and a plurality of black matrix alignment marks; providing a color film mask having a plurality of color film layer alignment marks associated with the black matrix alignment marks; and forming the color film layer on the black matrix by aligning the black matrix alignment marks with the associated color film layer alignment marks respectively, wherein the black matrix has a group of N first black matrix alignment marks and a group of N second black matrix alignment marks formed on ends of opposing edges thereof, respectively, and a spacing between adjacent first black matrix alignment marks different from that between adjacent second black matrix alignment marks.
    Type: Application
    Filed: October 25, 2017
    Publication date: September 20, 2018
    Inventors: Danhui Li, Qingde Long, Zerong Yang, Chao Ye, Changyu Fu, Xiaojiao Xiong
  • Publication number: 20180210281
    Abstract: A method for manufacturing a display substrate is provided. The method for manufacturing the display substrate includes: subjecting the photoresist layer to a first exposing operation using a mask; moving the mask a first number of the first distances in the row direction and a second number of the second distances in the column direction, and subjecting the photoresist layer to a second exposing operation using the moved mask; and developing the photoresist layer to form a pattern having a plurality of opening structures.
    Type: Application
    Filed: September 29, 2017
    Publication date: July 26, 2018
    Applicants: BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Jinjie LIU, Qingde LONG, Xing LIU, Tang YANG
  • Patent number: 9971187
    Abstract: The disclosure provides in some embodiments a method for fabricating a photoresist pattern, a color filter and a method for fabricating the same, and a display device. The method for fabricating a photoresist pattern includes coating negative photoresist on a base substrate to form a first photoresist layer, coating positive photoresist on the first photoresist layer to form a second photoresist layer, conducting a first exposure process on first regions of the second photoresist layer, conducting a first developing process to remove the positive photoresist within the first regions of the second photoresist layer and the negative photoresist within second regions of the first photoresist layer, so as to obtain a first photoresist pattern and a second photoresist pattern, conducting a second exposure process on the first photoresist pattern and the second photoresist pattern, and conducting a second developing process to remove the first photoresist pattern.
    Type: Grant
    Filed: March 2, 2016
    Date of Patent: May 15, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLGY CO., LTD.
    Inventors: Qingde Long, Yulong Kang, Yuan Liang, Zhiyong Zhang, Liwei Fan
  • Patent number: 9904401
    Abstract: The present disclosure relates to a touch panel and a touch display apparatus. The touch panel comprises a glass substrate, a solar cell panel located at a side of the glass substrate and comprising a plurality of solar cell modules, n sensing lines in a first direction and m sensing lines in a second direction for carrying the electric power converted by the solar cell panel, and a detection unit for detecting the electric currents or voltages on the sensing lines in the first direction and the sensing lines in the second direction and for determining a touch region of a touch object based on a variation in the electric currents or voltages, wherein each of the n sensing lines in the first direction and the m sensing lines in the second direction connects the individual solar cell modules in the respective direction in series, and m and n are positive integers. The number of the wires connected in the touch panel of the present disclosure is reduced, and a lightweight touch screen is achieved.
    Type: Grant
    Filed: September 16, 2014
    Date of Patent: February 27, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Qingde Long
  • Publication number: 20170269424
    Abstract: The disclosure provides in some embodiments a method for fabricating a photoresist pattern, a color filter and a method for fabricating the same, and a display device. The method for fabricating a photoresist pattern includes coating negative photoresist on a base substrate to form a first photoresist layer, coating positive photoresist on the first photoresist layer to form a second photoresist layer, conducting a first exposure process on first regions of the second photoresist layer, conducting a first developing process to remove the positive photoresist within the first regions of the second photoresist layer and the negative photoresist within second regions of the first photoresist layer, so as to obtain a first photoresist pattern and a second photoresist pattern, conducting a second exposure process on the first photoresist pattern and the second photoresist pattern, and conducting a second developing process to remove the first photoresist pattern.
    Type: Application
    Filed: March 2, 2016
    Publication date: September 21, 2017
    Inventors: Qingde LONG, Yulong KANG, Yuan LIANG, Zhiyong ZHANG, Liwei FAN
  • Patent number: 9760001
    Abstract: A manufacturing method of a color filter substrate includes: depositing a photoresist layer on a substrate, patterning the photoresist layer through exposure and development and executing an UV curing; or forming an overcoat whose material is a light-cured material on a substrate, conducting an UV irradiation on the substrate from front and back sides of the substrate, respectively; or, depositing a black matrix photoresist, a red photoresist, a green photoresist and a blue photoresist on a substrate, respectively, and forming corresponding patterns respectively through exposure and development and executing an UV curing. By the technical solution, the line-width of a BM can be restrained from broadening, and the curing time can be shortened, thereby raising the production efficiency.
    Type: Grant
    Filed: June 30, 2014
    Date of Patent: September 12, 2017
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Zerong Yang, Qingde Long
  • Publication number: 20170153365
    Abstract: Embodiments of the present invention relates to a thin film transistor and a method for manufacturing the same, a display substrate and a display device. The thin film transistor comprises an active layer, a source electrode, a drain electrode and an ohmic contact layer, wherein the ohmic contact layer is disposed between the active layer and the source electrode and/or between the active layer and the drain electrode to improve an ohmic contact property of the active layer with the source electrode and/or the drain electrode. The present invention solves the problem of poor ohmic contact effect between the active layer and the source and drain electrodes in the existing thin film transistor, thereby improving the ohmic contact property of the active layer with the source and drain electrodes and meanwhile improving display effect of images of a display.
    Type: Application
    Filed: January 20, 2016
    Publication date: June 1, 2017
    Inventors: Tao Tang, Tao Luo, Qingde Long, Zhiyong Zhang, Xuejie Bai, Wen Xiao, Zerong Yang
  • Patent number: 9568820
    Abstract: A method for manufacturing color filter, a color filter, and a display device including the color filter are disclosed. The method for manufacturing a color filter includes: forming a black matrix on a transparent substrate; forming a photosensitive resist layer on the transparent substrate with the black matrix; disposing a reflection sheet capable of reflecting light on a first side of the transparent substrate to be exposed, the first side being provided with the black matrix; disposing a mask on a second side of the transparent substrate to be exposed, the second side being not provided with the black matrix; and carrying out an exposing process from the second side of the transparent substrate.
    Type: Grant
    Filed: May 21, 2015
    Date of Patent: February 14, 2017
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Qingde Long, Jiawei Ren, Danhui Li, Bin Gao, Degang Zhao, Zhiyong Zhang, Yi Chen, Changyu Fu, Xuejie Bai
  • Publication number: 20160349611
    Abstract: A method for manufacturing color filter, a color filter, and a display device including the color filter are disclosed. The method for manufacturing a color filter includes: forming a black matrix on a transparent substrate; forming a photosensitive resist layer on the transparent substrate with the black matrix; disposing a reflection sheet capable of reflecting light on a first side of the transparent substrate to be exposed, the first side being provided with the black matrix; disposing a mask on a second side of the transparent substrate to be exposed, the second side being not provided with the black matrix; and carrying out an exposing process from the second side of the transparent substrate.
    Type: Application
    Filed: May 21, 2015
    Publication date: December 1, 2016
    Inventors: Qingde LONG, Jiawei REN, Danhui LI, Bin GAO, Degang ZHAO, Zhiyong ZHANG, Yi CHEN, Changyu FU, Xuejie BAI
  • Publication number: 20160283012
    Abstract: The present disclosure relates to a touch panel and a touch display apparatus. The touch panel comprises a glass substrate, a solar cell panel located at a side of the glass substrate and comprising a plurality of solar cell modules, n sensing lines in a first direction and m sensing lines in a second direction for carrying the electric power converted by the solar cell panel, and a detection unit for detecting the electric currents or voltages on the sensing lines in the first direction and the sensing lines in the second direction and for determining a touch region of a touch object based on a variation in the electric currents or voltages, wherein each of the n sensing lines in the first direction and the m sensing lines in the second direction connects the individual solar cell modules in the respective direction in series, and m and n are positive integers. The number of the wires connected in the touch panel of the present disclosure is reduced, and a lightweight touch screen is achieved.
    Type: Application
    Filed: September 16, 2014
    Publication date: September 29, 2016
    Inventor: Qingde Long
  • Publication number: 20150248051
    Abstract: A manufacturing method of a color filter substrate includes: depositing a photoresist layer on a substrate, patterning the photoresist layer through exposure and development and executing an UV curing; or forming an overcoat whose material is a light-cured material on a substrate, conducting an UV irradiation on the substrate from front and back sides of the substrate, respectively; or, depositing a black matrix photoresist, a red photoresist, a green photoresist and a blue photoresist on a substrate, respectively, and forming corresponding patterns respectively through exposure and development and executing an UV curing. By the technical solution, the line-width of a BM can be restrained from broadening, and the curing time can be shortened, thereby raising the production efficiency.
    Type: Application
    Filed: June 30, 2014
    Publication date: September 3, 2015
    Inventors: Zerong Yang, Qingde Long