Patents by Inventor Qingling Wang

Qingling Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230393095
    Abstract: Embodiments are provided for ultraviolet lamps for use in photoionization detectors and methods of manufacturing same. An example method of manufacturing an ultraviolet lamp includes providing a glass tube, the glass tube defining a first end; applying a mixed powder coating composition onto an edge surface of the first end of the glass tube, the mixed powder coating composition comprising indium powder and glass powder; applying a glass powder coating composition over the mixed powder coating composition; attaching a crystal window to the edge surface of the first end of the glass tube; and heating the glass tube and the crystal window to seal the crystal window to the glass tube.
    Type: Application
    Filed: May 15, 2023
    Publication date: December 7, 2023
    Inventors: Chuang HUANG, Qingling WANG
  • Patent number: 10635892
    Abstract: Aspects of the disclosure provide a method for display control. The method includes capturing, by a camera in a terminal device that is in use by a user, a first face image and a second face image of the user, extracting a first face fiducial of a characteristic point on a face of the user from the first face image and a second face fiducial of the characteristic point on the face of the user from the second face image, determining a face location offset value based on the first face fiducial and the second face fiducial, determining, based on the face location offset value, a display location offset value of content to be displayed on a display screen of the terminal device, and performing a display control of the content on the display screen according to the display location offset value.
    Type: Grant
    Filed: December 26, 2017
    Date of Patent: April 28, 2020
    Assignees: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED, CHONGQING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS
    Inventors: Junwei Ge, Qingling Wang, Zhangqun Fan, Weiwei Zhang, Yuyan Cui
  • Publication number: 20180121711
    Abstract: Aspects of the disclosure provide a method for display control. The method includes capturing, by a camera in a terminal device that is in use by a user, a first face image and a second face image of the user, extracting a first face fiducial of a characteristic point on a face of the user from the first face image and a second face fiducial of the characteristic point on the face of the user from the second face image, determining a face location offset value based on the first face fiducial and the second face fiducial, determining, based on the face location offset value, a display location offset value of content to be displayed on a display screen of the terminal device, and performing a display control of the content on the display screen according to the display location offset value.
    Type: Application
    Filed: December 26, 2017
    Publication date: May 3, 2018
    Applicants: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED, CHONGQING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS
    Inventors: Junwei GE, Qingling Wang, Zhangqun Fan, Weiwei Zhang, Yuyan Cui
  • Patent number: 9920278
    Abstract: The invention provides a method for producing high-quality lard or beef tallow with low cholesterol content. The method of the invention uses enzyme hydrolysis, centrifugation separation and homogenization-assisted embedding technique to obtain high-quality lard or beef tallow with low cholesterol levels. The method uses aqueous enzymatic extraction (AEE) techniques to separate lard or beef tallow from the raw material of pork or beef fat, and uses the homogenization-assisted embedding technique to remove cholesterol from the lard and beef tallow products. The method of the invention produces high quality lard with good oxidative stability at a high yield and can meet the Chinese national standard for first grade lard. The lard of the invention needs no further degumming process, eliminating the tedious refinery steps.
    Type: Grant
    Filed: October 1, 2014
    Date of Patent: March 20, 2018
    Assignee: Jiangnan University
    Inventors: Yuanfa Liu, Qingling Wang, Jiang Jiang, Jinwei Li
  • Publication number: 20150173389
    Abstract: The invention provides a method for producing high-quality lard or beef tallow with low cholesterol content. The method of the invention uses enzyme hydrolysis, centrifugation separation and homogenization-assisted embedding technique to obtain high-quality lard or beef tallow with low cholesterol levels. The method uses aqueous enzymatic extraction (AEE) techniques to separate lard or beef tallow from the raw material of pork or beef fat, and uses the homogenization-assisted embedding technique to remove cholesterol from the lard and beef tallow products. The method of the invention produces high quality lard with good oxidative stability at a high yield and can meet the Chinese national standard for first grade lard. The lard of the invention needs no further degumming process, eliminating the tedious refinery steps.
    Type: Application
    Filed: October 1, 2014
    Publication date: June 25, 2015
    Applicant: Jiangnan University
    Inventors: Yuanfa Liu, Qingling Wang, Jiang Jiang, Jinwei Li
  • Patent number: 8758090
    Abstract: A polishing method includes: mounting a wafer on a fixed abrasive polishing pad located on a polishing platen; delivering a polishing slurry to the fixed abrasive polishing pad to polish the wafer; and adsorbing abrasive particles generated during the polishing process with an electrode. The electrode has a polarity opposite to a polarity of charges of the abrasive particles. A polishing device includes a polishing platen, a fixed abrasive polishing pad, a slurry pipeline and a polarity changer having an electrode. Therefore, the abrasive particles generated during the polishing process are removed, which prevents the wafer from being scratched, thereby increasing wafer yield and improving efficiency.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: June 24, 2014
    Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventors: Qun Shao, Li Jiang, Mingqi Li, Qingling Wang
  • Publication number: 20120190278
    Abstract: A polishing method includes: mounting a wafer on a fixed abrasive polishing pad located on a polishing platen; delivering a polishing slurry to the fixed abrasive polishing pad to polish the wafer; and adsorbing abrasive particles generated during the polishing process with an electrode. The electrode has a polarity opposite to a polarity of charges of the abrasive particles. A polishing device includes a polishing platen, a fixed abrasive polishing pad, a slurry pipeline and a polarity changer having an electrode. Therefore, the abrasive particles generated during the polishing process are removed, which prevents the wafer from being scratched, thereby increasing wafer yield and improving efficiency.
    Type: Application
    Filed: December 16, 2011
    Publication date: July 26, 2012
    Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventors: Qun Shao, Li Jiang, Mingqi Li, Qingling Wang