Abstract: A display panel includes a substrate, an insulating layer arranged at one side of the substrate, a conductive adhesive layer arranged at one side of the insulating layer away from the substrate, and a chip arranged at one side of the conductive adhesive layer away from the substrate. The insulating layer is provided with an accommodation groove, and first electrodes are arranged within the accommodation groove. Along a direction perpendicular to a plane where the substrate is located, an orthographic projection of the conductive adhesive layer on the substrate covers an orthographic projection of the accommodation groove on the substrate. Part of the conductive adhesive layer is in contact with the first electrodes, and the chip is in contact with the conductive adhesive layer. A channel is provided in the insulating layer for the accommodation groove to communicate with outside.

Abstract: A method for analyzing disaster prevention and mitigation effectiveness of an ecological seawall is provided, including: performing seawall ecologicalization on a target seawall; establishing three-dimensional space hydrodynamic force for the target ecological seawall; simulating wave climbing on a dike body and a wave overtopping on a dike top of the target ecological seawall to obtain a wave overtopping index; calculating wave-flow bottom shear stress of the target ecological seawall, establishing a sediment movement model, and calculating suspended load and bed load sediment transportation volumes; calculating the change index of coastal bed surface according to the suspended load and bed load sediment transportation volumes, and determining a development index of tidal flats in front of dike of the target ecological seawall according to the change index; and calculating the disaster prevention and mitigation effectiveness grade of the target ecological seawall according to the wave overtopping index and t

Abstract: Disclosed is an apparatus for centralized charging of electronic products, including a base, where charging grooves, charging racks, and a charging stand are provided on the top surface of the base in sequence from front to back; a charging head A is provided in the charging groove; a connecting piece A matching a plug-in type charging head is provided at the lower part of the charging rack; the base is further provided with connecting pieces B matching the plug-in type charging heads; the connecting pieces B are located at one side of the charging stand; and the charging head A, the connecting piece A, and the connecting piece B are electrically connected to an output end of a power adapter provided in the base, respectively.

Abstract: Disclosed is an apparatus for centralized charging of electronic products, including a base, where charging grooves, charging racks, and a charging stand are provided on the top surface of the base in sequence from front to back; a charging head A is provided in the charging groove; a connecting piece A matching a plug-in type charging head is provided at the lower part of the charging rack; the base is further provided with connecting pieces B matching the plug-in type charging heads; the connecting pieces B are located at one side of the charging stand; and the charging head A, the connecting piece A, and the connecting piece B are electrically connected to an output end of a power adapter provided in the base, respectively.

Abstract: A zero discharge process for separating sludge and salt from desulfurization wastewater includes a pretreatment process, a membrane treatment process and an evaporative crystallization process; in the pretreatment process, the desulfurization wastewater enters a raw water tank, an aeration fan introduces compressed air into the raw water tank, and the wastewater is lifted to first-stage reaction and clarification by a raw water pump; in the membrane treatment process, the incoming wastewater is first filtered by ultrafiltration, then enters a pH adjustment tank, and is pumped into a nanofiltration membrane separation system and a reverse osmosis membrane separation system; in the evaporative crystallization process, the incoming wastewater is first subjected to two-stage preheating, then enters a degasser, and finally enters an evaporative concentration system and a crystallization system.

Abstract: A zero discharge process for separating sludge and salt from desulfurization wastewater includes a pretreatment process, a membrane treatment process and an evaporative crystallization process; in the pretreatment process, the desulfurization wastewater enters a raw water tank, an aeration fan introduces compressed air into the raw water tank, and the wastewater is lifted to first-stage reaction and clarification by a raw water pump; in the membrane treatment process, the incoming wastewater is first filtered by ultrafiltration, then enters a pH adjustment tank, and is pumped into a nanofiltration membrane separation system and a reverse osmosis membrane separation system; in the evaporative crystallization process, the incoming wastewater is first subjected to two-stage preheating, then enters a degasser, and finally enters an evaporative concentration system and a crystallization system.

Abstract: A process for preparing various morphology NTE compound ZrW0.5Mo1.5O8 comprising: preparing 0.4M Zr4+ solution, 0.2M W6+ solution and 0.6M Mo6+ solution with zirconyl nitrate, ammonium tungstate and ammo-nium molybdate separately, mixing them with the same volume and stirring until they are mixed well, adding 6-12M hydrochloric acid with the volume of 1/5-1/7 of the mixed solution, or adding 6-12M hydrochloric acid with the volume of 1/3-1/5 of the mixed solution and 0.2-0.4 wt % ammonium monoacid phosphate of all raw materials, or adding 9-18M sulfuric acid with the volume of 1/10-1/5 of the mixed solution, well mixing, transferring the mixed solution into the hydrothermal reactor, reacting at 150-180° C. for 8-25 hours, washing, drying and getting the precursor, heating the precursor at 480-500° C. for more than 5 hours and obtaining the product is provided.

Abstract: A process for preparing various morphology NTE compound ZrW0.5Mo1.5O8 comprising: preparing 0.4M Zr4+ solution, 0.2M W6+ solution and 0.6M Mo6+ solution with zirconyl nitrate, ammonium tungstate and ammo-nium molybdate separately, mixing them with the same volume and stirring until they are mixed well, adding 6-12M hydrochloric acid with the volume of ?- 1/7 of the mixed solution, or adding 6-12M hydrochloric acid with the volume of ?-? of the mixed solution and 0.2-0.4 wt % ammonium monoacid phosphate of all raw materials, or adding 9-18M sulfuric acid with the volume of 1/10-? of the mixed solution, well mixing, transferring the mixed solution into the hydrothermal reactor, reacting at 150-180° C. for 8-25 hours, washing, drying and getting the precursor, heating the precursor at 480-500° C. for more than 5 hours and obtaining the product is provided.