Patents by Inventor Qiping Zhong

Qiping Zhong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8801943
    Abstract: The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.
    Type: Grant
    Filed: July 28, 2011
    Date of Patent: August 12, 2014
    Assignee: HGST Netherlands B.V.
    Inventors: Shiwen Huang, Fenglin Liu, Qiping Zhong, Kyusik Shin, Yingjian Chen
  • Patent number: 8547660
    Abstract: A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: October 1, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Donald G. Allen, Amanda Baer, Yingjian Chen, Andrew Chiu, Liubo Hong, Wen-Chien D. Hsiao, Edward H. P. Lee, Fenglin Liu, Aron Pentek, Katalin Pentek, Kyusik Shin, Yi Zheng, Qiping Zhong, Honglin Zhu
  • Patent number: 8524095
    Abstract: Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: September 3, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Liubo Hong, Fenglin Liu, Qiping Zhong, Honglin Zhu
  • Patent number: 8400733
    Abstract: Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: March 19, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Kyusik Shin, Qiping Zhong, Honglin Zhu, Yingjian Chen, Liubo Hong, Fenglin Liu
  • Patent number: 8371019
    Abstract: A method for manufacturing a magnetic write head having a write pole with a very narrow track width, straight well defined sides and a well defined trailing edge width (e.g. track-width). The method includes uses two separate chemical mechanical polishing processes that stop at separate CMP stop layers. The first CMP stop layer is deposited directly over a RIEable fill layer. A RIE mask, is formed over the fill layer and first CMP stop layer, the RIE mask having an opening. A trench then is formed in the RIEable fill layer. A second CMP stop layer is then deposited into the trench and over the RIE mask, followed by plating of a magnetic material. First and second chemical mechanical polishing processes are then performed, the first stopping at the first CMP stop and the second stopping at the second CMP stop.
    Type: Grant
    Filed: July 20, 2011
    Date of Patent: February 12, 2013
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Sue Siyang Zhang, Yi Zheng, Qiping Zhong, Honglin Zhu
  • Publication number: 20130026131
    Abstract: The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.
    Type: Application
    Filed: July 28, 2011
    Publication date: January 31, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Shiwen Huang, Fenglin Liu, Qiping Zhong, Kyusik Shin, Yingjian Chen
  • Publication number: 20130019467
    Abstract: A method for manufacturing a magnetic write head having a write pole with a very narrow track width, straight well defined sides and a well defined trailing edge width (e.g. track-width). The method includes uses two separate chemical mechanical polishing processes that stop at separate CMP stop layers. The first CMP stop layer is deposited directly over a RIEable fill layer. A RIE mask, is formed over the fill layer and first CMP stop layer, the RIE mask having an opening. A trench then is formed in the RIEable fill layer. A second CMP stop layer is then deposited into the trench and over the RIE mask, followed by plating of a magnetic material. First and second chemical mechanical polishing processes are then performed, the first stopping at the first CMP stop and the second stopping at the second CMP stop.
    Type: Application
    Filed: July 20, 2011
    Publication date: January 24, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Sue Siyang Zhang, Yi Zheng, Qiping Zhong, Honglin Zhu
  • Publication number: 20130020204
    Abstract: A method for manufacturing a magnetic write head having a tapered leading edge. The method includes depositing a sacrificial non-magnetic layer to a thickness that is at least as great as the thickness of the write pole to be formed. The sacrificial non-magnetic layer is then masked and ion milled so as to form a tapered edge on the sacrificial non-magnetic layer that extends through the thickness of the non-magnetic fill layer. A magnetic material is then deposited and planarized by chemical mechanical polishing. The remaining magnetic material forms the entirety of the magnetic write pole so that there is no need to deposit additional magnetic layers further construct the write pole.
    Type: Application
    Filed: July 20, 2011
    Publication date: January 24, 2013
    Inventors: Donald G. Allen, Liubo Hong, Aron Pentek, Thomas J. A. Roucoux, Junsheng Yang, Yi Zheng, Qiping Zhong, Honglin Zhu
  • Patent number: 8201320
    Abstract: A method for manufacturing a magnetic write head having a leading magnetic shield and a trailing magnetic shield that are arranged to prevent the lost of magnetic write field to the trailing magnetic shield. The write head includes a non-magnetic step layer that provides additional spacing between the trailing magnetic shield and the write pole at a region removed from the air bearing surface.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: June 19, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Donald G. Allen, Yingjian Chen, Andrew Chiu, Liubo Hong, Wen-Chien D. Hsiao, Edward H. P. Lee, Fenglin Liu, Katalin Pentek, Kyusik Shin, Yi Zheng, Qiping Zhong, Honglin Zhu
  • Publication number: 20120125886
    Abstract: Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.
    Type: Application
    Filed: November 24, 2010
    Publication date: May 24, 2012
    Inventors: Liubo Hong, Fenglin Liu, Qiping Zhong, Honglin Zhu
  • Publication number: 20120127612
    Abstract: Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.
    Type: Application
    Filed: November 24, 2010
    Publication date: May 24, 2012
    Inventors: Kyusik Shin, Qiping Zhong, Honglin Zhu, Yingjian Chen, Liubo Hong, Fenglin Liu
  • Publication number: 20110151279
    Abstract: A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.
    Type: Application
    Filed: December 17, 2009
    Publication date: June 23, 2011
    Inventors: Donald G. Allen, Amanda Baer, Yingjian Chen, Andrew Chiu, Liubo Hong, Wen-Chien D. Hsiao, Edward H.P. Lee, Fenglin Liu, Aron Pentek, Katalin Pentek, Kyusik Shin, Yi Zheng, Qiping Zhong, Honglin Zhu
  • Publication number: 20110146062
    Abstract: A method for manufacturing a magnetic write head having a leading magnetic shield and a trailing magnetic shield that are arranged to prevent the lost of magnetic write field to the trailing magnetic shield. The write head includes a non-magnetic step layer that provides additional spacing between the trailing magnetic shield and the write pole at a region removed from the air bearing surface.
    Type: Application
    Filed: December 17, 2009
    Publication date: June 23, 2011
    Inventors: Donald G. Allen, Yingjian Chen, Andrew Chiu, Liubo Hong, Wen-Chien D. Hsiao, Edward H.P. Lee, Fenglin Liu, Katalin Pentek, Kyusik Shin, Yi Zheng, Qiping Zhong, Honglin Zhu
  • Patent number: 7758689
    Abstract: In one embodiment the invention is a hydrophobic nano-talc composition that is the reaction product of nano-talc with an ammonium, pyridinium or phosponium salt. The composition is characterized by a carbon content of about 5 to about 25 wt %. The compositions are useful in preparing nano-talc/polymer composites. In another embodiment, the invention is a process for preparing a nano-talc composition of the invention.
    Type: Grant
    Filed: August 18, 2004
    Date of Patent: July 20, 2010
    Assignee: NGX, Inc.
    Inventors: Mei Li, Qiping Zhong, Srikanth Raghunathan
  • Publication number: 20100003522
    Abstract: The present invention includes novel compositions comprising a metal, metal oxide, or metal hydroxide powders with bonded coupling agent and polymer coatings. The invention also includes a method of making a metal, metal oxide or metal hydroxide filler composition by dry coating powders with an polymerizable monomers using a coupling agent, preferably an trialkoxysilane, as a covalent linker between the filler and the monomer coating, and inducing polymerization to provide polymer coated particles of the powders.
    Type: Application
    Filed: May 20, 2008
    Publication date: January 7, 2010
    Inventors: Qiping Zhong, Srikanth Raghunathan
  • Patent number: 7249723
    Abstract: The invention provides high surface area talc compositions by a novel hybrid milling method or soaking method. The hybrid milling method comprises dry milling talc powder followed by mixing with water and wet milling to provide a nano-talc slurry with high surface area, also of the invention. The soaking method comprises dry milling talc powder followed by mixing with water and soaking to provide high surface area nano-talc slurry. The slurry may be dewatered and dried to provide dry nano-talc powder. The nano-talc powder provided by the invention is a novel hydrophilic talc composition. Further embodiments of the invention include organic solvent dispersed nano-talc slurries and methods for providing the same. These slurries can be used to provide polymer nano-talc composites in the form of coatings, sealing and gasketing materials, foams, extruded thermoplastic and thermoset sheets and films, thermoplastic pellets, thermoplastic and thermoset molded polymer composite articles.
    Type: Grant
    Filed: December 21, 2004
    Date of Patent: July 31, 2007
    Assignee: NGX, Inc.
    Inventors: Jianhong He, Qiping Zhong, Srikanth Raghunathan
  • Publication number: 20060086837
    Abstract: The invention provides high surface area talc compositions by a novel hybrid milling method or soaking method. The hybrid milling method comprises dry milling talc powder followed by mixing with water and wet milling to provide a nano-talc slurry with high surface area, also of the invention. The soaking method comprises dry milling talc powder followed by mixing with water and soaking to provide high surface area nano-talc slurry. The slurry may be dewatered and dried to provide dry nano-talc powder. The nano-talc powder provided by the invention is a novel hydrophilic talc composition. Further embodiments of the invention include organic solvent dispersed nano-talc slurries and methods for providing the same. These slurries can be used to provide polymer nano-talc composites in the form of coatings, sealing and gasketing materials, foams, extruded thermoplastic and thermoset sheets and films, thermoplastic pellets, thermoplastic and thermoset molded polymer composite articles.
    Type: Application
    Filed: December 21, 2004
    Publication date: April 27, 2006
    Inventors: Jianhong He, Qiping Zhong
  • Publication number: 20060040102
    Abstract: In one embodiment the invention is a hydrophobic nano-talc composition that is the reaction product of nano-talc with an ammonium, pyridinium or phosponium salt. The composition is characterized by a carbon content of about 5 to about 25 wt %. The compositions are useful in preparing nano-talc/polymer composites. In another embodiment, the invention is a process for preparing a nano-talc composition of the invention.
    Type: Application
    Filed: August 18, 2004
    Publication date: February 23, 2006
    Inventors: Mei Li, Qiping Zhong
  • Publication number: 20060011103
    Abstract: The present invention is method of making a metal, metal oxide, or metal hydroxide filler composition by dry coating powders with an polymerizable monomers using a coupling agent, preferably an trialkoxysilane, as a covalent linker between the filler and the monomer coating, and inducing polymerization to provide polymer coated particles of the powders. The invention also includes novel compositions comprising metal, metal oxide and hydroxide powders with bonded coupling agent and polymer coatings.
    Type: Application
    Filed: July 1, 2004
    Publication date: January 19, 2006
    Inventor: Qiping Zhong
  • Publication number: 20060014880
    Abstract: The invention describes a novel polymer composite comprising nano-talc characterized by an isoelectric point of about 2.5 to about 3.5, a specific surface area greater than about 70 m2/g, and surface hydroxy groups with corresponding hydroxy equivalent weight of about 210 to about 560; and a polymer phase. Specific composites include polyurethane composites prepared from aqueous nano-talc slurries and aqueous dispersible isocyanate terminated polyurethane prepolymers. The invention further embodies a polyurethane composite composition that is a primer coat, base coat or clear top coat for automobiles and metal articles.
    Type: Application
    Filed: April 11, 2005
    Publication date: January 19, 2006
    Inventors: Qiping Zhong, Mei Li, Ramanujan Srinivasa, Jianhong He