Patents by Inventor Qiqing Christine Ouyang

Qiqing Christine Ouyang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11514314
    Abstract: An approach for altering alter training data and training process associated with a neural network to emulate environmental noise and operational instrument error by using the concepts of shots to sample within a squeezed space model, wherein shots are an uncertainty index that is the average of all shots from a sampling, is disclosed. The approach leverages a squeeze theorem to create a squeezed space model based on the regression of the upper and lower bound associated with the environmental noise and instrument error. The approach calculates an average noise index based on the squeezed space model, wherein the index is used to alter the training data and process.
    Type: Grant
    Filed: November 25, 2019
    Date of Patent: November 29, 2022
    Assignee: International Business Machines Corporation
    Inventors: Aaron K. Baughman, Gary William Reiss, Shikhar Kwatra, Qiqing Christine Ouyang
  • Patent number: 11493901
    Abstract: An approach alerting users based on a detected defect during manufacturing quality inspection based on graphical images is disclosed. The approach initiates a device inspection, wherein a model controller collects metadata about a product to be inspected and select a first model with a highest score to identify defects in the device. The approach utilizes an API to obtain results from the inspection and after determining that another model is available, initiating the second model run via an edge device performing the inspection of the device. And the algorithm awaits a response in detecting a defect during either the first model run or the second model run, providing an alert detailing the defect detected in the device.
    Type: Grant
    Filed: September 24, 2020
    Date of Patent: November 8, 2022
    Assignee: International Business Machines Corporation
    Inventors: Qiqing Christine Ouyang, Igor Khapov
  • Publication number: 20220091576
    Abstract: An approach alerting users based on a detected defect during manufacturing quality inspection based on graphical images is disclosed. The approach initiates a device inspection, wherein a model controller collects metadata about a product to be inspected and select a first model with a highest score to identify defects in the device. The approach utilizes an API to obtain results from the inspection and after determining that another model is available, initiating the second model run via an edge device performing the inspection of the device. And the algorithm awaits a response in detecting a defect during either the first model run or the second model run, providing an alert detailing the defect detected in the device.
    Type: Application
    Filed: September 24, 2020
    Publication date: March 24, 2022
    Inventors: Qiqing Christine Ouyang, Igor Khapov
  • Patent number: 11188317
    Abstract: A method, a computer system, and a computer program product for parallel conversion is provided. Embodiments of the present invention may include analyzing raw classical code using a code embedded deep learning model. Embodiments of the present invention may include analyzing running classical code using a deep learning model. Embodiments of the present invention may include marking a location of the raw classical code for a first quantum conversion. Embodiments of the present invention may include suggesting a memory size of the running classical code for a second quantum conversion. Embodiments of the present invention may include aggregating the raw classical code for the first quantum conversion. Embodiments of the present invention may include aggregating the running classical code for the second quantum conversion.
    Type: Grant
    Filed: March 10, 2020
    Date of Patent: November 30, 2021
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Aaron K. Baughman, Gary William Reiss, Qiqing Christine Ouyang, Shikhar Kwatra
  • Publication number: 20210286603
    Abstract: A method, a computer system, and a computer program product for parallel conversion is provided. Embodiments of the present invention may include analyzing raw classical code using a code embedded deep learning model. Embodiments of the present invention may include analyzing running classical code using a deep learning model. Embodiments of the present invention may include marking a location of the raw classical code for a first quantum conversion. Embodiments of the present invention may include suggesting a memory size of the running classical code for a second quantum conversion. Embodiments of the present invention may include aggregating the raw classical code for the first quantum conversion. Embodiments of the present invention may include aggregating the running classical code for the second quantum conversion.
    Type: Application
    Filed: March 10, 2020
    Publication date: September 16, 2021
    Inventors: Aaron K. Baughman, Gary William Reiss, Qiqing Christine Ouyang, Shikhar Kwatra
  • Publication number: 20210158143
    Abstract: An approach for altering alter training data and training process associated with a neural network to emulate environmental noise and operational instrument error by using the concepts of shots to sample within a squeezed space model, wherein shots are an uncertainty index that is the average of all shots from a sampling, is disclosed. The approach leverages a squeeze theorem to create a squeezed space model based on the regression of the upper and lower bound associated with the environmental noise and instrument error. The approach calculates an average noise index based on the squeezed space model, wherein the index is used to alter the training data and process.
    Type: Application
    Filed: November 25, 2019
    Publication date: May 27, 2021
    Inventors: Aaron K. Baughman, Gary William Reiss, Shikhar Kwatra, Qiqing Christine Ouyang
  • Publication number: 20170351833
    Abstract: Individual health vulnerability is assessed by obtaining health risk prevalence level data containing health risk prevalence levels for one or more health risks over a given geographical area. The health risk prevalence level data to generate for each health risk a prevalence level forecast as a function of time and location. A health risk prevalence level map is generated for the given geographical area illustrating current and future health risk prevalence levels for each health risk at a plurality of locations within the given geographical area. Personal health status data are obtained for a given individual along with a proposed travel itinerary f covering at least a portion of the geographical area over a given time duration. The personal health status data, travel itinerary and map generate a personal health risk vulnerability model containing a quantification of vulnerability to the one or more health risks resulting from the travel itinerary.
    Type: Application
    Filed: June 2, 2016
    Publication date: December 7, 2017
    Inventors: Amos CAHAN, Hung-yang CHANG, Ning LI, Fei LIU, Qiqing Christine OUYANG, Yajuan WANG
  • Publication number: 20170351832
    Abstract: Individual health vulnerability is assessed by obtaining health risk prevalence level data containing health risk prevalence levels for one or more health risks over a given geographical area. The health risk prevalence level data to generate for each health risk a prevalence level forecast as a function of time and location. A health risk prevalence level map is generated for the given geographical area illustrating current and future health risk prevalence levels for each health risk at a plurality of locations within the given geographical area. Personal health status data are obtained for a given individual along with a proposed travel itinerary f covering at least a portion of the geographical area over a given time duration. The personal health status data, travel itinerary and map generate a personal health risk vulnerability model containing a quantification of vulnerability to the one or more health risks resulting from the travel itinerary.
    Type: Application
    Filed: June 1, 2016
    Publication date: December 7, 2017
    Inventors: Amos CAHAN, Hung-yang CHANG, Ning LI, Fei LIU, Qiqing Christine OUYANG, Yajuan WANG
  • Publication number: 20170351831
    Abstract: Individual health vulnerability is assessed by obtaining health risk prevalence level data containing health risk prevalence levels for one or more health risks over a given geographical area. The health risk prevalence level data to generate for each health risk a prevalence level forecast as a function of time and location. A health risk prevalence level map is generated for the given geographical area illustrating current and future health risk prevalence levels for each health risk at a plurality of locations within the given geographical area. Personal health status data are obtained for a given individual along with a proposed travel itinerary f covering at least a portion of the geographical area over a given time duration. The personal health status data, travel itinerary and map generate a personal health risk vulnerability model containing a quantification of vulnerability to the one or more health risks resulting from the travel itinerary.
    Type: Application
    Filed: June 1, 2016
    Publication date: December 7, 2017
    Inventors: Amos CAHAN, Hung-yang CHANG, Ning LI, Fei LIU, Qiqing Christine OUYANG, Yajuan WANG
  • Publication number: 20170351834
    Abstract: Individual health vulnerability is assessed by obtaining health risk prevalence level data containing health risk prevalence levels for one or more health risks over a given geographical area. The health risk prevalence level data to generate for each health risk a prevalence level forecast as a function of time and location. A health risk prevalence level map is generated for the given geographical area illustrating current and future health risk prevalence levels for each health risk at a plurality of locations within the given geographical area. Personal health status data are obtained for a given individual along with a proposed travel itinerary f covering at least a portion of the geographical area over a given time duration. The personal health status data, travel itinerary and map generate a personal health risk vulnerability model containing a quantification of vulnerability to the one or more health risks resulting from the travel itinerary.
    Type: Application
    Filed: June 2, 2016
    Publication date: December 7, 2017
    Inventors: Amos CAHAN, Hung-yang CHANG, Ning LI, Fei LIU, Qiqing Christine OUYANG, Yajuan WANG
  • Publication number: 20120092771
    Abstract: An embedded vertical optical grating, a semiconductor device including the embedded vertical optical grating and a method for forming the same. The method for forming the embedded optical grating within a substrate includes depositing a hard mask layer on the substrate, patterning at least one opening within the hard mask layer, vertically etching a plurality of scallops within the substrate corresponding to the at least one opening within the hard mask layer, removing the hard mask layer, and forming an oxide layer within the plurality of scallops to form the embedded vertical optical grating.
    Type: Application
    Filed: October 18, 2010
    Publication date: April 19, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Fei Liu, Qiqing (Christine) Ouyang, Keith Kwong Hon Wong
  • Patent number: 7902012
    Abstract: A method for forming and the structure of a strained lateral channel of a field effect transistor, a field effect transistor and CMOS circuitry is described incorporating a drain, body and source region on a single crystal semiconductor substrate wherein a hetero-junction is formed between the source and body of the transistor, wherein the source region and channel are independently lattice strained with respect the body region. The invention reduces the problem of leakage current from the source region via the hetero junction and lattice strain while independently permitting lattice strain in the channel region for increased mobility via choice of the semiconductor materials and alloy composition.
    Type: Grant
    Filed: August 3, 2009
    Date of Patent: March 8, 2011
    Assignee: International Business Machines Corporation
    Inventors: Qiqing Christine Ouyang, Jack Oon Chu
  • Patent number: 7872303
    Abstract: At least one gate dielectric, a gate electrode, and a gate cap dielectric are formed over at least one channel region of at least one semiconductor fin. A gate spacer is formed on the sidewalls of the gate electrode, exposing end portions of the fin on both sides of the gate electrode. The exposed portions of the semiconductor fin are vertically and laterally etched, thereby reducing the height and width of the at least one semiconductor fin in the end portions. Exposed portions of the insulator layer may also be recessed. A lattice-mismatched semiconductor material is grown on the remaining end portions of the at least one semiconductor fin by selective epitaxy with epitaxial registry with the at least one semiconductor fin. The lattice-mismatched material applies longitudinal stress along the channel of the finFET formed on the at least one semiconductor fin.
    Type: Grant
    Filed: August 14, 2008
    Date of Patent: January 18, 2011
    Assignee: International Business Machines Corporation
    Inventors: Kevin K. Chan, Qiqing Christine Ouyang, Dae-Gyu Park, Xinhui Wang
  • Publication number: 20100159658
    Abstract: A method for forming and the structure of a strained lateral channel of a field effect transistor, a field effect transistor and CMOS circuitry is described incorporating a drain, body and source region on a single crystal semiconductor substrate wherein a hetero-junction is formed between the source and body of the transistor, wherein the source region and channel are independently lattice strained with respect the body region. The invention reduces the problem of leakage current from the source region via the hetero junction and lattice strain while independently permitting lattice strain in the channel region for increased mobility via choice of the semiconductor materials and alloy composition.
    Type: Application
    Filed: August 3, 2009
    Publication date: June 24, 2010
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Qiqing Christine Ouyang, Jack Oon Chu
  • Patent number: 7679121
    Abstract: A method for forming and the structure of a strained vertical channel of a field effect transistor, a field effect transistor and CMOS circuitry is described incorporating a drain, body and source region on a sidewall of a vertical single crystal semiconductor structure wherein a hetero-junction is formed between the source and body of the transistor, wherein the source region and channel are independently lattice strained with respect to the body region and wherein the drain region contains a carbon doped region to prevent the diffusion of dopants (boron) into the body. The invention reduces the problem of leakage current from the source region via the hetero-junction and lattice strain while independently permitting lattice strain in the channel region for increased mobility via choice of the semiconductor materials.
    Type: Grant
    Filed: May 2, 2008
    Date of Patent: March 16, 2010
    Assignee: International Business Machines Corporation
    Inventors: Qiqing Christine Ouyang, Jack Oon Chu
  • Publication number: 20100038679
    Abstract: At least one gate dielectric, a gate electrode, and a gate cap dielectric are formed over at least one channel region of at least one semiconductor fin. A gate spacer is formed on the sidewalls of the gate electrode, exposing end portions of the fin on both sides of the gate electrode. The exposed portions of the semiconductor fin are vertically and laterally etched, thereby reducing the height and width of the at least one semiconductor fin in the end portions. Exposed portions of the insulator layer may also be recessed. A lattice-mismatched semiconductor material is grown on the remaining end portions of the at least one semiconductor fin by selective epitaxy with epitaxial registry with the at least one semiconductor fin. The lattice-mismatched material applies longitudinal stress along the channel of the finFET formed on the at least one semiconductor fin.
    Type: Application
    Filed: August 14, 2008
    Publication date: February 18, 2010
    Applicant: International Business Machines Corporation
    Inventors: KEVIN K. CHAN, Qiqing (Christine) Ouyang, Dae-Gyu Park, Xinhui Wang
  • Patent number: 7569442
    Abstract: A method for forming and the structure of a strained lateral channel of a field effect transistor, a field effect transistor and CMOS circuitry is described incorporating a drain, body and source region on a single crystal semiconductor substrate wherein a hetero-junction is formed between the source and body of the transistor, wherein the source region and channel are independently lattice strained with respect the body region. The invention reduces the problem of leakage current from the source region via the hetero-junction and lattice strain while independently permitting lattice strain in the channel region for increased mobility via choice of the semiconductor materials and alloy composition.
    Type: Grant
    Filed: June 22, 2005
    Date of Patent: August 4, 2009
    Assignee: International Business Machines Corporation
    Inventors: Qiqing Christine Ouyang, Jack Oon Chu
  • Patent number: 7525161
    Abstract: NMOS and PMOS device structures with separately strained channel regions and methods of their fabrication are disclosed. The source and the drain of the NMOS device is epitaxially grown of a material which causes a shift in the strain of the NMOS device channel in the tensile direction. While, the source and the drain of the PMOS device is epitaxially grown of a material which causes a shift in the strain of the PMOS device channel in the compressive direction.
    Type: Grant
    Filed: January 31, 2007
    Date of Patent: April 28, 2009
    Assignee: International Business Machines Corporation
    Inventors: Meikei Ieong, Xiao Hu Liu, Qiqing Christine Ouyang, Siddhartha Panda, Haizhou Yin
  • Patent number: 7453113
    Abstract: A method for forming and the structure of a strained vertical channel of a field effect transistor, a field effect transistor and CMOS circuitry is described incorporating a drain, body and source region on a sidewall of a vertical single crystal semiconductor structure wherein a hetero-junction is formed between the source and body of the transistor, wherein the source region and channel are independently lattice strained with respect to the body region and wherein the drain region contains a carbon doped region to prevent the diffusion of dopants (boron) into the body. The invention reduces the problem of leakage current from the source region via the hetero-junction and lattice strain while independently permitting lattice strain in the channel region for increased mobility via choice of the semiconductor materials.
    Type: Grant
    Filed: April 16, 2007
    Date of Patent: November 18, 2008
    Assignee: International Business Machines Corporation
    Inventors: Qiqing Christine Ouyang, Jack Oon Chu
  • Publication number: 20080237637
    Abstract: A method for forming and the structure of a strained vertical channel of a field effect transistor, a field effect transistor and CMOS circuitry is described incorporating a drain, body and source region on a sidewall of a vertical single crystal semiconductor structure wherein a hetero-junction is formed between the source and body of the transistor, wherein the source region and channel are independently lattice strained with respect to the body region and wherein the drain region contains a carbon doped region to prevent the diffusion of dopants (boron) into the body. The invention reduces the problem of leakage current from the source region via the hetero-junction and lattice strain while independently permitting lattice strain in the channel region for increased mobility via choice of the semiconductor materials.
    Type: Application
    Filed: May 2, 2008
    Publication date: October 2, 2008
    Applicant: International Business Machines Corporation
    Inventors: Qiqing Christine Ouyang, Jack Oon Chu