Patents by Inventor Qirong ZHANG

Qirong ZHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems and methods for etching a substrate
    Patent number: 11581161
    Abstract: A method of processing a workpiece may include forming a first layer on a first side of a base layer. The base layer may be part of a substrate including a plurality of layers. The method may also include forming a second layer on the first layer. A material of the second layer may include metal. The method may also include forming an opening in the second layer, forming an opening in the first layer by etching, and removing the second layer. The method may include dry etching of the first layer.
    Type: Grant
    Filed: December 26, 2019
    Date of Patent: February 14, 2023
    Assignee: ASML Netherlands, B.V.
    Inventors: Jie Fang, Yixiang Wang, Qirong Zhang, Haojie Zhang, Jinmei Yang, Fenghui Zhu
  • SYSTEMS AND METHODS FOR ETCHING A SUBSTRATE
    Publication number: 20200211817
    Abstract: A method of processing a workpiece may include forming a first layer on a first side of a base layer. The base layer may be part of a substrate including a plurality of layers. The method may also include forming a second layer on the first layer. A material of the second layer may include metal. The method may also include forming an opening in the second layer, forming an opening in the first layer by etching, and removing the second layer. The method may include dry etching of the first layer.
    Type: Application
    Filed: December 26, 2019
    Publication date: July 2, 2020
    Inventors: Jie FANG, Yixiang WANG, Qirong ZHANG, Haojie ZHANG, Jinmei YANG, Fenghui ZHU