Abstract: A device for gas purification treatment may include: a light oxidation reactor, a light source being disposed in the light oxidation reactor, the light source being configured to emit first light and second light, the light oxidation reactor being configured to perform a first-stage purification treatment on a gas under irradiation of the first light; a catalytic ozone oxidation reactor configured for second-stage purification treatment of the gas; a photocatalytic reactor configured to perform a third-stage purification treatment on the gas under irradiation of the second light; wherein, the photocatalytic reactor is adjacent to the light oxide reactor, and the photocatalytic reactor and the light oxide reactor are separated by a light transmittance component, so that the second light passes through the light transmittance component into the photocatalytic reactor.