Patents by Inventor Quanfeng LIU

Quanfeng LIU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11247913
    Abstract: Provided is a method for producing calcium zincate. The method comprises: an extraction step: mixing a ground zinc-containing raw material with an extracting agent, followed by filtration to obtain an extract, wherein the extracting agent is a mixed aqueous solution of ammonia and {NH4HCO3 and/or (NH4)2CO3; optionally, purifying the extract; a decarburization step: adding calcium oxide and/or calcium hydroxide to the extract, stirring, and filtering to obtain a first solid and a first filtrate; a calcium zincate synthesis step: adding calcium hydroxide and/or calcium oxide to the first filtrate, stirring to react, and filtering to obtain a second solid and a second filtrate; optionally, rinsing the second solid with water; a drying step: drying the second solid to obtain the final calcium zincate product.
    Type: Grant
    Filed: January 11, 2021
    Date of Patent: February 15, 2022
    Assignee: CHONGQING DONGQUN TECHNOLOGY CO., LTD.
    Inventors: Huiwei Yue, Shichuan Li, Zhongxiang Long, Tao Jiang, Quanfeng Liu
  • Publication number: 20210130184
    Abstract: Provided is a method for producing calcium zincate. The method comprises: an extraction step: mixing a ground zinc-containing raw material with an extracting agent, followed by filtration to obtain an extract, wherein the extracting agent is a mixed aqueous solution of ammonia and {NH4HCO3 and/or (NH4)2CO3; optionally, purifying the extract; a decarburization step: adding calcium oxide and/or calcium hydroxide to the extract, stirring, and filtering to obtain a first solid and a first filtrate; a calcium zincate synthesis step: adding calcium hydroxide and/or calcium oxide to the first filtrate, stirring to react, and filtering to obtain a second solid and a second filtrate; optionally, rinsing the second solid with water; a drying step: drying the second solid to obtain the final calcium zincate product.
    Type: Application
    Filed: January 11, 2021
    Publication date: May 6, 2021
    Inventors: Huiwei Yue, Shichuan Li, Zhongxiang Long, Tao Jiang, Quanfeng Liu
  • Patent number: 9467130
    Abstract: A delay line circuit is provided and includes a fine delay unit and coarse delay units. Each fine delay circuit includes a first PMOS transistor; a first NMOS transistor; second PMOS transistors whose widths of gate features of the second PMOS transistor are equal; at least one third PMOS transistor, coupled between the power voltage and the source of the first PMOS transistor, whose width of gate features is smaller than the widths of the gate features of the second PMOS transistors, second NMOS transistors whose widths of gate features of the second NMOS transistors are equal; and at least one third NMOS transistor, coupled between the ground voltage and the source of the first NMOS transistor, whose width of gate features is smaller than the widths of the gate features of the second NMOS transistors.
    Type: Grant
    Filed: December 31, 2014
    Date of Patent: October 11, 2016
    Assignee: VIA ALLIANCE SEMICONDUCTOR CO., LTD.
    Inventors: Quanfeng Liu, Huijie Duan
  • Patent number: 9432012
    Abstract: A delay line circuit is provided and includes a fine delay unit and coarse delay units. Each fine delay circuit includes a first PMOS transistor; a first NMOS transistor; second PMOS transistors whose widths of gate features of the second PMOS transistor are equal; at least one third PMOS transistor, coupled between the power voltage and the source of the first PMOS transistor, whose width of gate features is smaller than the widths of the gate features of the second PMOS transistors, second NMOS transistors whose widths of gate features of the second NMOS transistors are equal; and at least one third NMOS transistor, coupled between the ground voltage and the source of the first NMOS transistor, whose width of gate features is smaller than the widths of the gate features of the second NMOS transistors.
    Type: Grant
    Filed: January 28, 2015
    Date of Patent: August 30, 2016
    Assignee: VIA ALLIANCE SEMICONDUCTOR CO., LTD.
    Inventors: Quanfeng Liu, Huijie Duan
  • Publication number: 20150349766
    Abstract: A delay line circuit is provided and includes a fine delay unit and coarse delay units. Each fine delay circuit includes a first PMOS transistor; a first NMOS transistor; second PMOS transistors whose widths of gate features of the second PMOS transistor are equal; at least one third PMOS transistor, coupled between the power voltage and the source of the first PMOS transistor, whose width of gate features is smaller than the widths of the gate features of the second PMOS transistors, second NMOS transistors whose widths of gate features of the second NMOS transistors are equal; and at least one third NMOS transistor, coupled between the ground voltage and the source of the first NMOS transistor, whose width of gate features is smaller than the widths of the gate features of the second NMOS transistors.
    Type: Application
    Filed: January 28, 2015
    Publication date: December 3, 2015
    Inventors: Quanfeng LIU, Huijie DUAN
  • Publication number: 20150349765
    Abstract: A delay line circuit is provided and includes a fine delay unit and coarse delay units. Each fine delay circuit includes a first PMOS transistor; a first NMOS transistor; second PMOS transistors whose widths of gate features of the second PMOS transistor are equal; at least one third PMOS transistor, coupled between the power voltage and the source of the first PMOS transistor, whose width of gate features is smaller than the widths of the gate features of the second PMOS transistors, second NMOS transistors whose widths of gate features of the second NMOS transistors are equal; and at least one third NMOS transistor, coupled between the ground voltage and the source of the first NMOS transistor, whose width of gate features is smaller than the widths of the gate features of the second NMOS transistors.
    Type: Application
    Filed: December 31, 2014
    Publication date: December 3, 2015
    Inventors: Quanfeng LIU, Huijie DUAN