Patents by Inventor Quanyong Guo

Quanyong Guo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for controlling heating of base within chemical vapour deposition chamber
    Patent number: 10281215
    Abstract: Provided are an apparatus and a method for controlling the heating of the base within a chemical vapour deposition chamber, which apparatus is applicable to an MOCVD reaction chamber.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: May 7, 2019
    Assignee: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
    Inventors: Baoxia Tian, Steven Tianxiao Lee, Yingbin Liu, Quanyong Guo
  • APPARATUS AND METHOD FOR CONTROLLING HEATING OF BASE WITHIN CHEMICAL VAPOUR DEPOSITION CHAMBER
    Publication number: 20180112919
    Abstract: Provided are an apparatus and a method for controlling the heating of the base within a chemical vapour deposition chamber, which apparatus is applicable to an MOCVD reaction chamber.
    Type: Application
    Filed: December 21, 2017
    Publication date: April 26, 2018
    Inventors: Baoxia Tian, Steven Tianxiao Lee, Yingbin Liu, Quanyong Guo
  • Apparatus and method for controlling heating of base within chemical vapour deposition chamber
    Patent number: 9851151
    Abstract: Provided are an apparatus and a method for controlling the heating of the base within a chemical vapour deposition chamber, which apparatus is applicable to an MOCVD reaction chamber.
    Type: Grant
    Filed: March 21, 2013
    Date of Patent: December 26, 2017
    Assignee: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
    Inventors: Baoxia Tian, Steven Tianxiao Lee, Yingbin Liu, Quanyong Guo
  • APPARATUS AND METHOD FOR CONTROLLING HEATING OF BASE WITHIN CHEMICAL VAPOUR DEPOSITION CHAMBER
    Publication number: 20150024330
    Abstract: Provided are an apparatus and a method for controlling the heating of the base within a chemical vapour deposition chamber, which apparatus is applicable to an MOCVD reaction chamber.
    Type: Application
    Filed: March 21, 2013
    Publication date: January 22, 2015
    Applicant: Advanced Mirco-Fabrication Equipment Inc, Shanghai
    Inventors: Baoxia Tian, Steven Tianxiao Lee, Yingbin Liu, Quanyong Guo