Patents by Inventor Quentin Chen

Quentin Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of optical correction for improving the pattern shrinkage caused by scattering of the light
    Patent number: 6215546
    Abstract: The present invention discloses a method of optical correction for improving the pattern shrinkage caused by scattering of the light during photolithography processes, wherein the patterns on photomasks are corrected by providing aid patterns. Therefore, serifs or hammerheads are not necessary, and the costs can be decreased. According to the present invention, a chrome aid block is provided between the edges of the patterns. It is noted that the size of the chrome aid block is between ⅓ to ½ the wavelength of light used during exposure. Therefore, the pattern shrinkage caused by scattering of the light during exposure can be reduced, and there is no additional block formed on the photoresist layer. In addition, the standing wave effect can be prevented; thus, the pattern transfer is more accurate.
    Type: Grant
    Filed: April 3, 2000
    Date of Patent: April 10, 2001
    Assignee: Nanya Technology Corporation
    Inventors: Ronfu Chu, Quentin Chen, Chungwei Hsu, Jengping Lin