Abstract: The present description concerns a method of manufacturing a vapor chamber (300) comprising the following steps: (a) etching, in a first substrate (301), at least one first cavity (303) and at least one channel (313) extending from an upper surface (305) of said first substrate (301), a first end (315) of said channel (313) emerging into said at least one cavity (303); (b) bonding a lower surface of a plate (309) to the upper surface (305) of said first substrate (301), the plate (309) comprising at least one first region made of a ductile material (321) arranged in front of said first end (315) of said channel (313); (c) filling said channel (313) with a cooling fluid (319); and (d) closing said cavity (303) by applying a pressure on said region of ductile material of the plate (309) to obstruct said first end (315) of said channel (313).