Patents by Inventor Qun MA

Qun MA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160276629
    Abstract: An organic light-emitting diode (OLED) display device and an OLED display apparatus using the same are disclosed. The OLED display device includes a plurality of pixels (16) arranged in an array on a substrate (11), a side surface of a light-emitting layer (13) of the pixels (16) being covered with a first insulating structure (14) having a refractive index less than that of the light-emitting layer (13). The OLED display device has a high light extracting rate.
    Type: Application
    Filed: October 16, 2014
    Publication date: September 22, 2016
    Applicants: Boe Technology Group Co., Ltd., Ordos Yuansheng Optoelectronics Co., Ltd.
    Inventors: Qun MA, You Tae WON, Haidong WU
  • Publication number: 20160254477
    Abstract: An organic electroluminescent device and a preparation method thereof, and a display device are provided. The organic electroluminescent device comprises a substrate (1), a first electrode (2) formed on the substrate (1), a light-emitting layer (3) formed on one side of the first electrode (2) away from the substrate (1), and a second electrode (4) formed on one side of the light-emitting layer (3) away from the first electrode (2), and only a portion of a projection of the light-emitting layer (3) on the substrate (1) is positioned at an overlapping portion of projections of the first electrode (2) and the second electrode (4) on the substrate (1). The organic electroluminescent device can facilitate realizing a high resolution design of a display screen.
    Type: Application
    Filed: October 16, 2014
    Publication date: September 1, 2016
    Inventors: Qun MA, You Tae WON, Haidong WU
  • Publication number: 20160254498
    Abstract: A method for repairing an organic light-emitting diode (OLED) display device includes: determining the position of foreign particle (13) in a lamination structure (12); removing the foreign particle (13) and layers over the foreign particle (13) and in a recess region to be formed, so as to form a recess (21) in the lamination structure (12), in which an opening of the recess (21) is towards the external environment; and forming a repair structure (31) in the recess (21), in which the refractive index of the repair structure (31) is less than that of the lamination structure (12). The method overcomes the black spot defect caused by the foreign particle, improves the product yield and avoids the waste of cost.
    Type: Application
    Filed: December 3, 2014
    Publication date: September 1, 2016
    Applicants: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Qun MA, Chon Kyu MIN, Haidong WU
  • Publication number: 20160216099
    Abstract: The present disclosure provides a measurement apparatus and a film-coating device.
    Type: Application
    Filed: September 1, 2014
    Publication date: July 28, 2016
    Applicants: BOE TECHNOLOGY GROUP CO., LTD., ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
    Inventors: Haidong WU, Qun MA
  • Patent number: 9349922
    Abstract: Embodiments of the disclosure provide a mask, a mask group, a manufacturing method of pixels and a pixel structure. The mask includes a shielding region and an opening region which are alternately arranged. A width of the opening region is twice of a width of one sub pixel, and a width of the shielding region between two adjacent opening regions is four times of the width of one sub pixel.
    Type: Grant
    Filed: December 29, 2014
    Date of Patent: May 24, 2016
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
    Inventors: Haidong Wu, Tae Gyu Kim, Qun Ma, Juanjuan Bai
  • Publication number: 20160056342
    Abstract: Embodiments of the disclosure provide a mask, a mask group, a manufacturing method of pixels and a pixel structure. The mask includes a shielding region and an opening region which are alternately arranged. A width of the opening region is twice of a width of one sub pixel, and a width of the shielding region between two adjacent opening regions is four times of the width of one sub pixel.
    Type: Application
    Filed: December 29, 2014
    Publication date: February 25, 2016
    Inventors: Haidong Wu, Tae Gyu Kim, Qun Ma, Juanjuan Bai
  • Publication number: 20150259779
    Abstract: An embodiment of the present invention discloses a mask. The mask comprises: a first surface; a second surface opposite to the first surface; at least one opening structure disposed onto the mask, wherein a pattern of the opening structure on the first surface partly overlaps with a pattern of the opening structure on the second surface in a direction perpendicular to the first surface or the second surface, wherein the overlapping area is a through hole. Furthermore, another embodiment of the present invention also discloses a method for manufacturing such mask.
    Type: Application
    Filed: June 26, 2014
    Publication date: September 17, 2015
    Inventors: Qun Ma, Yutai Yuan, Minhui Jia
  • Publication number: 20150255266
    Abstract: The present invention provides an etching device, which comprises a treatment solution tank for containing treatment solution; and a grabbing unit for putting the substrate in the treatment solution tank and moving the treated substrate out of the treatment solution tank. Accordingly, the present invention further provides an etching method for treating a substrate by using the above etching device. The present invention further provides a patterning apparatus comprising the above etching device. According to the present invention, the uniformity of a reaction between the treatment solution and a corresponding material on the substrate can be improved, and damages which may be caused to the pattern by the existing spray mode can be avoided.
    Type: Application
    Filed: July 30, 2014
    Publication date: September 10, 2015
    Inventors: Qun MA, Kunpeng ZHANG, Xiaona LIU, Changjian XU
  • Patent number: 8411383
    Abstract: Various embodiments of the present invention provide systems and methods for signal offset cancellation. For example, a method for error cancellation is disclosed. The method includes: receiving an input signal that includes a second order error component; applying a transfer function to the processed input to reduce the second order error component; and providing an output signal that is the result of applying the transfer function to the input signal.
    Type: Grant
    Filed: December 31, 2009
    Date of Patent: April 2, 2013
    Assignee: LSI Corporation
    Inventors: Zhengxin Cao, Hao Qiong Chen, Shu Dong Cheng, De Qun Ma, Donghui Wang, Yan Xu
  • Publication number: 20110019301
    Abstract: Various embodiments of the present invention provide systems and methods for signal offset cancellation. For example, a method for error cancellation is disclosed. The method includes: receiving an input signal that includes a second order error component; applying a transfer function to the processed input to reduce the second order error component; and providing an output signal that is the result of applying the transfer function to the input signal.
    Type: Application
    Filed: December 31, 2009
    Publication date: January 27, 2011
    Inventors: Zhengxin Cao, Hao Qiong Chen, Shu Dong Cheng, De Qun Ma, Donghui Wang, Yan Xu