Patents by Inventor R. Austin Nowak

R. Austin Nowak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11679412
    Abstract: Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.
    Type: Grant
    Filed: February 24, 2022
    Date of Patent: June 20, 2023
    Assignee: GVD Corporation
    Inventors: W. Shannan O'Shaughnessy, Scott W. Morrison, R. Austin Nowak
  • Publication number: 20220388032
    Abstract: Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.
    Type: Application
    Filed: February 24, 2022
    Publication date: December 8, 2022
    Inventors: W. Shannan O'Shaughnessy, Scott W. Morrison, R. Austin Nowak
  • Patent number: 11393679
    Abstract: Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.
    Type: Grant
    Filed: December 13, 2018
    Date of Patent: July 19, 2022
    Assignee: GVD CORPORATION
    Inventors: W. Shannan O'Shaughnessy, Scott W. Morrison, R. Austin Nowak
  • Publication number: 20190122884
    Abstract: Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.
    Type: Application
    Filed: December 13, 2018
    Publication date: April 25, 2019
    Inventors: W. Shannan O'Shaughnessy, Scott W. Morrison, R. Austin Nowak
  • Publication number: 20170358445
    Abstract: Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.
    Type: Application
    Filed: June 13, 2017
    Publication date: December 14, 2017
    Applicant: GVD Corporation
    Inventors: W. Shannan O'Shaughnessy, Scott W. Morrison, R. Austin Nowak