Abstract: The invention provides an ultrasound imaging system, comprising an array of transducer elements grouped into element groups, wherein the element groups comprise a plurality of first element groups (having a first orientation) and a plurality of second element groups (having a second orientation different from the first orientation). A first conductor is connected to each of the elements in each first element grouping and a second conductor is connected to each of the elements in each second element grouping. Each element group is adapted to be activated for transmission or reception by the application of a bias voltage, by way of a plurality of bias voltage circuits, and controlled by a plurality of transmit and receive circuits. The system is adapted to acquire first ultrasound data, wherein the bias voltage is applied to the first conductors of the array (or a sub-array) and the transducers receive a signal from a transmit and receive circuit.

Abstract: An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.

Abstract: An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.

Abstract: The microelectromechanical system (MEMS) element (101) comprises a first electrode (31) that is present on a surface of substrate (30) and a movable element (40). This overlies at least partially the first electrode (31) and comprises a piezoelectric actuator, which movable element (40) is movable towards and from the substrate (30) by application of an actuation voltage between a first and a second position, in which first position it is separated from the substrate (30) by a gap. Herein the piezoelectric actuator comprises a piezoelectric layer (25) that is on opposite surfaces provided with a second and a third electrode (21,22) respectively, said second electrode (21) facing the substrate (30) and said third electrode (22) forming an input electrode of the MEMS element (101), so that a current path through the MEMS element (101) comprises the piezoelectric layer (25) and the tunable gap.