Patents by Inventor R. Mark Johnson

R. Mark Johnson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Extreme ultraviolet light source
    Publication number: 20100176313
    Abstract: An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.
    Type: Application
    Filed: December 14, 2009
    Publication date: July 15, 2010
    Applicant: Cymer, Inc.
    Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin, Curtis L. Rettiq, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson
  • Extreme ultraviolet light source
    Patent number: 7368741
    Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
    Type: Grant
    Filed: April 14, 2005
    Date of Patent: May 6, 2008
    Assignee: Cymer, Inc.
    Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert R. Bowering, Oleh Khodykin, Curtis L. Rettig, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson
  • Extreme ultraviolet light source
    Patent number: 6972421
    Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
    Type: Grant
    Filed: April 8, 2003
    Date of Patent: December 6, 2005
    Assignee: Cymer, Inc.
    Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin, Curtis L. Rettig, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson
  • Extreme ultraviolet light source
    Publication number: 20040108473
    Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
    Type: Application
    Filed: April 8, 2003
    Publication date: June 10, 2004
    Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin, Curtis L. Rettig, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson