Patents by Inventor R. Y. Lee

R. Y. Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming a shallow trench isolation that has rounded and protected corners
    Patent number: 6033969
    Abstract: A method is provided for forming a shallow trench isolation that has rounded and protected corners by first forming a bird's beak field oxide layer prior to the trench-forming step such that a rounded and protected top corner and a rounded bottom corner of the trench can be formed. The rounded top and bottom corners of the shallow trench opening have a radius of at least 100 .ANG. and a trench depth of not more than 5000 .ANG.. The top corner of the trench opening is protected by the beak portion of the bird's beak against etching in a subsequent oxide dip process before gate formation.
    Type: Grant
    Filed: September 30, 1996
    Date of Patent: March 7, 2000
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chue-San Yoo, R. Y. Lee, J. H. Tsai