Patents by Inventor Radim {hacek over (S)}ejnoha

Radim {hacek over (S)}ejnoha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12057287
    Abstract: The beamlets in a multi-beam microscopy system are aligned based on coefficients of a fitted aberration model. In particular, an illuminator for directing the beamlets towards the sample is adjusted based on the coefficients to correct the aberrations. The coefficients are obtained based on measured beamlets' positions in the sample plane.
    Type: Grant
    Filed: March 30, 2022
    Date of Patent: August 6, 2024
    Inventors: Jan Stopka, Bohuslav Sed'A, Radovan Va{hacek over (s)}ina, Radim {hacek over (S)}ejnoha