Abstract: According to at least one example embodiment, a substrate treating apparatus includes a substrate support structure including a spin head, the substrate support structure configured to support a substrate, and rotate the substrate, at least one treating liquid recovery container configured to recover at least one substrate treating liquid, and a discharging device including a first nozzle and a second nozzle, the first nozzle configured to discharge a chemical onto the substrate, and the second nozzle configured to discharge deionized water onto the substrate, wherein the first nozzle includes a surface pattern configured to provide roughness on an inner surface of the first nozzle.

Abstract: Provided are an ozonated water mixture supply apparatus and method, and a substrate treating facility that receives an ozonated water mixture from the apparatus to treat a substrate. The ozonated water mixture supply apparatus includes a mixing line and distribution lines. The mixing line respectively receives a treating liquid and an ozonated water from a treating liquid supply line and an ozonated water supply line and mixes the treating liquid and the ozonated water to generate the ozonated water mixture satisfying a previously set concentration. Each of the distribution lines distributes the ozonated water mixture generated from the mixing line into a process unit. The mixing line includes a mixing valve and a static mixer. Therefore, the ozonated water mixture having the previously set concentration is generated and supplied using an in-line mixing method without requiring a mixing vessel such as a mixing tank.

Abstract: Provided are a substrate processing apparatus and a method for cleaning the same. In the substrate processing apparatus, a substrate supporting member includes a spin head on which a substrate is mounted, a rotary joint, and a supply pipe for supplying solution. The rotary joint receives a supply of solution from the supply pipe and supplies the solution to the spin head. The spin head has at least one spray hole formed for spraying the solution, and sprays the solution axially while spinning. Accordingly, the substrate supporting member can provide solution to the inner walls of the processing container, to raise cleaning efficiency of the processing container and increase manufacturing yield.