Abstract: A device (10) and a method for analyzing a sample (16) containing fluorophores use a light source (12) emitting light (?ex) onto the sample (16), and onto a fluorescence standard (14). The fluorophores of the sample (16), given an immission of light of a first wavelength (?ex1), have a first excitation efficiency and, given an immission of light of a second wavelength (?ex2), have a second excitation efficiency. The fluorescence standard (14), given the same immissions of light, has a third excitation efficiency and, a fourth excitation efficiency. An optical element (20) which is arranged between the light source (12) and the sample (16) and/or (12) the fluorescence standard (14) adapts, due to its optical property, a first difference between the first excitation efficiency and the second excitation efficiency and a second difference between the third excitation efficiency and the fourth excitation efficiency to each other.

Abstract: A device (10) and a method for analyzing a sample (16) containing fluorophores use a light source (12) emitting light (?ex) onto the sample (16), and onto a fluorescence standard (14). The fluorophores of the sample (16), given an immission of light of a first wavelength (?ex1), have a first excitation efficiency and, given an immission of light of a second wavelength (?ex2), have a second excitation efficiency. The fluorescence standard (14), given the same immissions of light, has a third excitation efficiency and, a fourth excitation efficiency. An optical element (20) which is arranged between the light source (12) and the sample (16) and/or (12) the fluorescence standard (14) adapts, due to its optical property, a first difference between the first excitation efficiency and the second excitation efficiency and a second difference between the third excitation efficiency and the fourth excitation efficiency to each other.

Abstract: A device (10) and a method for analyzing a sample (16) containing fluorophores use a light source (12) emitting light (?ex) onto the sample (16), and onto a fluorescence standard (14). The fluorophores of the sample (16), given an immission of light of a first wavelength (?ex1), have a first excitation efficiency and, given an immission of light of a second wavelength (?ex2), have a second excitation efficiency. The fluorescence standard (14), given the same immissions of light, has a third excitation efficiency and, a fourth excitation efficiency. An optical element (20) which is arranged between the light source (12) and the sample (16) and/or (12) the fluorescence standard (14) adapts, due to its optical property, a first difference between the first excitation efficiency and the second excitation efficiency and a second difference between the third excitation efficiency and the fourth excitation efficiency to each other.

Abstract: An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.

Abstract: The invention concerns methods and apparatuses for quantitatively determining the concentration of fluorophores of a substance in a sample. A constant portion of the reference light of a reference light wave length (?r) emitted by a reference light source is coupled in by an optical element in the direction of a receiving element. A first value corresponding to the portion of the reference light coupled in which is incident on the receiving element is detected. The sample is irradiated with the excitation light of an excitation wave length (?ex) emitted by an excitation light source. A second value corresponding to the portion of the fluorescent light of an emission wave length (?em) emitted by the sample which is incident on the receiving element. The ratio of the second value to the first value is determined. The number of fluorophores in the substance is determined based on the ratio.

Abstract: A device (10) and a method for analyzing a sample (16) containing fluorophores use a light source (12) emitting light (?ex) onto the sample (16), and onto a fluorescence standard (14). The fluorophores of the sample (16), given an immission of light of a first wavelength (?ex1), have a first excitation efficiency and, given an immission of light of a second wavelength (?ex2), have a second excitation efficiency. The fluorescence standard (14), given the same immissions of light, has a third excitation efficiency and, a fourth excitation efficiency. An optical element (20) which is arranged between the light source (12) and the sample (16) and/or (12) the fluorescence standard (14) adapts, due to its optical property, a first difference between the first excitation efficiency and the second excitation efficiency and a second difference between the third excitation efficiency and the fourth excitation efficiency to each other.

Abstract: An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.

Abstract: In a method for determining the concentration of at least one substance in a liquid the liquid is applied onto a test strip containing at least one test zone, wherein an optical sensor arrangement is moved step-by-step in a first direction over the surface of the test strip while the test trip is at the same time irradiated with light of a predetermined wave length and wherein in each step the radiation reflected from the surface of the test strip is measured, and wherein in each measurement step the test strip surface is irradiated alternately with light of at least two different wave lengths and the irradiation is measured at the same time and the difference between the measurement signals obtained in each measurement step using irradiation light of different wave lengths is analyzed.

Abstract: In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface.

Abstract: The invention concerns a method and an apparatus for the quantitative determination of the concentration of fluorophores of at least one substance in a sample. A constant portion of the reference light of a reference light wave length (?r) emitted by a reference light source (28) is coupled in by an optical element (REM) in the direction of a receiving element (38). A first measured value is detected which corresponds to the portion of the reference light coupled in which is incident on the receiving element (38). The sample is irradiated with the excitation light of an excitation wave length (?ex) emitted by an excitation light source (26). A second measured valued is detected which corresponds to the portion of the fluorescent light of an emission wave length (?em) emitted by the sample which is incident on the receiving element (38). The ratio (Emes2/Es2) of the second measured value (Emes2) to the first measured value (Es2) is determined.

Abstract: In a method for determining the concentration of at least one substance in a liquid the liquid is applied onto a test strip containing at least one test zone, wherein an optical sensor arrangement is moved step-by-step in a first direction over the surface of the test strip while the test trip is at the same time irradiated with light of a predetermined wave length and wherein in each step the radiation reflected from the surface of the test strip is measured, and wherein in each measurement step the test strip surface is irradiated alternately with light of at least two different wave lengths and the irradiation is measured at the same time and the difference between the measurement signals obtained in each measurement step using irradiation light of different wave lengths is analyzed.

Abstract: In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface.

Abstract: A beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus includes a first beam reshaping element having a first beam reshaping surface and a second beam reshaping element having a second beam reshaping surface which faces the first beam reshaping surface. The two beam reshaping surfaces are rotationally symmetrical with respect to an optical axis of the beam reshaping unit. At least the first beam reshaping surface has a concavely or convexly curved region.

Abstract: In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface.

Abstract: An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.

Abstract: An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62). The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666?) that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606).

Abstract: In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface.

Abstract: A beam reshaping unit for an illumination system (10) of a microlithographic projection exposure apparatus comprises a first beam reshaping element (62) having a first beam reshaping surface (68) and a second beam reshaping element having a second beam reshaping surface (74) which faces the first beam reshaping surface (68). The two beam reshaping surfaces (68; 74) are rotationally symmetrical with respect to an optical axis (22) of the beam reshaping unit. At least the first beam reshaping surface (68, 74) has a concavely or convexly curved region (70, 76).