Abstract: In a method for solidifying a photopolymerizable, diffusely reflecting material by irradiation, wherein the material coats a transparent material confining element, such as a material support or a tank bottom, and the irradiation of a surface to be solidified is performed through the transparent material confining element into the material, a) the thickness of the material confining element and b) the coated surface and/or the construction field and/or the surface to be solidified of the material are adapted to one another such that the thickness of the material confining element is at least ¼, preferably at least ?, preferably at least ½, of the diameter of the coated surface, or the surface to be solidified, or the construction field, respectively.

Abstract: A method for the layered construction of a shaped body of highly viscous photopolymerizable material, includes forming layers of the shaped body one after the other and one on top of the other by each forming a material layer of predetermined thickness (a) of the highly viscous photopolymerizable material in a tank, lowering a construction platform, or the shaped body at least partially formed on the construction platform, into the material layer so as to cause a layer of the highly viscous photopolymerizable material to form between the construction platform or the shaped body and the tank bottom, curing such layer in a position-selective manner, in particular by irradiation through the tank bottom, to provide the desired shape of the shaped body layer, wherein the thickness (a) of the material layer is varied at least once during the layered construction of the shaped body.

Abstract: A method for the layered construction of a shaped body of highly viscous photopolymerizable material, where layers of said shaped body are formed one after the other and one on top of the other, includes forming a material layer of predetermined thickness (a) of the highly viscous photopolymerizable material in a tank, which has a bottom, and lowering the construction platform, or the shaped body at least partially formed on the construction platform, into the material layer so as to cause a layer of the highly viscous photopolymerizable material to form between the construction platform or shaped body and the tank bottom, which layer is cured in a position-selective manner, in particular by irradiation through the tank bottom, to provide the desired shape of the shaped body layer, in which at least one material layer includes a layer thickness variation in the lateral direction.

Abstract: In a method for solidifying a photopolymerizable, diffusely reflecting material by irradiation, wherein the material coats a transparent material confining element, such as a material support or a tank bottom, and the irradiation of a surface to be solidified is performed through the transparent material confining element into the material, a) the thickness of the material confining element and b) the coated surface and/or the construction field and/or the surface to be solidified of the material are adapted to one another such that the thickness of the material confining element is at least ¼, preferably at least ?, preferably at least ½, of the diameter of the coated surface, or the surface to be solidified, or the construction field, respectively.

Abstract: A method for the layered construction of a shaped body of highly viscous photopolymerizable material, includes forming layers of the shaped body one after the other and one on top of the other by each forming a material layer of predetermined thickness (a) of the highly viscous photopolymerizable material in a tank, lowering a construction platform, or the shaped body at least partially formed on the construction platform, into the material layer so as to cause a layer of the highly viscous photopolymerizable material to form between the construction platform or the shaped body and the tank bottom, curing such layer in a position-selective manner, in particular by irradiation through the tank bottom, to provide the desired shape of the shaped body layer, wherein the thickness (a) of the material layer is varied at least once during the layered construction of the shaped body.

Abstract: A method for the layered construction of a shaped body of highly viscous photopolymerizable material, where layers of said shaped body are formed one after the other and one on top of the other, includes forming a material layer of predetermined thickness (a) of the highly viscous photopolymerizable material in a tank, which has a bottom, and lowering the construction platform, or the shaped body at least partially formed on the construction platform, into the material layer so as to cause a layer of the highly viscous photopolymerizable material to form between the construction platform or shaped body and the tank bottom, which layer is cured in a position-selective manner, in particular by irradiation through the tank bottom, to provide the desired shape of the shaped body layer, in which at least one material layer includes a layer thickness variation in the lateral direction.

Abstract: An exposure pattern is computed which is used for exposing a desired pattern on a target by means of a particle beam and a blanking aperture array in a particle-optical lithography apparatus, taking into account a non-uniform current dose distribution as generated by the beam over the positions of the apertures of the blanking aperture array: From the desired pattern a nominal exposure pattern is calculated as a raster graphics comprising nominal dose values for the pixels of the raster graphics; based on a map of the current dose distribution, which correlates each aperture with a current factor describing the current dose of the beam at the location of the aperture, a compensated dose value is calculated for each pixel; and for each pixel, a discrete value is determined by selecting a value from a discrete gray scale so as to approximate the compensated dose value.

Abstract: An exposure pattern is computed which is used for exposing a desired pattern on a target by means of a particle beam and a blanking aperture array in a particle-optical lithography apparatus, taking into account a non-uniform current dose distribution as generated by the beam over the positions of the apertures of the blanking aperture array: From the desired pattern a nominal exposure pattern is calculated as a raster graphics comprising nominal dose values for the pixels of the raster graphics; based on a map of the current dose distribution, which correlates each aperture with a current factor describing the current dose of the beam at the location of the aperture, a compensated dose value is calculated for each pixel; and for each pixel, a discrete value is determined by selecting a value from a discrete gray scale so as to approximate the compensated dose value.

Abstract: An exposure pattern is computed which is used for exposing a desired pattern on a target by means of a blanking aperture array in a particle-optical lithography apparatus which has a finite number of defects, said desired pattern being composed of a multitude of image elements within an image area on the target: A list of defective blanking apertures is provided, comprising information about the type of defect of the defective blanking apertures; from the desired pattern a nominal exposure pattern is calculated as a raster graphics over the image elements disregarding the defective blanking apertures; the “compromised” image elements (1105) are determined which are exposed by aperture images of defective blanking apertures; for each compromised element (1105), a set of neighboring image elements is selected as “correction elements” (1104); for each compromised element, corrected dose values are calculated for the correction elements, said corrected dose values minimizing an error functional of the deviation o

Abstract: An exposure pattern is computed which is used for exposing a desired pattern on a target by means of a particle beam and a blanking aperture array in a particle-optical lithography apparatus, taking into account a non-uniform current dose distribution as generated by the beam over the positions of the apertures of the blanking aperture array: From the desired pattern a nominal exposure pattern is calculated as a raster graphics comprising nominal dose values for the pixels of the raster graphics; based on a map of the current dose distribution, which correlates each aperture with a current factor describing the current dose of the beam at the location of the aperture, a compensated dose value is calculated for each pixel, by dividing its nominal dose value by the compensation factor corresponding to the current factor of the corresponding aperture(s); and for each pixel, a discrete value is determined by selecting a value from a discrete gray scale so as to approximate the compensated dose value.

Abstract: An exposure pattern is computed which is used for exposing a desired pattern on a target by means of a blanking aperture array in a particle-optical lithography apparatus which has a finite number of defects, said desired pattern being composed of a multitude of image elements within an image area on the target: A list of defective blanking apertures is provided, comprising information about the type of defect of the defective blanking apertures; from the desired pattern a nominal exposure pattern is calculated as a raster graphics over the image elements disregarding the defective blanking apertures; the “compromised” image elements (1105) are determined which are exposed by aperture images of defective blanking apertures; for each compromised element (1105), a set of neighboring image elements is selected as “correction elements” (1104); for each compromised element, corrected dose values are calculated for the correction elements, said corrected dose values minimizing an error functional of the deviation o