Patents by Inventor Rafal Bugyi
Rafal Bugyi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10410835Abstract: A plasma impedance matching unit for a plasma power supply system includes a first power connector for coupling the matching unit to a RF power source, a second power connector for coupling the matching unit to a plasma load, a data link interface for directly coupling the matching unit to another plasma impedance matching unit via a data link, and a controller configured to control the matching unit to match an impedance from the first power connector to an impedance at the second power connector, to operate as a master for at least one other impedance matching unit and/or at least one RF power source of the plasma power supply system, and to communicate via the data link interface with the at least one other impedance matching unit and/or the at least one RF power source of the plasma power supply system.Type: GrantFiled: November 3, 2017Date of Patent: September 10, 2019Assignee: TRUMPF Huettinger Sp. z o. o.Inventors: Wojciech Glazek, Rafal Bugyi
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Publication number: 20180053633Abstract: A plasma impedance matching unit for a plasma power supply system includes a first power connector for coupling the matching unit to a RF power source, a second power connector for coupling the matching unit to a plasma load, a data link interface for directly coupling the matching unit to another plasma impedance matching unit via a data link, and a controller configured to control the matching unit to match an impedance from the first power connector to an impedance at the second power connector, to operate as a master for at least one other impedance matching unit and/or at least one RF power source of the plasma power supply system, and to communicate via the data link interface with the at least one other impedance matching unit and/or the at least one RF power source of the plasma power supply system.Type: ApplicationFiled: November 3, 2017Publication date: February 22, 2018Inventors: Wojciech Glazek, Rafal Bugyi
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Patent number: 9840770Abstract: A method of generating a highly ionized plasma in a plasma chamber. A neutral gas is provided to be ionized in the plasma chamber at pressure below 50 Pa. At least one high energy high power electrical pulse is supplied with power equal or larger than 100 kW and energy equal or larger than 10 J, to at least one magnetron cathode in connection with a target in the plasma chamber. A highly ionized plasma is produced directly from the neutral gas in a plasma volume such that the plasma volume cross section increases during a current rise period. Atoms are sputtered from the target with the highly ionized plasma. At least part of the sputtered atoms are ionized.Type: GrantFiled: December 23, 2013Date of Patent: December 12, 2017Assignee: TRUMPF Huettinger Sp. z o. o.Inventors: Andrzej Klimczak, Pawel Ozimek, Rafal Bugyi
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Patent number: 9818579Abstract: According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.Type: GrantFiled: July 8, 2014Date of Patent: November 14, 2017Assignee: TRUMPF Huettinger Sp. z o. o.Inventors: Pawel Ozimek, Rafal Bugyi, Robert Dziuba, Andrzej Klimczak, Marcin Zelechowski
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Patent number: 9637814Abstract: A method of controlling a reactive sputter deposition process includes selecting a control process parameter for a target material and a reactive gas, the target material included in a target acting as a cathode, the reactive sputter deposition process involving forming a compound from a reaction between the target material and reactive gas species associated with the reactive gas in a vacuum chamber; establishing an operation regime for the reactive sputter deposition process for a given target power; and performing, based on the selected control process parameter and the established operation regime, the reactive sputter deposition process in a transition region between a metallic mode and a covered mode through a controlled pulsed reactive gas flow rate into the vacuum chamber, such that a stabilized reactive deposition of the compound on a substrate is achieved, the deposited compound on the substrate comprising a dielectric stoichiometric film.Type: GrantFiled: August 20, 2015Date of Patent: May 2, 2017Assignees: University of West Bohemia in Pilsen, TRUMPF Huettinger Sp. z o. o.Inventors: Rafal Bugyi, Jaroslav Vlcek, Jiri Rezek, Jan Lazar
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Publication number: 20150354052Abstract: A method of controlling a reactive sputter deposition process includes selecting a control process parameter for a target material and a reactive gas, the target material included in a target acting as a cathode, the reactive sputter deposition process involving forming a compound from a reaction between the target material and reactive gas species associated with the reactive gas in a vacuum chamber; establishing an operation regime for the reactive sputter deposition process for a given target power; and performing, based on the selected control process parameter and the established operation regime, the reactive sputter deposition process in a transition region between a metallic mode and a covered mode through a controlled pulsed reactive gas flow rate into the vacuum chamber, such that a stabilized reactive deposition of the compound on a substrate is achieved, the deposited compound on the substrate comprising a dielectric stoichiometric film.Type: ApplicationFiled: August 20, 2015Publication date: December 10, 2015Inventors: Rafal Bugyi, Jaroslav Vlcek, Jiri Rezek, Jan Lazar
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Patent number: 8981664Abstract: The current (Iout) flowing between a plasma chamber and a power supply is limited by limiting the current change di/dt if the current exceeds a predetermined current. A current change limiting device is provided in the current path between the power supply and the plasma chamber and is configured to determine if the current exceeds the predetermined current and limits the current change.Type: GrantFiled: December 19, 2008Date of Patent: March 17, 2015Assignee: TRUMPF Huettinger Sp. zo. o.Inventors: Andrzej Klimczak, Rafal Bugyi, Pawel Ozimek
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Publication number: 20140320015Abstract: According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.Type: ApplicationFiled: July 8, 2014Publication date: October 30, 2014Inventors: Pawel Ozimek, Rafal Bugyi, Robert Dziuba, Andrzej Klimczak, Marcin Zelechowski
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Patent number: 8786263Abstract: According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.Type: GrantFiled: November 12, 2009Date of Patent: July 22, 2014Assignee: TRUMPF Huettinger Sp. z o. o.Inventors: Pawel Ozimek, Rafal Bugyi, Robert Dziuba, Andrzej Klimczak, Marcin Zelechowski
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Publication number: 20140174909Abstract: A method of generating a highly ionized plasma in a plasma chamber. A neutral gas is provided to be ionized in the plasma chamber at pressure below 50 Pa. At least one high energy high power electrical pulse is supplied with power equal or larger than 100 kW and energy equal or larger than 10 J, to at least one magnetron cathode in connection with a target in the plasma chamber. A highly ionized plasma is produced directly from the neutral gas in a plasma volume such that the plasma volume cross section increases during a current rise period. Atoms are sputtered from the target with the highly ionized plasma. At least part of the sputtered atoms are ionized.Type: ApplicationFiled: December 23, 2013Publication date: June 26, 2014Applicant: TRUMPF Huettinger Sp. z.o.o.Inventors: Andrzej Klimczak, Pawel Ozimek, Rafal Bugyi
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Publication number: 20100213903Abstract: According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.Type: ApplicationFiled: November 12, 2009Publication date: August 26, 2010Applicant: HUETTINGER ELECTRONIC SP. Z O.O.Inventors: Pawel Ozimek, Rafal Bugyi, Robert Dziuba, Andrzej Klimczak, Marcin Zelechowski
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Publication number: 20100025230Abstract: A vacuum treatment apparatus (10) for treating at least one substrate (12) and comprising a treatment chamber (14), at least one cathode (16), a power supply (18) associated with the cathode for generating ions of a material present in the gas phase in the chamber and/or ions of a material of which the cathode is formed, a substrate carrier (20) and a bias power supply for applying a negative bias to the substrate carrier and any substrate present thereon, whereby to attract said ions to said at least one substrate, said cathode power supply being adapted to apply relatively high power pulses of relatively short duration to said cathode at intervals resulting in lower average power levels comparable with DC operation, e.g. in the range from ca.Type: ApplicationFiled: April 10, 2007Publication date: February 4, 2010Applicants: Hauzer Techno Coating BV, Sheffield Hallam University, Huettinger Elctronic Sp. z.o.o.Inventors: Arutiun P. Ehiasarian, Roel Tietema, Papken E. Hovsepian, Dave Doerwald, Rafal Bugyi, Andrzej Klimczak
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Publication number: 20090160417Abstract: The current (Iout) flowing between a plasma chamber and a power supply is limited by limiting the current change di/dt if the current exceeds a predetermined current. A current change limiting device is provided in the current path between the power supply and the plasma chamber and is configured to determine if the current exceeds the predetermined current and limits the current change.Type: ApplicationFiled: December 19, 2008Publication date: June 25, 2009Applicant: HUETTINGER ELECTRONIC SP. Z.O.O. (TPLE)Inventors: Andrzej Klimczak, Rafal Bugyi, Pawel Ozimek
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Publication number: 20080309402Abstract: A circuit configuration reduces electrical energy stored in a lead inductance formed by a plurality of leads that connect a power supply unit with a load. The circuit configuration includes a switching device in operative connection with at least one of the leads for enabling or interrupting power to the load. The circuit configuration also includes a first electrical nonlinear device arranged in parallel with the switching device; an energy storing device arranged in parallel with the switching device and in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device for charging the energy storing device to a pre-determined voltage level while power to the load is enabled.Type: ApplicationFiled: May 12, 2008Publication date: December 18, 2008Applicant: HUETTINGER ELECTRONIC SP. Z O.O.Inventors: Pawel Ozimek, Rafal Bugyi, Robert Dziuba, Andrzej Klimczak, Marcin Zelechowski