Patents by Inventor Rafal Dylewicz

Rafal Dylewicz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • GAS MIXTURE INCLUDING HYDROGEN FLUORIDE, ALCOHOL AND AN ADDITIVE FOR PREVENTING STICTION OF AND/OR REPAIRING HIGH ASPECT RATIO STRUCTURES
    Publication number: 20240038526
    Abstract: A gas mixture for treating a substrate in a substrate processing system includes hydrogen fluoride gas, a vapor of an alcohol, an additive consisting of a base, and a carrier gas. The gas mixture can be used to treat high aspect ratio (HAR) structures arranged on a surface of a substrate. A surface of the substrate may be spin rinsed using a first rinsing liquid. The first rinsing liquid is spun off from the surface of the substrate. The gas mixture is directed onto the surface of the substrate after the first rinsing liquid is dispensed.
    Type: Application
    Filed: October 11, 2023
    Publication date: February 1, 2024
    Inventors: Ji Zhu, Gerome Michel Dominique Melaet, Nathan Lavdovsky, Rafal Dylewicz, David Mui
  • Gas mixture including hydrogen fluoride, alcohol and an additive for preventing stiction of and/or repairing high aspect ratio structures
    Patent number: 11823892
    Abstract: A gas mixture for treating a substrate in a substrate processing system includes hydrogen fluoride gas, a vapor of an alcohol, an additive consisting of a base, and a carrier gas. The gas mixture can be used to treat high aspect ratio (HAR) structures arranged on a surface of a substrate. A surface of the substrate may be spin rinsed using a first rinsing liquid. The first rinsing liquid is spun off from the surface of the substrate. The gas mixture is directed onto the surface of the substrate after the first rinsing liquid is dispensed.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: November 21, 2023
    Assignee: Lam Research AG
    Inventors: Ji Zhu, Gerome Michel Dominique Melaet, Nathan Lavdovsky, Rafal Dylewicz, David Mui
  • GAS MIXTURE INCLUDING HYDROGEN FLUORIDE, ALCOHOL AND AN ADDITIVE FOR PREVENTING STICTION OF AND/OR REPAIRING HIGH ASPECT RATIO STRUCTURES
    Publication number: 20210391166
    Abstract: A gas mixture for treating a substrate in a substrate processing system includes hydrogen fluoride gas, a vapor of an alcohol, an additive consisting of a base, and a carrier gas. The gas mixture can be used to treat high aspect ratio (HAR) structures arranged on a surface of a substrate. A surface of the substrate may be spin rinsed using a first rinsing liquid. The first rinsing liquid is spun off from the surface of the substrate. The gas mixture is directed onto the surface of the substrate after the first rinsing liquid is dispensed.
    Type: Application
    Filed: September 26, 2019
    Publication date: December 16, 2021
    Inventors: Ji ZHU, Gerome Michel Dominique MELAET, Nathan LAVDOVSKY, Rafal DYLEWICZ, David MUI
  • Reduction of surface and embedded substrate charge by controlled exposure to vacuum ultraviolet (VUV) light in low-oxygen environment
    Patent number: 10483010
    Abstract: A system for reducing surface and embedded charge in a substrate includes a substrate support configured to support a substrate. A vacuum ultraviolet (VUV) assembly is arranged adjacent to the substrate and includes a housing and a VUV lamp that is connected to the housing and that generates and directs ultraviolet (UV) light at the substrate. A movement device is configured to move at least one of the VUV assembly and the substrate support during exposure of the substrate to the UV light to reduce surface and embedded charge in the substrate.
    Type: Grant
    Filed: September 7, 2016
    Date of Patent: November 19, 2019
    Assignee: LAM RESEARCH AG
    Inventors: Rafal Dylewicz, Reinhold Schwarzenbacher, Xia Man, Kenichi Sano, David Lou, Milan Pliska
  • REDUCTION OF SURFACE AND EMBEDDED SUBSTRATE CHARGE BY CONTROLLED EXPOSURE TO VACUUM ULTRAVIOLET (VUV) LIGHT IN LOW-OXYGEN ENVIRONMENT
    Publication number: 20180068754
    Abstract: A system for reducing surface and embedded charge in a substrate includes a substrate support configured to support a substrate. A vacuum ultraviolet (VUV) assembly is arranged adjacent to the substrate and includes a housing and a VUV lamp that is connected to the housing and that generates and directs ultraviolet (UV) light at the substrate. A movement device is configured to move at least one of the VUV assembly and the substrate support during exposure of the substrate to the UV light to reduce surface and embedded charge in the substrate.
    Type: Application
    Filed: September 7, 2016
    Publication date: March 8, 2018
    Inventors: Rafal Dylewicz, Reinhold Schwazenbacher, Xia Man, Kenichi Sano, David Lou, Milan Pliska